NL8601095A - Positioneerinrichting. - Google Patents

Positioneerinrichting. Download PDF

Info

Publication number
NL8601095A
NL8601095A NL8601095A NL8601095A NL8601095A NL 8601095 A NL8601095 A NL 8601095A NL 8601095 A NL8601095 A NL 8601095A NL 8601095 A NL8601095 A NL 8601095A NL 8601095 A NL8601095 A NL 8601095A
Authority
NL
Netherlands
Prior art keywords
parallel
carrier
positioning device
stator
axis
Prior art date
Application number
NL8601095A
Other languages
English (en)
Dutch (nl)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Priority to NL8601095A priority Critical patent/NL8601095A/nl
Priority to US06/878,740 priority patent/US4698575A/en
Priority to DE3751515T priority patent/DE3751515T2/de
Priority to AT87200720T priority patent/ATE127940T1/de
Priority to EP87200720A priority patent/EP0244012B1/en
Priority to JP62102127A priority patent/JPH083756B2/ja
Publication of NL8601095A publication Critical patent/NL8601095A/nl

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70716Stages
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25Movable or adjustable work or tool supports
    • B23Q1/26Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members
    • B23Q1/34Relative movement obtained by use of deformable elements, e.g. piezoelectric, magnetostrictive, elastic or thermally-dilatable elements
    • B23Q1/36Springs
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23QDETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25Movable or adjustable work or tool supports
    • B23Q1/44Movable or adjustable work or tool supports using particular mechanisms
    • B23Q1/56Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism
    • B23Q1/60Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism
    • B23Q1/62Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides
    • B23Q1/621Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides a single sliding pair followed perpendicularly by a single sliding pair
    • B23Q1/623Movable or adjustable work or tool supports using particular mechanisms with sliding pairs only, the sliding pairs being the first two elements of the mechanism two sliding pairs only, the sliding pairs being the first two elements of the mechanism with perpendicular axes, e.g. cross-slides a single sliding pair followed perpendicularly by a single sliding pair followed perpendicularly by a single rotating pair

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Automatic Control Of Machine Tools (AREA)
  • Vehicle Body Suspensions (AREA)
  • Die Bonding (AREA)
  • Machine Tool Sensing Apparatuses (AREA)
  • Supply And Installment Of Electrical Components (AREA)
  • Control Of Position Or Direction (AREA)
  • Machine Tool Units (AREA)
NL8601095A 1986-04-29 1986-04-29 Positioneerinrichting. NL8601095A (nl)

Priority Applications (6)

Application Number Priority Date Filing Date Title
NL8601095A NL8601095A (nl) 1986-04-29 1986-04-29 Positioneerinrichting.
US06/878,740 US4698575A (en) 1986-04-29 1986-06-26 Positioning device
DE3751515T DE3751515T2 (de) 1986-04-29 1987-04-16 Positioniervorrichtung.
AT87200720T ATE127940T1 (de) 1986-04-29 1987-04-16 Positioniervorrichtung.
EP87200720A EP0244012B1 (en) 1986-04-29 1987-04-16 Positioning device
JP62102127A JPH083756B2 (ja) 1986-04-29 1987-04-27 位置決め装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8601095A NL8601095A (nl) 1986-04-29 1986-04-29 Positioneerinrichting.
NL8601095 1986-04-29

Publications (1)

Publication Number Publication Date
NL8601095A true NL8601095A (nl) 1987-11-16

Family

ID=19847951

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8601095A NL8601095A (nl) 1986-04-29 1986-04-29 Positioneerinrichting.

Country Status (6)

Country Link
US (1) US4698575A (ja)
EP (1) EP0244012B1 (ja)
JP (1) JPH083756B2 (ja)
AT (1) ATE127940T1 (ja)
DE (1) DE3751515T2 (ja)
NL (1) NL8601095A (ja)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2620244B1 (fr) * 1987-09-08 1990-01-12 Micro Controle Systeme pour le positionnement rigoureux d'un objet le long d'un axe
US4952858A (en) * 1988-05-18 1990-08-28 Galburt Daniel N Microlithographic apparatus
JPH02149869A (ja) * 1988-11-30 1990-06-08 Sharp Corp 複写機の直線駆動装置
NL8902473A (nl) * 1989-10-05 1991-05-01 Philips Nv Lineaire motor, alsmede positioneerinrichting voorzien van ten minste een lineaire motor.
JP3087305B2 (ja) * 1990-03-05 2000-09-11 株式会社ニコン ステージ装置
NL9001012A (nl) * 1990-04-27 1991-11-18 Koninkl Philips Electronics Nv Positioneerinrichting met statische fluidumlagers.
US5140242A (en) * 1990-04-30 1992-08-18 International Business Machines Corporation Servo guided stage system
NL9001611A (nl) * 1990-07-16 1992-02-17 Asm Lithography Bv Apparaat voor het afbeelden van een maskerpatroon op een substraat.
US5157296A (en) * 1990-12-20 1992-10-20 Massachusetts Institute Of Technology Bearing for use in high resolution precision control device
NL9100421A (nl) * 1991-03-08 1992-10-01 Asm Lithography Bv Ondersteuningsinrichting met een kantelbare objecttafel alsmede optisch lithografische inrichting voorzien van een dergelijke ondersteuningsinrichting.
DE4113027A1 (de) * 1991-04-20 1992-10-22 Leitz Messtechnik Verfahren und vorrichtung zur fotolithographischen herstellung von langen gittermassstaeben
DE4123323C2 (de) * 1991-07-13 1994-02-10 Andreas Ehlerding Werkzeugträger
US5196745A (en) * 1991-08-16 1993-03-23 Massachusetts Institute Of Technology Magnetic positioning device
KR950003660A (ko) * 1992-08-12 1995-02-17 제이지에이롤프스 변속 기구, 변속 기구를 구비한 위치 설정 장치 및, 위치 설정 장치를 구비한 리도그래픽 장치
DE4322011C1 (de) * 1993-07-02 1994-09-08 Jenoptik Jena Gmbh Einrichtung zur Beseitigung von Verkippungen in Antrieben mit Gaslagern
JP3695542B2 (ja) * 1994-02-23 2005-09-14 日本トムソン株式会社 リニア電磁アクチュエータを具備したxy駆動装置
US7365513B1 (en) 1994-04-01 2008-04-29 Nikon Corporation Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
US5874820A (en) * 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism
US6989647B1 (en) * 1994-04-01 2006-01-24 Nikon Corporation Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
US5528118A (en) * 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
US6246204B1 (en) 1994-06-27 2001-06-12 Nikon Corporation Electromagnetic alignment and scanning apparatus
US5828142A (en) * 1994-10-03 1998-10-27 Mrs Technology, Inc. Platen for use with lithographic stages and method of making same
US5623853A (en) * 1994-10-19 1997-04-29 Nikon Precision Inc. Precision motion stage with single guide beam and follower stage
JPH08229759A (ja) * 1995-02-24 1996-09-10 Canon Inc 位置決め装置並びにデバイス製造装置及び方法
US6008500A (en) * 1995-04-04 1999-12-28 Nikon Corporation Exposure apparatus having dynamically isolated reaction frame
TW318255B (ja) 1995-05-30 1997-10-21 Philips Electronics Nv
US5760564A (en) * 1995-06-27 1998-06-02 Nikon Precision Inc. Dual guide beam stage mechanism with yaw control
US5835198A (en) * 1997-01-06 1998-11-10 Etec Systems, Inc. Articulated platform mechanism for laser pattern generation on a workpiece
EP0973067A3 (en) * 1998-07-17 2001-10-24 ASM Lithography B.V. Positioning device and lithographic projection apparatus comprising such a device
TWI242113B (en) * 1998-07-17 2005-10-21 Asml Netherlands Bv Positioning device and lithographic projection apparatus comprising such a device
DE29907533U1 (de) * 1999-04-28 2000-09-21 Belyakov, Vladimir K., Balaschicha Gerät, insbesondere Arbeitstisch für einen Projektor
IT249658Y1 (it) 2000-01-31 2003-05-28 Balance Systems Spa Dispositivo di supporto e guida per piccole macchine utensili in particolare per equilibratrici di masse rotanti
EP1148389B1 (en) * 2000-04-17 2008-02-27 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US6814096B2 (en) * 2000-12-15 2004-11-09 Nor-Cal Products, Inc. Pressure controller and method
US7434362B2 (en) 2001-07-20 2008-10-14 Unirac, Inc. System for removably and adjustably mounting a device on a surface
US6882126B2 (en) * 2001-11-29 2005-04-19 Nikon Corporation Holder mover for a stage assembly
US7600349B2 (en) 2003-02-26 2009-10-13 Unirac, Inc. Low profile mounting system
CA2629355A1 (en) * 2005-11-17 2007-06-07 Socovar, Societe En Commandite Planar parallel mechanism and method
NL2006714A (en) * 2010-06-07 2011-12-08 Asml Netherlands Bv Displacement device, lithographic apparatus and positioning method.
CN103066894B (zh) * 2012-12-12 2015-05-20 清华大学 一种六自由度磁悬浮工件台
EP3527323B1 (en) * 2018-02-19 2022-06-08 General Electric Company Alignment tool and method for aligning heavy machinery and equipment

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3361018A (en) * 1965-10-08 1968-01-02 Elihu I. Druckman Spring mounted tool holder
NL7108235A (ja) * 1971-06-16 1972-12-19
EP0017044B1 (en) * 1979-04-02 1985-07-03 Eaton-Optimetrix Inc. A system for positioning a utilization device
US4575942A (en) * 1982-10-18 1986-03-18 Hitachi, Ltd. Ultra-precision two-dimensional moving apparatus
NL8204450A (nl) * 1982-11-17 1984-06-18 Philips Nv Verplaatsingsinrichting, in het bijzonder voor het stralingslithografisch behandelen van een substraat.
US4525852A (en) * 1983-03-15 1985-06-25 Micronix Partners Alignment apparatus
US4506204A (en) * 1983-06-10 1985-03-19 The Perkin-Elmer Corporation Electro-magnetic apparatus
US4506205A (en) * 1983-06-10 1985-03-19 The Perkin-Elmer Corporation Electro-magnetic alignment apparatus
US4507597A (en) * 1983-06-10 1985-03-26 The Perkin-Elmer Corporation Electro-magnetic alignment assemblies
US4509002A (en) * 1983-12-20 1985-04-02 International Business Machines Corporation Precision X-Y positioner
US4694477A (en) * 1983-12-21 1987-09-15 Hewlett-Packard Company Flexure stage alignment apparatus
NL8500930A (nl) * 1985-03-29 1986-10-16 Philips Nv Verplaatsingsinrichting met voorgespannen contactloze lagers.

Also Published As

Publication number Publication date
ATE127940T1 (de) 1995-09-15
DE3751515T2 (de) 1996-04-25
JPS62276612A (ja) 1987-12-01
EP0244012A1 (en) 1987-11-04
EP0244012B1 (en) 1995-09-13
JPH083756B2 (ja) 1996-01-17
US4698575A (en) 1987-10-06
DE3751515D1 (de) 1995-10-19

Similar Documents

Publication Publication Date Title
NL8601095A (nl) Positioneerinrichting.
US6281654B1 (en) Method for making apparatus with dynamic support structure isolation and exposure method
KR100625625B1 (ko) 기판, 스테이지 장치, 스테이지 구동 방법, 노광 장치 및노광 방법
US5839324A (en) Stage apparatus and exposure apparatus provided with the stage apparatus
US6897963B1 (en) Stage device and exposure apparatus
US6836093B1 (en) Exposure method and apparatus
US6989647B1 (en) Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
US20030098966A1 (en) Stage system and stage driving method for use in exposure apparatus
US6606146B2 (en) Stage device, exposure apparatus incorporating the stage device, and method of using the same
JP6862543B2 (ja) モータアセンブリ、リソグラフィ装置、及びデバイス製造方法
US20020109823A1 (en) Wafer stage assembly
US20030173833A1 (en) Wafer stage with magnetic bearings
JP2001307983A (ja) ステージ装置及び露光装置
KR20060109430A (ko) 스테이지 구동 방법, 스테이지 장치, 및 노광장치
EP1191580A1 (en) Stage device and exposure device
US6549268B1 (en) Exposure method and apparatus
EP1111469A2 (en) Lithographic apparatus with a balanced positioning system
US20010003028A1 (en) Scanning Exposure Method
US20070268475A1 (en) System and method for controlling a stage assembly
US5777721A (en) Exposure method and apparatus with control of a linear motor
JPH11251409A (ja) 位置決め装置、及び露光装置
WO2001081171A1 (en) Wafer stage with magnetic bearings
KR100660502B1 (ko) 조립체, 리소그래피 장치 및 디바이스 제조방법
JP2000243811A (ja) ステージ装置及び露光装置
US7283200B2 (en) System and method for measuring displacement of a stage

Legal Events

Date Code Title Description
A1B A search report has been drawn up
BV The patent application has lapsed