NO20025951D0 - Röntgen reflektivitetsapparat og fremgangsmåte - Google Patents
Röntgen reflektivitetsapparat og fremgangsmåteInfo
- Publication number
- NO20025951D0 NO20025951D0 NO20025951A NO20025951A NO20025951D0 NO 20025951 D0 NO20025951 D0 NO 20025951D0 NO 20025951 A NO20025951 A NO 20025951A NO 20025951 A NO20025951 A NO 20025951A NO 20025951 D0 NO20025951 D0 NO 20025951D0
- Authority
- NO
- Norway
- Prior art keywords
- ray reflectivity
- reflectivity apparatus
- ray
- reflectivity
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
Landscapes
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0014587A GB0014587D0 (en) | 2000-06-14 | 2000-06-14 | X-ray reflectivity apparatus and method |
PCT/GB2001/002441 WO2001096841A2 (en) | 2000-06-14 | 2001-06-01 | X-ray reflectivity apparatus and method |
Publications (2)
Publication Number | Publication Date |
---|---|
NO20025951D0 true NO20025951D0 (no) | 2002-12-11 |
NO20025951L NO20025951L (no) | 2003-01-16 |
Family
ID=9893678
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO20025951A NO20025951L (no) | 2000-06-14 | 2002-12-11 | Röntgenreflektivitetsapparat og fremgangsmåte |
Country Status (6)
Country | Link |
---|---|
EP (1) | EP1311835A2 (no) |
JP (1) | JP2004503771A (no) |
CA (1) | CA2412634A1 (no) |
GB (1) | GB0014587D0 (no) |
NO (1) | NO20025951L (no) |
WO (1) | WO2001096841A2 (no) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6718008B1 (en) * | 2002-04-22 | 2004-04-06 | Bruker Axs, Inc. | X-ray diffraction screening system with retractable x-ray shield |
JP3731207B2 (ja) * | 2003-09-17 | 2006-01-05 | 株式会社リガク | X線分析装置 |
FR2866709A1 (fr) * | 2004-02-19 | 2005-08-26 | Production Et De Rech S Appliq | Dispositif perfectionne de mesure non destructive par rayons x de caracteristiques d'echantillon, en reflectivite rasante |
US10151713B2 (en) | 2015-05-21 | 2018-12-11 | Industrial Technology Research Institute | X-ray reflectometry apparatus for samples with a miniscule measurement area and a thickness in nanometers and method thereof |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4352017A (en) * | 1980-09-22 | 1982-09-28 | Rca Corporation | Apparatus for determining the quality of a semiconductor surface |
US4821301A (en) * | 1986-02-28 | 1989-04-11 | Duke University | X-ray reflection method and apparatus for chemical analysis of thin surface layers |
JPH0394104A (ja) * | 1989-09-06 | 1991-04-18 | Toshiba Corp | 膜厚測定方法と膜厚測定装置及びこれを用いた膜形成装置 |
DE4137673C2 (de) * | 1991-11-15 | 2001-08-02 | Bruker Axs Analytical X Ray Sy | Röntgenreflektometer |
US5619548A (en) * | 1995-08-11 | 1997-04-08 | Oryx Instruments And Materials Corp. | X-ray thickness gauge |
RU2199110C2 (ru) * | 1997-04-24 | 2003-02-20 | Баранов Александр Михайлович | Способ контроля параметров пленочных покрытий и поверхностей в процессе их изменения и устройство его осуществления |
RU2194272C2 (ru) * | 1998-04-29 | 2002-12-10 | Баранов Александр Михайлович | Способ контроля параметров пленочных покрытий и поверхностей в реальном времени и устройство его осуществления |
US6754305B1 (en) * | 1999-08-02 | 2004-06-22 | Therma-Wave, Inc. | Measurement of thin films and barrier layers on patterned wafers with X-ray reflectometry |
-
2000
- 2000-06-14 GB GB0014587A patent/GB0014587D0/en not_active Ceased
-
2001
- 2001-06-01 JP JP2002510921A patent/JP2004503771A/ja active Pending
- 2001-06-01 EP EP01934187A patent/EP1311835A2/en not_active Withdrawn
- 2001-06-01 CA CA002412634A patent/CA2412634A1/en not_active Abandoned
- 2001-06-01 WO PCT/GB2001/002441 patent/WO2001096841A2/en not_active Application Discontinuation
-
2002
- 2002-12-11 NO NO20025951A patent/NO20025951L/no not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
GB0014587D0 (en) | 2000-08-09 |
WO2001096841A2 (en) | 2001-12-20 |
JP2004503771A (ja) | 2004-02-05 |
CA2412634A1 (en) | 2001-12-20 |
EP1311835A2 (en) | 2003-05-21 |
NO20025951L (no) | 2003-01-16 |
WO2001096841A3 (en) | 2002-05-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FC2A | Withdrawal, rejection or dismissal of laid open patent application |