NL7810069A - Lithografische drukplaat met dubbele lichtgevoelige laag. - Google Patents

Lithografische drukplaat met dubbele lichtgevoelige laag.

Info

Publication number
NL7810069A
NL7810069A NL7810069A NL7810069A NL7810069A NL 7810069 A NL7810069 A NL 7810069A NL 7810069 A NL7810069 A NL 7810069A NL 7810069 A NL7810069 A NL 7810069A NL 7810069 A NL7810069 A NL 7810069A
Authority
NL
Netherlands
Prior art keywords
pressure plate
sensitive layer
double light
lithographic pressure
lithographic
Prior art date
Application number
NL7810069A
Other languages
English (en)
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of NL7810069A publication Critical patent/NL7810069A/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Graft Or Block Polymers (AREA)
NL7810069A 1977-10-06 1978-10-05 Lithografische drukplaat met dubbele lichtgevoelige laag. NL7810069A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US83996777A 1977-10-06 1977-10-06

Publications (1)

Publication Number Publication Date
NL7810069A true NL7810069A (nl) 1979-04-10

Family

ID=25281112

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7810069A NL7810069A (nl) 1977-10-06 1978-10-05 Lithografische drukplaat met dubbele lichtgevoelige laag.

Country Status (6)

Country Link
JP (1) JPS5472104A (nl)
AU (1) AU526602B2 (nl)
DE (1) DE2843762A1 (nl)
FR (1) FR2405500A1 (nl)
NL (1) NL7810069A (nl)
SE (1) SE7810325L (nl)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8001085A (nl) * 1979-02-27 1980-08-29 Minnesota Mining & Mfg Fotogevoelige materialen en voorwerpen.
JPS57141640A (en) * 1981-02-03 1982-09-02 Konishiroku Photo Ind Co Ltd Photosensitive image forming material
JPS58139143A (ja) * 1982-02-12 1983-08-18 Daicel Chem Ind Ltd スクリ−ン製版用感光性材料
JP4291638B2 (ja) 2003-07-29 2009-07-08 富士フイルム株式会社 アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版
JP4429116B2 (ja) 2004-08-27 2010-03-10 富士フイルム株式会社 平版印刷版原版及び平版印刷版の製版方法
EP1701213A3 (en) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Photosensitive composition
JP4574506B2 (ja) 2005-03-23 2010-11-04 富士フイルム株式会社 平版印刷版原版、及びその製版方法
JP4368323B2 (ja) 2005-03-25 2009-11-18 富士フイルム株式会社 感光性平版印刷版
JP4457034B2 (ja) 2005-03-28 2010-04-28 富士フイルム株式会社 感光性平版印刷版
JP4524235B2 (ja) 2005-03-29 2010-08-11 富士フイルム株式会社 平版印刷版原版
JP4701042B2 (ja) 2005-08-22 2011-06-15 富士フイルム株式会社 感光性平版印刷版
JP4777226B2 (ja) 2006-12-07 2011-09-21 富士フイルム株式会社 画像記録材料、及び新規化合物
JP4860525B2 (ja) 2007-03-27 2012-01-25 富士フイルム株式会社 硬化性組成物及び平版印刷版原版
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP4890408B2 (ja) 2007-09-28 2012-03-07 富士フイルム株式会社 重合性組成物及びそれを用いた平版印刷版原版、アルカリ可溶性ポリウレタン樹脂、並びに、ジオール化合物の製造方法
JP4994175B2 (ja) 2007-09-28 2012-08-08 富士フイルム株式会社 平版印刷版原版、及びそれに用いる共重合体の製造方法
JP2009086373A (ja) 2007-09-28 2009-04-23 Fujifilm Corp ネガ型平版印刷版の現像方法
EP2204698B1 (en) 2009-01-06 2018-08-08 FUJIFILM Corporation Plate surface treatment agent for lithographic printing plate and method for treating lithographic printing plate
CN103782241B (zh) 2011-09-15 2017-04-26 富士胶片株式会社 制版处理废液的再循环方法
JP5819275B2 (ja) 2011-11-04 2015-11-24 富士フイルム株式会社 製版処理廃液のリサイクル方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1547849A1 (de) * 1966-07-13 1969-12-11 Fmc Corp Lichtempfindliche Masse
US3905815A (en) * 1971-12-17 1975-09-16 Minnesota Mining & Mfg Photopolymerizable sheet material with diazo resin layer
SU542661A1 (ru) * 1974-10-28 1977-01-15 Украинский Научно-Исследовательский Институт Полиграфической Промышленности Фотополимерна печатна форма

Also Published As

Publication number Publication date
AU526602B2 (en) 1983-01-20
JPS5472104A (en) 1979-06-09
SE7810325L (sv) 1979-04-07
AU4029378A (en) 1980-04-03
FR2405500B1 (nl) 1983-11-18
FR2405500A1 (fr) 1979-05-04
DE2843762A1 (de) 1979-04-12

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Legal Events

Date Code Title Description
A85 Still pending on 85-01-01
BV The patent application has lapsed