NL7903476A - Werkwijze voor het orienteren van de molekulen van mesofasen, alsmede inrichting voor het uitvoeren van deze werkwijze en een inrichting met een vloeibaar kristal. - Google Patents
Werkwijze voor het orienteren van de molekulen van mesofasen, alsmede inrichting voor het uitvoeren van deze werkwijze en een inrichting met een vloeibaar kristal.Info
- Publication number
- NL7903476A NL7903476A NL7903476A NL7903476A NL7903476A NL 7903476 A NL7903476 A NL 7903476A NL 7903476 A NL7903476 A NL 7903476A NL 7903476 A NL7903476 A NL 7903476A NL 7903476 A NL7903476 A NL 7903476A
- Authority
- NL
- Netherlands
- Prior art keywords
- molekulen
- mesofases
- orienting
- liquid crystal
- well
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K2323/00—Functional layers of liquid crystal optical display excluding electroactive liquid crystal layer characterised by chemical composition
- C09K2323/05—Bonding or intermediate layer characterised by chemical composition, e.g. sealant or spacer
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133765—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers without a surface treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/91—Product with molecular orientation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/913—Material designed to be responsive to temperature, light, moisture
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
- Y10T428/24612—Composite web or sheet
- Y10T428/2462—Composite web or sheet with partial filling of valleys on outer surface
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24851—Intermediate layer is discontinuous or differential
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24851—Intermediate layer is discontinuous or differential
- Y10T428/24868—Translucent outer layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24926—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including ceramic, glass, porcelain or quartz layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/261—In terms of molecular thickness or light wave length
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Liquid Crystal (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/902,332 US4256787A (en) | 1978-05-03 | 1978-05-03 | Orientation of ordered liquids and their use in devices |
Publications (1)
Publication Number | Publication Date |
---|---|
NL7903476A true NL7903476A (nl) | 1979-11-06 |
Family
ID=25415704
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7903476A NL7903476A (nl) | 1978-05-03 | 1979-05-03 | Werkwijze voor het orienteren van de molekulen van mesofasen, alsmede inrichting voor het uitvoeren van deze werkwijze en een inrichting met een vloeibaar kristal. |
Country Status (9)
Country | Link |
---|---|
US (2) | US4256787A (ja) |
EP (1) | EP0011644B1 (ja) |
JP (1) | JPS55500338A (ja) |
CA (1) | CA1151273A (ja) |
CH (1) | CH631595B (ja) |
DE (1) | DE2948809A1 (ja) |
GB (1) | GB2036356B (ja) |
NL (1) | NL7903476A (ja) |
WO (1) | WO1979001025A1 (ja) |
Families Citing this family (103)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4256787A (en) * | 1978-05-03 | 1981-03-17 | Massachusetts Institute Of Technology | Orientation of ordered liquids and their use in devices |
US4361643A (en) * | 1981-01-05 | 1982-11-30 | Western Electric Co., Inc. | Photomask and method of using same |
US4405701A (en) * | 1981-07-29 | 1983-09-20 | Western Electric Co. | Methods of fabricating a photomask |
IL66969A (en) * | 1981-11-04 | 1986-09-30 | Hughes Aircraft Co | Parallel alignment of liquid crystals on conductive substrates |
US4542960A (en) * | 1982-06-30 | 1985-09-24 | International Business Machines Corporation | Fringe-field switched storage-effect liquid crystal display devices |
US4448823A (en) * | 1982-09-29 | 1984-05-15 | Clifford Brad W | Multi-colored liquid crystal display device |
GB8318863D0 (en) * | 1983-07-12 | 1983-08-10 | Secr Defence | Thermochromic liquid crystal displays |
FR2560296A1 (fr) * | 1984-01-10 | 1985-08-30 | Kafcsak Joseph | Moteur rotatif industriel a energie marine |
JPS60179004A (ja) * | 1984-02-24 | 1985-09-12 | ワイケイケイ株式会社 | スライドフアスナ− |
DE3424530A1 (de) * | 1984-03-02 | 1985-09-05 | BBC Aktiengesellschaft Brown, Boveri & Cie., Baden, Aargau | Verfahren zur herstellung einer orientierungsschicht auf einer ebenen oberflaeche einer platte und vorrichtung zur durchfuehrung des verfahrens |
JPS60220316A (ja) * | 1984-04-16 | 1985-11-05 | Canon Inc | 液晶光学素子 |
JPS6199330A (ja) * | 1984-10-22 | 1986-05-17 | Hitachi Ltd | パタ−ン形成方法 |
US4732830A (en) * | 1984-11-13 | 1988-03-22 | Copytele, Inc. | Electrophoretic display panels and associated methods |
US4707078A (en) * | 1985-04-26 | 1987-11-17 | American Telephone And Telegraph Company, At&T Bell Laboratories | Ferroelectric liquid crystal devices using field-stabilized states |
US4688897A (en) * | 1985-06-17 | 1987-08-25 | Hughes Aircraft Company | Liquid crystal device |
US4693561A (en) * | 1985-12-23 | 1987-09-15 | The United States Of America As Represented By The Secretary Of The Army | Amorphous silicon spatial light modulator |
JPH0820638B2 (ja) * | 1986-08-08 | 1996-03-04 | 株式会社半導体エネルギ−研究所 | 液晶装置およびその作製方法 |
NL8602337A (nl) * | 1986-09-16 | 1988-04-18 | Philips Nv | Werkwijze voor de vervaardiging van een optische vezel. |
US5122888A (en) * | 1987-07-10 | 1992-06-16 | Canon Kabushiki Kaisha | Focusing plate having phase grating formed by using liquid crystal |
DE3843228A1 (de) * | 1988-12-22 | 1990-06-28 | Hoechst Ag | Ferroelektrisches fluessigkristall-schalt- und anzeige-element mit verminderter optischer hysterese |
US5136404A (en) * | 1990-08-09 | 1992-08-04 | Western Publishing Company | Liquid crystal writing slate with improved light-transmission retention |
US5117297A (en) * | 1990-08-09 | 1992-05-26 | Western Publishing Company | Liquid crystal writing slate with DC imaging system |
US5111316A (en) * | 1990-08-09 | 1992-05-05 | Western Publishing Company | Liquid crystal writing state |
US5115330A (en) * | 1990-08-09 | 1992-05-19 | Western Publishing Company | Liquid crystal writing slate |
US5438421A (en) * | 1991-04-24 | 1995-08-01 | Alps Electric Co., Ltd. | Orientation film of liquid crystal having bilaterally asymmetric ridges separated by grooves |
GB9110277D0 (en) * | 1991-05-11 | 1991-07-03 | The Technology Partnership Ltd | Surface relief optical polariser |
US5249355A (en) * | 1991-10-31 | 1993-10-05 | Hughes Aircraft Company | Method of fabricating a multilayer electrical circuit structure |
GB2265036B (en) * | 1992-03-10 | 1995-08-02 | Sharp Kk | Optical processor and neuromorphic processor |
GB2265023A (en) * | 1992-03-10 | 1993-09-15 | Sharp Kk | Liquid crystal device; linear algebraic processor |
US5365356A (en) * | 1992-08-11 | 1994-11-15 | Minnesota Mining And Manufacturing Company | Method of fabricating an encapsulated liquid crystal display |
JPH06337416A (ja) * | 1993-04-02 | 1994-12-06 | Alps Electric Co Ltd | 液晶素子の配向膜及びその製造方法 |
GB9402492D0 (en) * | 1994-02-09 | 1994-03-30 | Secr Defence | Liquid crystal device alignment |
GB9402516D0 (en) * | 1994-02-09 | 1994-03-30 | Secr Defence | Liquid crystal device alignment |
JP3195172B2 (ja) * | 1994-09-21 | 2001-08-06 | アルプス電気株式会社 | 液晶表示素子およびその製造方法 |
GB2312523B (en) * | 1995-02-10 | 1998-10-07 | Secr Defence | Liquid crystal device alignment |
GB9502635D0 (en) * | 1995-02-10 | 1995-03-29 | Secr Defence | Liquid crystal device alignment |
US5742373A (en) * | 1995-10-13 | 1998-04-21 | Massachusetts Institute Of Technology | Color microdisplays and methods of manufacturing same |
US5938887A (en) * | 1996-08-02 | 1999-08-17 | Daimlerchrysler Corporation | Apparatus for forming a trim panel with 180° periphery edge wrap |
JP3720515B2 (ja) * | 1997-03-13 | 2005-11-30 | キヤノン株式会社 | 基板処理装置及びその方法並びに基板の製造方法 |
US5982553A (en) * | 1997-03-20 | 1999-11-09 | Silicon Light Machines | Display device incorporating one-dimensional grating light-valve array |
US6088102A (en) * | 1997-10-31 | 2000-07-11 | Silicon Light Machines | Display apparatus including grating light-valve array and interferometric optical system |
US6383890B2 (en) | 1997-12-26 | 2002-05-07 | Canon Kabushiki Kaisha | Wafer bonding method, apparatus and vacuum chuck |
US6271808B1 (en) | 1998-06-05 | 2001-08-07 | Silicon Light Machines | Stereo head mounted display using a single display device |
US6101036A (en) * | 1998-06-23 | 2000-08-08 | Silicon Light Machines | Embossed diffraction grating alone and in combination with changeable image display |
US6130770A (en) * | 1998-06-23 | 2000-10-10 | Silicon Light Machines | Electron gun activated grating light valve |
US6215579B1 (en) | 1998-06-24 | 2001-04-10 | Silicon Light Machines | Method and apparatus for modulating an incident light beam for forming a two-dimensional image |
EP0969517B1 (en) | 1998-07-04 | 2005-10-12 | International Business Machines Corporation | Electrode for use in electro-optical devices |
US6872984B1 (en) | 1998-07-29 | 2005-03-29 | Silicon Light Machines Corporation | Method of sealing a hermetic lid to a semiconductor die at an angle |
US6303986B1 (en) * | 1998-07-29 | 2001-10-16 | Silicon Light Machines | Method of and apparatus for sealing an hermetic lid to a semiconductor die |
CN100442125C (zh) * | 1998-09-18 | 2008-12-10 | 夏普株式会社 | 液晶显示装置 |
JP3407707B2 (ja) * | 1999-12-20 | 2003-05-19 | 日本電気株式会社 | 垂直配向型マルチドメイン液晶表示装置 |
US6956878B1 (en) | 2000-02-07 | 2005-10-18 | Silicon Light Machines Corporation | Method and apparatus for reducing laser speckle using polarization averaging |
US6387723B1 (en) * | 2001-01-19 | 2002-05-14 | Silicon Light Machines | Reduced surface charging in silicon-based devices |
US7177081B2 (en) * | 2001-03-08 | 2007-02-13 | Silicon Light Machines Corporation | High contrast grating light valve type device |
US20030208753A1 (en) * | 2001-04-10 | 2003-11-06 | Silicon Light Machines | Method, system, and display apparatus for encrypted cinema |
US6707591B2 (en) * | 2001-04-10 | 2004-03-16 | Silicon Light Machines | Angled illumination for a single order light modulator based projection system |
US6411354B1 (en) * | 2001-05-11 | 2002-06-25 | Kent State University | Bulk alignment of lyotropic chromonic liquid crystals |
US6673398B2 (en) | 2001-05-14 | 2004-01-06 | Kent State University | Alignment of lyotropic chromonic liquid crystals at surfaces as monolayers and multilayered stacks |
US6865346B1 (en) | 2001-06-05 | 2005-03-08 | Silicon Light Machines Corporation | Fiber optic transceiver |
US6747781B2 (en) * | 2001-06-25 | 2004-06-08 | Silicon Light Machines, Inc. | Method, apparatus, and diffuser for reducing laser speckle |
US6782205B2 (en) * | 2001-06-25 | 2004-08-24 | Silicon Light Machines | Method and apparatus for dynamic equalization in wavelength division multiplexing |
US6646778B2 (en) * | 2001-08-01 | 2003-11-11 | Silicon Light Machines | Grating light valve with encapsulated dampening gas |
US6829092B2 (en) * | 2001-08-15 | 2004-12-07 | Silicon Light Machines, Inc. | Blazed grating light valve |
US6639722B2 (en) * | 2001-08-15 | 2003-10-28 | Silicon Light Machines | Stress tuned blazed grating light valve |
US6930364B2 (en) | 2001-09-13 | 2005-08-16 | Silicon Light Machines Corporation | Microelectronic mechanical system and methods |
US6956995B1 (en) | 2001-11-09 | 2005-10-18 | Silicon Light Machines Corporation | Optical communication arrangement |
US6692129B2 (en) * | 2001-11-30 | 2004-02-17 | Silicon Light Machines | Display apparatus including RGB color combiner and 1D light valve relay including schlieren filter |
US6800238B1 (en) | 2002-01-15 | 2004-10-05 | Silicon Light Machines, Inc. | Method for domain patterning in low coercive field ferroelectrics |
DE60332784D1 (de) | 2002-02-13 | 2010-07-15 | Merck Patent Gmbh | Verfahren zur Herstellung von einem anisotropen Polymerfilm auf einem Substrat mit einer strukturierten Oberfläche |
EP2209027A1 (en) * | 2002-02-13 | 2010-07-21 | MERCK PATENT GmbH | Security marking comprising an anisotropic polymer film on a substrate with a structured surface |
US6767751B2 (en) | 2002-05-28 | 2004-07-27 | Silicon Light Machines, Inc. | Integrated driver process flow |
US6728023B1 (en) | 2002-05-28 | 2004-04-27 | Silicon Light Machines | Optical device arrays with optimized image resolution |
US6839479B2 (en) * | 2002-05-29 | 2005-01-04 | Silicon Light Machines Corporation | Optical switch |
US7054515B1 (en) | 2002-05-30 | 2006-05-30 | Silicon Light Machines Corporation | Diffractive light modulator-based dynamic equalizer with integrated spectral monitor |
US6822797B1 (en) | 2002-05-31 | 2004-11-23 | Silicon Light Machines, Inc. | Light modulator structure for producing high-contrast operation using zero-order light |
US6829258B1 (en) | 2002-06-26 | 2004-12-07 | Silicon Light Machines, Inc. | Rapidly tunable external cavity laser |
US6908201B2 (en) * | 2002-06-28 | 2005-06-21 | Silicon Light Machines Corporation | Micro-support structures |
US6714337B1 (en) | 2002-06-28 | 2004-03-30 | Silicon Light Machines | Method and device for modulating a light beam and having an improved gamma response |
US6813059B2 (en) * | 2002-06-28 | 2004-11-02 | Silicon Light Machines, Inc. | Reduced formation of asperities in contact micro-structures |
US7057795B2 (en) | 2002-08-20 | 2006-06-06 | Silicon Light Machines Corporation | Micro-structures with individually addressable ribbon pairs |
US6801354B1 (en) | 2002-08-20 | 2004-10-05 | Silicon Light Machines, Inc. | 2-D diffraction grating for substantially eliminating polarization dependent losses |
US6712480B1 (en) | 2002-09-27 | 2004-03-30 | Silicon Light Machines | Controlled curvature of stressed micro-structures |
US6928207B1 (en) | 2002-12-12 | 2005-08-09 | Silicon Light Machines Corporation | Apparatus for selectively blocking WDM channels |
US6987600B1 (en) | 2002-12-17 | 2006-01-17 | Silicon Light Machines Corporation | Arbitrary phase profile for better equalization in dynamic gain equalizer |
US7057819B1 (en) | 2002-12-17 | 2006-06-06 | Silicon Light Machines Corporation | High contrast tilting ribbon blazed grating |
US6934070B1 (en) | 2002-12-18 | 2005-08-23 | Silicon Light Machines Corporation | Chirped optical MEM device |
US6927891B1 (en) | 2002-12-23 | 2005-08-09 | Silicon Light Machines Corporation | Tilt-able grating plane for improved crosstalk in 1×N blaze switches |
US7068372B1 (en) | 2003-01-28 | 2006-06-27 | Silicon Light Machines Corporation | MEMS interferometer-based reconfigurable optical add-and-drop multiplexor |
US7286764B1 (en) | 2003-02-03 | 2007-10-23 | Silicon Light Machines Corporation | Reconfigurable modulator-based optical add-and-drop multiplexer |
EP1445645A1 (en) * | 2003-02-07 | 2004-08-11 | ZBD Displays Ltd, | Liquid crystal device |
US6947613B1 (en) | 2003-02-11 | 2005-09-20 | Silicon Light Machines Corporation | Wavelength selective switch and equalizer |
US6922272B1 (en) | 2003-02-14 | 2005-07-26 | Silicon Light Machines Corporation | Method and apparatus for leveling thermal stress variations in multi-layer MEMS devices |
US6922273B1 (en) | 2003-02-28 | 2005-07-26 | Silicon Light Machines Corporation | PDL mitigation structure for diffractive MEMS and gratings |
US6806997B1 (en) | 2003-02-28 | 2004-10-19 | Silicon Light Machines, Inc. | Patterned diffractive light modulator ribbon for PDL reduction |
US7027202B1 (en) | 2003-02-28 | 2006-04-11 | Silicon Light Machines Corp | Silicon substrate as a light modulator sacrificial layer |
US7391973B1 (en) | 2003-02-28 | 2008-06-24 | Silicon Light Machines Corporation | Two-stage gain equalizer |
US7042611B1 (en) | 2003-03-03 | 2006-05-09 | Silicon Light Machines Corporation | Pre-deflected bias ribbons |
US20050237462A1 (en) * | 2004-04-26 | 2005-10-27 | Eastman Kodak Company | Alignment layer for liquid crystal display |
JP2006126371A (ja) * | 2004-10-27 | 2006-05-18 | Nissan Motor Co Ltd | 調光材料、これを用いた車両、および調光材料の製造方法 |
KR20070037864A (ko) * | 2005-10-04 | 2007-04-09 | 엘지.필립스 엘시디 주식회사 | 액정 표시패널과 그의 제조방법 |
CN100529807C (zh) * | 2005-12-30 | 2009-08-19 | 鸿富锦精密工业(深圳)有限公司 | 偏光片的制造方法 |
KR101350873B1 (ko) * | 2007-03-08 | 2014-01-13 | 삼성디스플레이 주식회사 | 액정 표시 장치 |
US20140091056A1 (en) * | 2011-03-21 | 2014-04-03 | Industrial Technology Research Institute | Manufacturing method of phase retardation film and manufacturing system configured to produce phase retardation film |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3499702A (en) * | 1967-12-05 | 1970-03-10 | Rca Corp | Nematic liquid crystal mixtures for use in a light valve |
US3787110A (en) * | 1972-06-23 | 1974-01-22 | Bell Telephone Labor Inc | Liquid crystal devices |
FR2189767B1 (ja) * | 1972-06-23 | 1976-06-11 | Western Electric Co | |
DE2256317B2 (de) * | 1972-11-16 | 1977-05-26 | Ausscheidung in: 22 65 253 Siemens AG, 1000 Berlin und 8000 München | Verfahren zur erzeugung einer homogenen orientierung von fluessigkristallmolekuelen in einer fluessigkristallanordnung |
JPS5310448A (en) * | 1976-07-16 | 1978-01-30 | Seiko Epson Corp | Liquid crystal display device |
US4256787A (en) * | 1978-05-03 | 1981-03-17 | Massachusetts Institute Of Technology | Orientation of ordered liquids and their use in devices |
-
1978
- 1978-05-03 US US05/902,332 patent/US4256787A/en not_active Expired - Lifetime
-
1979
- 1979-05-01 GB GB7943311A patent/GB2036356B/en not_active Expired
- 1979-05-01 DE DE792948809A patent/DE2948809A1/de not_active Withdrawn
- 1979-05-01 JP JP50078879A patent/JPS55500338A/ja active Pending
- 1979-05-01 CH CH24480A patent/CH631595B/de unknown
- 1979-05-01 WO PCT/US1979/000286 patent/WO1979001025A1/en unknown
- 1979-05-03 NL NL7903476A patent/NL7903476A/xx not_active Application Discontinuation
- 1979-05-03 CA CA000326867A patent/CA1151273A/en not_active Expired
- 1979-12-04 EP EP79900513A patent/EP0011644B1/en not_active Expired
-
1980
- 1980-05-13 US US06/149,483 patent/US4370194A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
GB2036356B (en) | 1983-04-20 |
DE2948809A1 (en) | 1980-12-11 |
CH631595B (de) | |
JPS55500338A (ja) | 1980-06-12 |
EP0011644B1 (en) | 1986-03-19 |
US4256787A (en) | 1981-03-17 |
US4370194A (en) | 1983-01-25 |
EP0011644A4 (en) | 1980-09-29 |
GB2036356A (en) | 1980-06-25 |
EP0011644A1 (en) | 1980-06-11 |
CH631595GA3 (ja) | 1982-08-31 |
CA1151273A (en) | 1983-08-02 |
WO1979001025A1 (en) | 1979-11-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
NL7903476A (nl) | Werkwijze voor het orienteren van de molekulen van mesofasen, alsmede inrichting voor het uitvoeren van deze werkwijze en een inrichting met een vloeibaar kristal. | |
NL7802338A (nl) | Werkwijze voor het concentreren van vloeibare voedingsmiddelen en dergelijke. | |
NL7702120A (nl) | Werkwijze en inrichting voor het aanbrengen van etiketten op produkten, alsmede het pro- dukt van de werkwijze. | |
NL7710897A (nl) | Werkwijze en inrichting voor het oprichten van koepelvormige bouwconstructies. | |
NL7711158A (nl) | Werkwijze en inrichting voor het bevestigen van ophangogen. | |
NL7714125A (nl) | Werkwijze en inrichting voor het overbrengen van vloeistof. | |
NL7810362A (nl) | Werkwijze en inrichting voor het uitvoeren van behande- lingsprocessen voor stortmaterialen en dergelijke. | |
NL7711587A (nl) | Werkwijze en inrichting voor het begassen van een vloeistof. | |
NL7808856A (nl) | Werkwijze alsmede inrichting voor het veranderen van de concentraties van oplossingen. | |
NL7808900A (nl) | Werkwijze voor het verlagen van de concentratie van nitrosaminen in dinitroanilinen. | |
NL7801900A (nl) | Entpolymeren, werkwijze voor het bereiden daar- van en apparaat voor het uitvoeren van deze werkwijze. | |
NL7705881A (nl) | Pyridineverbindingen, werkwijze voor het berei- den van dergelijke pyridineverbindingen, werkwijze voor het bereiden van farmaceutische preparaten met dergmlijke pyridineverbindingen alsmede de gevormde preparaten. | |
NL7610831A (nl) | Werkwijze en inrichting voor het bewaken van de hartfunctie. | |
NL7811740A (nl) | Telecopieerwerkwijze gebruikmakende van een vloeibaar kristal, alsmede telecopieerinrichting voor het uitvoeren van deze werkwijze. | |
NL173080C (nl) | Werkwijze voor het verstevigen van de bodem, alsmede inrichting voor het uitvoeren van deze werkwijze. | |
NL7811391A (nl) | Werkwijze en inrichting voor het vervaardigen van tandwielen. | |
NL7702663A (nl) | Werkwijze en inrichting voor het behandelen van een vloeistof. | |
NL7608518A (nl) | Werkwijze en inrichting voor de bepaling van het anorganische koolstofgehalte van een vloeistof. | |
NL7713071A (nl) | Werkwijze en inrichting voor het ontstapelen. | |
NL7806696A (nl) | Werkwijze voor het karakteriseren van kristallen. | |
NL7612952A (nl) | Werkwijze en inrichting voor de schuine orientatie van de moleculen van een vloeibaar kristal. | |
NL7904174A (nl) | Inrichting voor het kweken van slakken en werkwijze voor het toepassen van een dergelijke inrichting. | |
NL7712718A (nl) | Werkwijze voor het bereiden en toepassen van 7-0-alkylnogarolen. | |
NL7805328A (nl) | Azacyclylverbindingen en werkwijze voor het bereiden ervan. | |
NL184705C (nl) | Werkwijze voor de vervaardiging van een inrichting voor vloeistofchromatografie, alsmede werkwijze voor het uitvoeren van vloeistofchromatografie. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A85 | Still pending on 85-01-01 | ||
BV | The patent application has lapsed |