NO20025951D0 - X-ray reflectivity apparatus and method - Google Patents

X-ray reflectivity apparatus and method

Info

Publication number
NO20025951D0
NO20025951D0 NO20025951A NO20025951A NO20025951D0 NO 20025951 D0 NO20025951 D0 NO 20025951D0 NO 20025951 A NO20025951 A NO 20025951A NO 20025951 A NO20025951 A NO 20025951A NO 20025951 D0 NO20025951 D0 NO 20025951D0
Authority
NO
Norway
Prior art keywords
ray reflectivity
reflectivity apparatus
ray
reflectivity
Prior art date
Application number
NO20025951A
Other languages
Norwegian (no)
Other versions
NO20025951L (en
Inventor
Peter Neil Gibson
Original Assignee
European Community
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by European Community filed Critical European Community
Publication of NO20025951D0 publication Critical patent/NO20025951D0/en
Publication of NO20025951L publication Critical patent/NO20025951L/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
NO20025951A 2000-06-14 2002-12-11 X-ray reflectivity apparatus and method NO20025951L (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB0014587A GB0014587D0 (en) 2000-06-14 2000-06-14 X-ray reflectivity apparatus and method
PCT/GB2001/002441 WO2001096841A2 (en) 2000-06-14 2001-06-01 X-ray reflectivity apparatus and method

Publications (2)

Publication Number Publication Date
NO20025951D0 true NO20025951D0 (en) 2002-12-11
NO20025951L NO20025951L (en) 2003-01-16

Family

ID=9893678

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20025951A NO20025951L (en) 2000-06-14 2002-12-11 X-ray reflectivity apparatus and method

Country Status (6)

Country Link
EP (1) EP1311835A2 (en)
JP (1) JP2004503771A (en)
CA (1) CA2412634A1 (en)
GB (1) GB0014587D0 (en)
NO (1) NO20025951L (en)
WO (1) WO2001096841A2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6718008B1 (en) * 2002-04-22 2004-04-06 Bruker Axs, Inc. X-ray diffraction screening system with retractable x-ray shield
JP3731207B2 (en) * 2003-09-17 2006-01-05 株式会社リガク X-ray analyzer
FR2866709A1 (en) * 2004-02-19 2005-08-26 Production Et De Rech S Appliq Specimen characteristics e.g. roughness, measuring device, has interception unit to intercept X-rays of beam height greater than selected value, in order to limit extension of measuring zone along direction of propagation of incident X-rays
US10151713B2 (en) 2015-05-21 2018-12-11 Industrial Technology Research Institute X-ray reflectometry apparatus for samples with a miniscule measurement area and a thickness in nanometers and method thereof

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4352017A (en) * 1980-09-22 1982-09-28 Rca Corporation Apparatus for determining the quality of a semiconductor surface
US4821301A (en) * 1986-02-28 1989-04-11 Duke University X-ray reflection method and apparatus for chemical analysis of thin surface layers
JPH0394104A (en) * 1989-09-06 1991-04-18 Toshiba Corp Film thickness measuring method and film thickness measuring device and film forming device using it
DE4137673C2 (en) * 1991-11-15 2001-08-02 Bruker Axs Analytical X Ray Sy X-ray reflectometer
US5619548A (en) * 1995-08-11 1997-04-08 Oryx Instruments And Materials Corp. X-ray thickness gauge
RU2199110C2 (en) * 1997-04-24 2003-02-20 Баранов Александр Михайлович Procedure testing parameters of film coats and surfaces in process of their change and device for is implementation
RU2194272C2 (en) * 1998-04-29 2002-12-10 Баранов Александр Михайлович Method and device for real-time inspection of film coatings and surfaces
US6754305B1 (en) * 1999-08-02 2004-06-22 Therma-Wave, Inc. Measurement of thin films and barrier layers on patterned wafers with X-ray reflectometry

Also Published As

Publication number Publication date
NO20025951L (en) 2003-01-16
CA2412634A1 (en) 2001-12-20
EP1311835A2 (en) 2003-05-21
JP2004503771A (en) 2004-02-05
WO2001096841A3 (en) 2002-05-10
WO2001096841A2 (en) 2001-12-20
GB0014587D0 (en) 2000-08-09

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Legal Events

Date Code Title Description
FC2A Withdrawal, rejection or dismissal of laid open patent application