NO127095B - - Google Patents
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- Publication number
- NO127095B NO127095B NO05095/69A NO509569A NO127095B NO 127095 B NO127095 B NO 127095B NO 05095/69 A NO05095/69 A NO 05095/69A NO 509569 A NO509569 A NO 509569A NO 127095 B NO127095 B NO 127095B
- Authority
- NO
- Norway
- Prior art keywords
- plasma
- reaction
- anode
- discharge
- liquid
- Prior art date
Links
- 238000006243 chemical reaction Methods 0.000 claims description 30
- 238000010891 electric arc Methods 0.000 claims description 16
- 239000007788 liquid Substances 0.000 claims description 16
- 238000000034 method Methods 0.000 claims description 10
- 239000007795 chemical reaction product Substances 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 229910052752 metalloid Inorganic materials 0.000 claims description 6
- 150000002738 metalloids Chemical class 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 description 14
- 229910052739 hydrogen Inorganic materials 0.000 description 14
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 11
- 229930195733 hydrocarbon Natural products 0.000 description 9
- 150000002430 hydrocarbons Chemical class 0.000 description 9
- 239000004215 Carbon black (E152) Substances 0.000 description 7
- 239000011551 heat transfer agent Substances 0.000 description 6
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 6
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 5
- 239000005049 silicon tetrachloride Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000007791 liquid phase Substances 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000003776 cleavage reaction Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 230000000087 stabilizing effect Effects 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 230000006641 stabilisation Effects 0.000 description 2
- 238000011105 stabilization Methods 0.000 description 2
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000004992 fission Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/3405—Arrangements for stabilising or constricting the arc, e.g. by an additional gas flow
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
- B01J12/002—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor carried out in the plasma state
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
- C01B13/20—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state
- C01B13/22—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides
- C01B13/28—Methods for preparing oxides or hydroxides in general by oxidation of elements in the gaseous state; by oxidation or hydrolysis of compounds in the gaseous state of halides or oxyhalides using a plasma or an electric discharge
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/0615—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with transition metals other than titanium, zirconium or hafnium
- C01B21/0617—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with transition metals other than titanium, zirconium or hafnium with vanadium, niobium or tantalum
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/064—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with boron
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/90—Carbides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/02—Halides of titanium
- C01G23/026—Titanium trichloride
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
- C01G23/07—Producing by vapour phase processes, e.g. halide oxidation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/341—Arrangements for providing coaxial protecting fluids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0894—Processes carried out in the presence of a plasma
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/26—Plasma torches
- H05H1/32—Plasma torches using an arc
- H05H1/34—Details, e.g. electrodes, nozzles
- H05H1/3468—Vortex generators
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Crystallography & Structural Chemistry (AREA)
- Analytical Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Carbon And Carbon Compounds (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Soil Working Implements (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH1925968A CH508412A (de) | 1968-12-24 | 1968-12-24 | Verwendung von vortex-stabilisierten Plasmabrennern zur Durchführung von chemischen Reaktionen |
| CH494969A CH525705A (de) | 1968-12-24 | 1969-04-01 | Verwendung von vortex-stabilisierten Plasmabrennern zur Durchführung von chemischen Reaktionen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NO127095B true NO127095B (da) | 1973-05-07 |
Family
ID=25696596
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO04820/69A NO127094B (da) | 1968-12-24 | 1969-12-05 | |
| NO05095/69A NO127095B (da) | 1968-12-24 | 1969-12-23 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO04820/69A NO127094B (da) | 1968-12-24 | 1969-12-05 |
Country Status (10)
| Country | Link |
|---|---|
| US (2) | US3649497A (da) |
| JP (1) | JPS5022986B1 (da) |
| BE (1) | BE743039A (da) |
| CH (1) | CH525705A (da) |
| DE (2) | DE1961339A1 (da) |
| FR (2) | FR2027085A1 (da) |
| GB (2) | GB1297388A (da) |
| NL (2) | NL6919179A (da) |
| NO (2) | NO127094B (da) |
| SE (1) | SE381575B (da) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3938988A (en) * | 1971-01-04 | 1976-02-17 | Othmer Donald F | Method for producing aluminum metal from its salts |
| BE791550A (fr) * | 1971-11-20 | 1973-03-16 | Max Planck Gesellschaft | Procede et dispositif pour le traitement d'un materiau au moyendu plasma d'un arc electrique |
| US4206190A (en) * | 1974-03-11 | 1980-06-03 | Westinghouse Electric Corp. | Plasma arc production of silicon nitride |
| US4022872A (en) * | 1975-11-12 | 1977-05-10 | Ppg Industries, Inc. | Process for preparing finely-divided refractory powders |
| US4051043A (en) * | 1976-01-26 | 1977-09-27 | O-3 Company | Apparatus for fluid treatment by electron emission |
| US4102764A (en) * | 1976-12-29 | 1978-07-25 | Westinghouse Electric Corp. | High purity silicon production by arc heater reduction of silicon intermediates |
| US4102765A (en) * | 1977-01-06 | 1978-07-25 | Westinghouse Electric Corp. | Arc heater production of silicon involving alkali or alkaline-earth metals |
| US4102766A (en) * | 1977-04-14 | 1978-07-25 | Westinghouse Electric Corp. | Process for doping high purity silicon in an arc heater |
| US4102767A (en) * | 1977-04-14 | 1978-07-25 | Westinghouse Electric Corp. | Arc heater method for the production of single crystal silicon |
| CH616348A5 (da) * | 1977-04-29 | 1980-03-31 | Alusuisse | |
| US4145403A (en) * | 1977-09-29 | 1979-03-20 | Fey Maurice G | Arc heater method for producing metal oxides |
| US4292342A (en) * | 1980-05-09 | 1981-09-29 | Motorola, Inc. | High pressure plasma deposition of silicon |
| JPS579890A (en) * | 1980-06-20 | 1982-01-19 | Inoue Japax Res Inc | Treatment of rare earth concentrate |
| DE3304790A1 (de) * | 1982-02-15 | 1983-09-01 | Československá akademie věd, Praha | Verfahren zur stabilisierung des niedertemperatur-plasmas eines lichtbogenbrenners und lichtbogenbrenner zu seiner durchfuehrung |
| US6096109A (en) * | 1996-01-18 | 2000-08-01 | Molten Metal Technology, Inc. | Chemical component recovery from ligated-metals |
| US5948294A (en) * | 1996-08-30 | 1999-09-07 | Mcdermott Technology, Inc. | Device for cathodic cleaning of wire |
| US6579805B1 (en) * | 1999-01-05 | 2003-06-17 | Ronal Systems Corp. | In situ chemical generator and method |
| JP2004501752A (ja) | 2000-06-27 | 2004-01-22 | プレチェチェンスキ・ミハイル・ルドルフォビチ | プラズマ化学リアクター |
| RU2200058C1 (ru) * | 2002-02-12 | 2003-03-10 | Открытое акционерное общество "ТВЭЛ" | Способ проведения гомогенных и гетерогенных химических реакций с использованием плазмы |
| US7375035B2 (en) | 2003-04-29 | 2008-05-20 | Ronal Systems Corporation | Host and ancillary tool interface methodology for distributed processing |
| US7429714B2 (en) * | 2003-06-20 | 2008-09-30 | Ronal Systems Corporation | Modular ICP torch assembly |
| WO2007068085A1 (en) * | 2005-12-12 | 2007-06-21 | Albonia Innovative Technologies Ltd. | Method and apparatus for treating contaminated material |
| DE112007000428T5 (de) | 2006-02-20 | 2008-12-11 | AISAN KOGYO K.K., Obu-shi | Kraftstoffzufuhrvorrichtung |
| RU2532676C2 (ru) | 2011-11-28 | 2014-11-10 | Юрий Александрович Чивель | Способ плазмохимического синтеза и реактор плазмохимического синтеза для его осуществления |
| EP3401007A4 (en) * | 2016-01-05 | 2019-09-04 | Helix Co., Ltd. | HYDROFLOW GENERATOR, WATER PLASMA PRODUCTION DEVICE, DECOMPOSITION TREATMENT DEVICE, VEHICLE WITH THE DECOMPOSITION TREATMENT DEVICE AND DECOMPOSITION TREATMENT METHOD |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1065385B (de) * | 1955-01-05 | 1959-09-17 | Chemische Werke Hüls Aktiengesellschaft, Marl (Kr, Recklinghausen) | Verfahren zur Durchführung chemischer und physikalischer Prozesse mit Hilfe elektrischer Entladungen |
| US2854392A (en) * | 1955-09-22 | 1958-09-30 | Tokumoto Shin-Ichi | Arc discharge production of low valency halides of titanium |
| CH357378A (de) * | 1956-04-02 | 1961-10-15 | Berghaus Elektrophysik Anst | Verfahren und Einrichtung zur Durchführung technischer Prozesse |
| FR1294283A (fr) * | 1960-04-13 | 1962-05-26 | Ici Ltd | Procédé permettant de conduire des réactions chimiques dans des décharges électriques |
| DE1206399B (de) * | 1963-04-27 | 1965-12-09 | Bayer Ag | Verfahren zur Durchfuehrung von Gasphasenreaktionen |
| GB1066651A (en) * | 1965-01-18 | 1967-04-26 | British Titan Products | Oxides |
| US3494762A (en) * | 1967-11-27 | 1970-02-10 | Iwatani & Co | Method of manufacturing microfine metal powder |
| US3516921A (en) * | 1968-03-26 | 1970-06-23 | Allis Chalmers Mfg Co | Apparatus for magnetic stirring of discharge plasma in chemical synthesis |
-
1969
- 1969-04-01 CH CH494969A patent/CH525705A/de unknown
- 1969-12-05 NO NO04820/69A patent/NO127094B/no unknown
- 1969-12-06 DE DE19691961339 patent/DE1961339A1/de active Pending
- 1969-12-11 GB GB1297388D patent/GB1297388A/en not_active Expired
- 1969-12-12 BE BE743039D patent/BE743039A/xx unknown
- 1969-12-16 DE DE19691962989 patent/DE1962989A1/de active Pending
- 1969-12-17 US US885927A patent/US3649497A/en not_active Expired - Lifetime
- 1969-12-17 US US885929A patent/US3658673A/en not_active Expired - Lifetime
- 1969-12-22 NL NL6919179A patent/NL6919179A/xx unknown
- 1969-12-23 SE SE6917835A patent/SE381575B/xx unknown
- 1969-12-23 GB GB1297389D patent/GB1297389A/en not_active Expired
- 1969-12-23 NL NL6919285A patent/NL6919285A/xx unknown
- 1969-12-23 NO NO05095/69A patent/NO127095B/no unknown
- 1969-12-24 FR FR6945017A patent/FR2027085A1/fr not_active Withdrawn
- 1969-12-24 JP JP44103547A patent/JPS5022986B1/ja active Pending
- 1969-12-24 FR FR6945016A patent/FR2027608A1/fr not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| FR2027085A1 (da) | 1970-09-25 |
| DE1962989A1 (de) | 1970-07-09 |
| GB1297388A (da) | 1972-11-22 |
| DE1961339A1 (de) | 1970-06-25 |
| NL6919179A (da) | 1970-06-26 |
| SE381575B (sv) | 1975-12-15 |
| US3658673A (en) | 1972-04-25 |
| US3649497A (en) | 1972-03-14 |
| FR2027608A1 (da) | 1970-10-02 |
| CH525705A (de) | 1972-07-31 |
| NO127094B (da) | 1973-05-07 |
| GB1297389A (da) | 1972-11-22 |
| NL6919285A (da) | 1970-06-26 |
| JPS5022986B1 (da) | 1975-08-04 |
| BE743039A (da) | 1970-05-14 |
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