NL8304200A - Ferromagnetische resonator. - Google Patents
Ferromagnetische resonator. Download PDFInfo
- Publication number
- NL8304200A NL8304200A NL8304200A NL8304200A NL8304200A NL 8304200 A NL8304200 A NL 8304200A NL 8304200 A NL8304200 A NL 8304200A NL 8304200 A NL8304200 A NL 8304200A NL 8304200 A NL8304200 A NL 8304200A
- Authority
- NL
- Netherlands
- Prior art keywords
- ferromagnetic
- layer
- magnetic
- ferric
- magnetic field
- Prior art date
Links
- 230000005294 ferromagnetic effect Effects 0.000 title claims description 53
- 230000005291 magnetic effect Effects 0.000 claims description 68
- 239000010409 thin film Substances 0.000 claims description 17
- 230000005415 magnetization Effects 0.000 claims description 15
- 230000004044 response Effects 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 15
- 230000005350 ferromagnetic resonance Effects 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000000696 magnetic material Substances 0.000 claims 4
- 239000010408 film Substances 0.000 description 28
- 229920001721 polyimide Polymers 0.000 description 19
- 238000009826 distribution Methods 0.000 description 10
- 239000004642 Polyimide Substances 0.000 description 9
- 230000005540 biological transmission Effects 0.000 description 8
- 230000005284 excitation Effects 0.000 description 8
- ZPDRQAVGXHVGTB-UHFFFAOYSA-N gallium;gadolinium(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Gd+3] ZPDRQAVGXHVGTB-UHFFFAOYSA-N 0.000 description 7
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 6
- 238000005530 etching Methods 0.000 description 5
- 239000002223 garnet Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 4
- 239000002243 precursor Substances 0.000 description 4
- 230000002411 adverse Effects 0.000 description 3
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 3
- 239000011324 bead Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 238000013016 damping Methods 0.000 description 3
- 230000005347 demagnetization Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000007791 liquid phase Substances 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000001629 suppression Effects 0.000 description 2
- NWZSZGALRFJKBT-KNIFDHDWSA-N (2s)-2,6-diaminohexanoic acid;(2s)-2-hydroxybutanedioic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O.NCCCC[C@H](N)C(O)=O NWZSZGALRFJKBT-KNIFDHDWSA-N 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine monohydrate Substances O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- MTRJKZUDDJZTLA-UHFFFAOYSA-N iron yttrium Chemical compound [Fe].[Y] MTRJKZUDDJZTLA-UHFFFAOYSA-N 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
- H01P1/00—Auxiliary devices
- H01P1/20—Frequency-selective devices, e.g. filters
- H01P1/215—Frequency-selective devices, e.g. filters using ferromagnetic material
Landscapes
- Control Of Motors That Do Not Use Commutators (AREA)
- Thin Magnetic Films (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21442682A JPS59103403A (ja) | 1982-12-06 | 1982-12-06 | 磁気共鳴装置 |
| JP21442782A JPS59103404A (ja) | 1982-12-06 | 1982-12-06 | 磁気共鳴装置 |
| JP21442782 | 1982-12-06 | ||
| JP21442682 | 1982-12-06 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL8304200A true NL8304200A (nl) | 1984-07-02 |
Family
ID=26520317
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL8304200A NL8304200A (nl) | 1982-12-06 | 1983-12-06 | Ferromagnetische resonator. |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4547754A (enExample) |
| CA (1) | CA1204181A (enExample) |
| DE (1) | DE3344079A1 (enExample) |
| FR (1) | FR2537346B1 (enExample) |
| GB (1) | GB2132822B (enExample) |
| NL (1) | NL8304200A (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60189205A (ja) * | 1984-03-08 | 1985-09-26 | Sony Corp | 磁気装置 |
| JPH0770918B2 (ja) * | 1984-06-05 | 1995-07-31 | ソニー株式会社 | 同調発振器 |
| JPH0628332B2 (ja) * | 1984-06-05 | 1994-04-13 | ソニー株式会社 | 受信機 |
| JPS61224702A (ja) * | 1985-03-29 | 1986-10-06 | Sony Corp | 強磁性共鳴装置 |
| JPS63103501A (ja) * | 1986-10-20 | 1988-05-09 | Sony Corp | 強磁性共鳴装置 |
| GB2198006B (en) * | 1986-11-28 | 1991-04-17 | Sony Corp | Thin film ferromagnetic resonance tuned filters |
| US4782312A (en) * | 1987-10-22 | 1988-11-01 | Hewlett-Packard Company | Mode selective magnetostatic wave resonators |
| US4992760A (en) * | 1987-11-27 | 1991-02-12 | Hitachi Metals, Ltd. | Magnetostatic wave device and chip therefor |
| US4845439A (en) * | 1988-03-18 | 1989-07-04 | Westinghouse Electric Corp. | Frequency selective limiting device |
| US4998080A (en) * | 1989-06-02 | 1991-03-05 | Polytechnic University | Microwave channelizer based on coupled YIG resonators |
| GB2235339B (en) * | 1989-08-15 | 1994-02-09 | Racal Mesl Ltd | Microwave resonators and microwave filters incorporating microwave resonators |
| JP2779057B2 (ja) * | 1990-10-25 | 1998-07-23 | 信越化学工業株式会社 | 静磁波素子用チップおよび静磁波素子 |
| JP2565050B2 (ja) * | 1992-02-12 | 1996-12-18 | 株式会社村田製作所 | 静磁波共振器 |
| JP2967224B2 (ja) * | 1995-06-28 | 1999-10-25 | 株式会社村田製作所 | 強磁性共鳴測定用空洞共振器 |
| US5889402A (en) * | 1995-06-28 | 1999-03-30 | Murata Manufacturing Co., Ltd. | Ferromagnetic resonance measuring cavity resonator and electron spin resonance measuring apparatus having same |
| EP0929114A4 (en) * | 1997-07-24 | 2004-06-09 | Tdk Corp | MAGNETOSTATIC SHAFT ARRANGEMENT |
| KR100361938B1 (ko) * | 2000-08-18 | 2002-11-22 | 학교법인 포항공과대학교 | 유전체 기판의 공진장치 |
| US6933866B1 (en) | 2004-09-14 | 2005-08-23 | Avid Technology, Inc. | Variable data rate receiver |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1198866B (de) * | 1962-03-30 | 1965-08-19 | Siemens Ag | Piezoelektrischer scheibenfoermiger Radialschwinger |
| GB1143750A (enExample) * | 1965-05-17 | |||
| JPS5132252B1 (enExample) * | 1970-05-21 | 1976-09-11 | ||
| US3745385A (en) * | 1972-01-31 | 1973-07-10 | Matsushita Electric Industrial Co Ltd | Piezoelectric ceramic resonator |
| US4152676A (en) * | 1977-01-24 | 1979-05-01 | Massachusetts Institute Of Technology | Electromagnetic signal processor forming localized regions of magnetic wave energy in gyro-magnetic material |
| DE2803440C2 (de) * | 1978-01-26 | 1983-11-10 | Gesellschaft für Strahlen- und Umweltforschung mbH, 8000 München | Gerät zum Messen der Radioaktivitätskonzentration in einem Gas mit einer Meßkammer und mit einem dieser vorgeschalteten Kompressor |
-
1983
- 1983-12-02 CA CA000442441A patent/CA1204181A/en not_active Expired
- 1983-12-05 US US06/557,953 patent/US4547754A/en not_active Expired - Fee Related
- 1983-12-06 FR FR8319515A patent/FR2537346B1/fr not_active Expired
- 1983-12-06 DE DE19833344079 patent/DE3344079A1/de active Granted
- 1983-12-06 GB GB08332472A patent/GB2132822B/en not_active Expired
- 1983-12-06 NL NL8304200A patent/NL8304200A/nl not_active Application Discontinuation
Also Published As
| Publication number | Publication date |
|---|---|
| GB2132822B (en) | 1986-07-23 |
| GB2132822A (en) | 1984-07-11 |
| FR2537346A1 (fr) | 1984-06-08 |
| US4547754A (en) | 1985-10-15 |
| FR2537346B1 (fr) | 1987-08-14 |
| DE3344079C2 (enExample) | 1993-03-11 |
| CA1204181A (en) | 1986-05-06 |
| DE3344079A1 (de) | 1984-06-07 |
| GB8332472D0 (en) | 1984-01-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A85 | Still pending on 85-01-01 | ||
| BA | A request for search or an international-type search has been filed | ||
| BB | A search report has been drawn up | ||
| BC | A request for examination has been filed | ||
| BV | The patent application has lapsed |