NO20011710L - Lysemitterende element, plasma fremvisningspanel og CRT- fremvisningsanordning i stand til å undertrykke höyfrekvent stöy - Google Patents

Lysemitterende element, plasma fremvisningspanel og CRT- fremvisningsanordning i stand til å undertrykke höyfrekvent stöy

Info

Publication number
NO20011710L
NO20011710L NO20011710A NO20011710A NO20011710L NO 20011710 L NO20011710 L NO 20011710L NO 20011710 A NO20011710 A NO 20011710A NO 20011710 A NO20011710 A NO 20011710A NO 20011710 L NO20011710 L NO 20011710L
Authority
NO
Norway
Prior art keywords
light emitting
high frequency
emitting element
device capable
frequency noise
Prior art date
Application number
NO20011710A
Other languages
English (en)
Other versions
NO20011710D0 (no
Inventor
Shinya Watanabe
Koji Kamei
Hiroshi Ono
Shigeyoshi Yoshida
Michio Nemoto
Original Assignee
Tokin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2000102149A external-priority patent/JP2001284698A/ja
Priority claimed from JP2000178013A external-priority patent/JP2001356698A/ja
Priority claimed from JP2000239462A external-priority patent/JP2002056790A/ja
Application filed by Tokin Corp filed Critical Tokin Corp
Publication of NO20011710D0 publication Critical patent/NO20011710D0/no
Publication of NO20011710L publication Critical patent/NO20011710L/no

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/10AC-PDPs with at least one main electrode being out of contact with the plasma
    • H01J11/12AC-PDPs with at least one main electrode being out of contact with the plasma with main electrodes provided on both sides of the discharge space
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/86Vessels; Containers; Vacuum locks
    • H01J29/88Vessels; Containers; Vacuum locks provided with coatings on the walls thereof; Selection of materials for the coatings
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23Oxides
    • C03C17/245Oxides by deposition from the vapour phase
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20Constructional details
    • H01J11/34Vessels, containers or parts thereof, e.g. substrates
    • H01J11/44Optical arrangements or shielding arrangements, e.g. filters, black matrices, light reflecting means or electromagnetic shielding means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/86Vessels; Containers; Vacuum locks
    • H01J29/867Means associated with the outside of the vessel for shielding, e.g. magnetic shields
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/217FeOx, CoOx, NiOx
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/23Mixtures
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/28Other inorganic materials
    • C03C2217/281Nitrides
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/28Other inorganic materials
    • C03C2217/284Halides
    • C03C2217/285Fluorides
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/15Deposition methods from the vapour phase
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/15Deposition methods from the vapour phase
    • C03C2218/154Deposition methods from the vapour phase by sputtering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2211/00Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
    • H01J2211/20Constructional details
    • H01J2211/34Vessels, containers or parts thereof, e.g. substrates
    • H01J2211/44Optical arrangements or shielding arrangements, e.g. filters or lenses
    • H01J2211/446Electromagnetic shielding means; Antistatic means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2329/00Electron emission display panels, e.g. field emission display panels
    • H01J2329/86Vessels
    • H01J2329/868Passive shielding means of vessels
    • H01J2329/869Electromagnetic shielding

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Electromagnetism (AREA)
  • Physical Vapour Deposition (AREA)
NO20011710A 2000-04-04 2001-04-04 Lysemitterende element, plasma fremvisningspanel og CRT- fremvisningsanordning i stand til å undertrykke höyfrekvent stöy NO20011710L (no)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000102149A JP2001284698A (ja) 2000-04-04 2000-04-04 発光素子
JP2000178013A JP2001356698A (ja) 2000-06-14 2000-06-14 プラズマディスプレイパネル
JP2000239462A JP2002056790A (ja) 2000-08-08 2000-08-08 陰極線管ディスプレイ装置

Publications (2)

Publication Number Publication Date
NO20011710D0 NO20011710D0 (no) 2001-04-04
NO20011710L true NO20011710L (no) 2001-10-05

Family

ID=27342979

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20011710A NO20011710L (no) 2000-04-04 2001-04-04 Lysemitterende element, plasma fremvisningspanel og CRT- fremvisningsanordning i stand til å undertrykke höyfrekvent stöy

Country Status (6)

Country Link
US (2) US6703778B2 (no)
EP (1) EP1143480A1 (no)
KR (1) KR20010095324A (no)
CN (1) CN1324090A (no)
NO (1) NO20011710L (no)
SG (1) SG106053A1 (no)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY131112A (en) * 2000-04-04 2007-07-31 Nec Tokin Corp Electromagnetic noise suppressor, semiconductor device using the same, and method of manufacturing the same
KR20040040497A (ko) * 2002-11-07 2004-05-13 삼성전자주식회사 플라즈마 디스플레이 장치
US7845839B2 (en) * 2007-11-13 2010-12-07 Intematix Corporation Light emitting display
US8467685B2 (en) * 2009-12-21 2013-06-18 Echostar Technologies L.L.C. Apparatus, systems and methods for compensating infrared noise in an electronic system

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6034744A (en) 1994-08-11 2000-03-07 Lg Electronics Inc. Magnetism shield for cathode ray tube
US5667729A (en) 1995-04-04 1997-09-16 Hitachi Powdered Metals Co., Ltd. Coating material for inner coat of cathode-ray tube
JP3520627B2 (ja) * 1995-09-14 2004-04-19 ソニー株式会社 光反射防止部材及びその作製方法、並びに陰極線管
KR100210501B1 (ko) * 1995-11-08 1999-07-15 손욱 자기 차폐 음극선관
JPH09188545A (ja) * 1996-01-11 1997-07-22 Asahi Glass Co Ltd 導電膜、その製造方法及びガラス物品
US5698940A (en) * 1996-01-23 1997-12-16 The United States Of America As Represented By The Secretary Of The Army Method for detrapping light in thin film phosphor displays
EP0848386B1 (en) * 1996-06-11 2005-10-26 Sumitomo Osaka Cement Co., Ltd. Transparent conductive film, low-reflection transparent conductive film, and display
JPH1022070A (ja) 1996-07-08 1998-01-23 Matsushita Electric Ind Co Ltd 電磁シールド付分散型エレクトロルミネセンス素子
JP3039437B2 (ja) * 1997-04-15 2000-05-08 日本電気株式会社 カラープラズマディスプレイパネル
US6090473A (en) * 1997-06-24 2000-07-18 Bridgestone Corporation Electromagnetic-wave shielding and light transmitting plate
JPH1174682A (ja) 1997-06-24 1999-03-16 Bridgestone Corp 電磁波シールド性光透過窓材
JPH11274792A (ja) * 1998-03-23 1999-10-08 Nof Corp 電磁波シールド性減反射材およびその製造方法

Also Published As

Publication number Publication date
EP1143480A1 (en) 2001-10-10
NO20011710D0 (no) 2001-04-04
SG106053A1 (en) 2004-09-30
CN1324090A (zh) 2001-11-28
US6703778B2 (en) 2004-03-09
KR20010095324A (ko) 2001-11-03
US20010035705A1 (en) 2001-11-01
US20040150342A1 (en) 2004-08-05

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