NL7802830A - Tetra:ethyl-ammonium per:fluoroalkyl sulphonate prepn. - by reacting per:fluoro-alkylsulphonyl fluoride with tri:ethylamine and alkoxy-silane - Google Patents

Tetra:ethyl-ammonium per:fluoroalkyl sulphonate prepn. - by reacting per:fluoro-alkylsulphonyl fluoride with tri:ethylamine and alkoxy-silane

Info

Publication number
NL7802830A
NL7802830A NL7802830A NL7802830A NL7802830A NL 7802830 A NL7802830 A NL 7802830A NL 7802830 A NL7802830 A NL 7802830A NL 7802830 A NL7802830 A NL 7802830A NL 7802830 A NL7802830 A NL 7802830A
Authority
NL
Netherlands
Prior art keywords
per
prepn
alkylsulphonyl
ethylamine
tetra
Prior art date
Application number
NL7802830A
Other languages
Dutch (nl)
Other versions
NL189707B (en
NL189707C (en
Original Assignee
Bayer Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bayer Ag filed Critical Bayer Ag
Priority to NLAANVRAGE7802830,A priority Critical patent/NL189707C/en
Publication of NL7802830A publication Critical patent/NL7802830A/en
Publication of NL189707B publication Critical patent/NL189707B/en
Application granted granted Critical
Publication of NL189707C publication Critical patent/NL189707C/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/04—Esters of silicic acids
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C07F7/1872—Preparation; Treatments not provided for in C07F7/20
    • C07F7/1888—Preparation; Treatments not provided for in C07F7/20 by reactions involving the formation of other Si-linkages, e.g. Si-N
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

Perfluoroalkyl-(C4-C10) sulphonyl fluorides are reacted with (C2H5)3N and stoichiometric excess of an ethoxysilane in an inert solvent at 10-60 degrees C for prepn. of tetraethylammonium perfluoroalkylsulphonates of formula (C2H5)4N encircled + RF SO3 encircled - (I) (where RF is perfluorinated 4-10C alkyl). The octyl deriv. of (I) is used in hard chromium plating metal surfacing, as a mould-releasing agent in thermoplastic injection moulding, as a wetting agent in the acid polishing of glass and in photographic emulsion applications. The deriv. is used in polarography as a conductivity salt. Yields of 92% are obtd.
NLAANVRAGE7802830,A 1978-03-15 1978-03-15 PROCESS FOR PREPARING TETRA-ETHYLAMMONIUM PERFLUORALKYL SULFONATE. NL189707C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
NLAANVRAGE7802830,A NL189707C (en) 1978-03-15 1978-03-15 PROCESS FOR PREPARING TETRA-ETHYLAMMONIUM PERFLUORALKYL SULFONATE.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NLAANVRAGE7802830,A NL189707C (en) 1978-03-15 1978-03-15 PROCESS FOR PREPARING TETRA-ETHYLAMMONIUM PERFLUORALKYL SULFONATE.

Publications (3)

Publication Number Publication Date
NL7802830A true NL7802830A (en) 1979-09-18
NL189707B NL189707B (en) 1993-02-01
NL189707C NL189707C (en) 1993-07-01

Family

ID=19830498

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE7802830,A NL189707C (en) 1978-03-15 1978-03-15 PROCESS FOR PREPARING TETRA-ETHYLAMMONIUM PERFLUORALKYL SULFONATE.

Country Status (1)

Country Link
NL (1) NL189707C (en)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7169333B2 (en) 2000-05-12 2007-01-30 Bayer Aktiengesellschaft Antistatic agent
EP2133203A1 (en) 2008-06-11 2009-12-16 Bayer MaterialScience AG Multi-layer optical film constructions with improved characteristics and use thereof
EP2157134A1 (en) 2008-08-19 2010-02-24 Bayer MaterialScience AG Films with improved characteristics
EP2168783A1 (en) 2008-09-24 2010-03-31 Bayer MaterialScience AG Use of a plastic foil in colour laser printing
EP2172336A1 (en) 2008-09-24 2010-04-07 Bayer MaterialScience AG Forgery-proof security characteristics in confidential or valuable documents
EP2179857A1 (en) 2008-10-23 2010-04-28 Bayer MaterialScience AG ID cards with blocked laser engraving writeability
WO2010089035A1 (en) 2009-02-04 2010-08-12 Bayer Materialscience Ag Layer structure and films for id documents having improved properties for laser engraving
WO2018114836A1 (en) 2016-12-22 2018-06-28 Covestro Deutschland Ag Plastic films for id documents having improved properties for laser engraving and improved chemical resistance
WO2019089048A1 (en) 2017-11-06 2019-05-09 Covestro Deutschland Ag Plastic films with reduced uv activity
EP3501819A1 (en) 2017-12-22 2019-06-26 Covestro Deutschland AG Plastic films for id documents with imprinted holograms having improved brightness
WO2021116356A1 (en) 2019-12-12 2021-06-17 Covestro Intellectual Property Gmbh & Co. Kg Films having special properties
EP4119344A1 (en) 2021-07-14 2023-01-18 Covestro Deutschland AG Special polymer layers for faster lamination of multilayer structures
WO2023285358A1 (en) 2021-07-14 2023-01-19 Covestro Deutschland Ag Film structure suitable for rapid lamination

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7169333B2 (en) 2000-05-12 2007-01-30 Bayer Aktiengesellschaft Antistatic agent
EP2133203A1 (en) 2008-06-11 2009-12-16 Bayer MaterialScience AG Multi-layer optical film constructions with improved characteristics and use thereof
EP2157134A1 (en) 2008-08-19 2010-02-24 Bayer MaterialScience AG Films with improved characteristics
EP2157133A1 (en) 2008-08-19 2010-02-24 Bayer MaterialScience AG Films with improved characteristics
EP2168783A1 (en) 2008-09-24 2010-03-31 Bayer MaterialScience AG Use of a plastic foil in colour laser printing
EP2172336A1 (en) 2008-09-24 2010-04-07 Bayer MaterialScience AG Forgery-proof security characteristics in confidential or valuable documents
EP2179857A1 (en) 2008-10-23 2010-04-28 Bayer MaterialScience AG ID cards with blocked laser engraving writeability
WO2010046042A1 (en) 2008-10-23 2010-04-29 Bayer Materialscience Ag Id cards with blocked laser engraving writability
US9079443B2 (en) 2008-10-23 2015-07-14 Bayer Materialscience Ag ID cards with blocked laser engraving writability
WO2010089035A1 (en) 2009-02-04 2010-08-12 Bayer Materialscience Ag Layer structure and films for id documents having improved properties for laser engraving
WO2018114836A1 (en) 2016-12-22 2018-06-28 Covestro Deutschland Ag Plastic films for id documents having improved properties for laser engraving and improved chemical resistance
US11198769B2 (en) 2016-12-22 2021-12-14 Covestro Deutschland Ag Plastic films for ID documents having improved properties for laser engraving and improved chemical resistance
WO2019089048A1 (en) 2017-11-06 2019-05-09 Covestro Deutschland Ag Plastic films with reduced uv activity
EP3501819A1 (en) 2017-12-22 2019-06-26 Covestro Deutschland AG Plastic films for id documents with imprinted holograms having improved brightness
WO2019121278A1 (en) 2017-12-22 2019-06-27 Covestro Deutschland Ag Plastic films for id documents with better lightness of embossed holograms
US11731411B2 (en) 2017-12-22 2023-08-22 Covestro Deutschland Ag Plastic films for ID documents with better lightness of embossed holograms
WO2021116356A1 (en) 2019-12-12 2021-06-17 Covestro Intellectual Property Gmbh & Co. Kg Films having special properties
EP4119344A1 (en) 2021-07-14 2023-01-18 Covestro Deutschland AG Special polymer layers for faster lamination of multilayer structures
WO2023285356A1 (en) 2021-07-14 2023-01-19 Covestro Deutschland Ag Special polymer layers for faster laminability of multilayer structures
WO2023285358A1 (en) 2021-07-14 2023-01-19 Covestro Deutschland Ag Film structure suitable for rapid lamination

Also Published As

Publication number Publication date
NL189707B (en) 1993-02-01
NL189707C (en) 1993-07-01

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Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
A85 Still pending on 85-01-01
BC A request for examination has been filed
V4 Lapsed because of reaching the maximum lifetime of a patent

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