NL7802830A - Tetra:ethyl-ammonium per:fluoroalkyl sulphonate prepn. - by reacting per:fluoro-alkylsulphonyl fluoride with tri:ethylamine and alkoxy-silane - Google Patents
Tetra:ethyl-ammonium per:fluoroalkyl sulphonate prepn. - by reacting per:fluoro-alkylsulphonyl fluoride with tri:ethylamine and alkoxy-silaneInfo
- Publication number
- NL7802830A NL7802830A NL7802830A NL7802830A NL7802830A NL 7802830 A NL7802830 A NL 7802830A NL 7802830 A NL7802830 A NL 7802830A NL 7802830 A NL7802830 A NL 7802830A NL 7802830 A NL7802830 A NL 7802830A
- Authority
- NL
- Netherlands
- Prior art keywords
- per
- prepn
- alkylsulphonyl
- ethylamine
- tetra
- Prior art date
Links
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 title 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-O ethylaminium Chemical compound CC[NH3+] QUSNBJAOOMFDIB-UHFFFAOYSA-O 0.000 title 1
- -1 fluoroalkyl sulphonate Chemical compound 0.000 title 1
- 229910000077 silane Inorganic materials 0.000 title 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 abstract 1
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 239000011651 chromium Substances 0.000 abstract 1
- 239000000839 emulsion Substances 0.000 abstract 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 239000012442 inert solvent Substances 0.000 abstract 1
- 238000001746 injection moulding Methods 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 abstract 1
- 238000007747 plating Methods 0.000 abstract 1
- 238000003969 polarography Methods 0.000 abstract 1
- 238000005498 polishing Methods 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- OBTWBSRJZRCYQV-UHFFFAOYSA-N sulfuryl difluoride Chemical class FS(F)(=O)=O OBTWBSRJZRCYQV-UHFFFAOYSA-N 0.000 abstract 1
- CBXCPBUEXACCNR-UHFFFAOYSA-N tetraethylammonium Chemical compound CC[N+](CC)(CC)CC CBXCPBUEXACCNR-UHFFFAOYSA-N 0.000 abstract 1
- 229920001169 thermoplastic Polymers 0.000 abstract 1
- 239000004416 thermosoftening plastic Substances 0.000 abstract 1
- 239000000080 wetting agent Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/04—Esters of silicic acids
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1888—Preparation; Treatments not provided for in C07F7/20 by reactions involving the formation of other Si-linkages, e.g. Si-N
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Perfluoroalkyl-(C4-C10) sulphonyl fluorides are reacted with (C2H5)3N and stoichiometric excess of an ethoxysilane in an inert solvent at 10-60 degrees C for prepn. of tetraethylammonium perfluoroalkylsulphonates of formula (C2H5)4N encircled + RF SO3 encircled - (I) (where RF is perfluorinated 4-10C alkyl). The octyl deriv. of (I) is used in hard chromium plating metal surfacing, as a mould-releasing agent in thermoplastic injection moulding, as a wetting agent in the acid polishing of glass and in photographic emulsion applications. The deriv. is used in polarography as a conductivity salt. Yields of 92% are obtd.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NLAANVRAGE7802830,A NL189707C (en) | 1978-03-15 | 1978-03-15 | PROCESS FOR PREPARING TETRA-ETHYLAMMONIUM PERFLUORALKYL SULFONATE. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NLAANVRAGE7802830,A NL189707C (en) | 1978-03-15 | 1978-03-15 | PROCESS FOR PREPARING TETRA-ETHYLAMMONIUM PERFLUORALKYL SULFONATE. |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| NL7802830A true NL7802830A (en) | 1979-09-18 |
| NL189707B NL189707B (en) | 1993-02-01 |
| NL189707C NL189707C (en) | 1993-07-01 |
Family
ID=19830498
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NLAANVRAGE7802830,A NL189707C (en) | 1978-03-15 | 1978-03-15 | PROCESS FOR PREPARING TETRA-ETHYLAMMONIUM PERFLUORALKYL SULFONATE. |
Country Status (1)
| Country | Link |
|---|---|
| NL (1) | NL189707C (en) |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7169333B2 (en) | 2000-05-12 | 2007-01-30 | Bayer Aktiengesellschaft | Antistatic agent |
| EP2133203A1 (en) | 2008-06-11 | 2009-12-16 | Bayer MaterialScience AG | Multi-layer optical film constructions with improved characteristics and use thereof |
| EP2157134A1 (en) | 2008-08-19 | 2010-02-24 | Bayer MaterialScience AG | Films with improved characteristics |
| EP2168783A1 (en) | 2008-09-24 | 2010-03-31 | Bayer MaterialScience AG | Use of a plastic foil in colour laser printing |
| EP2172336A1 (en) | 2008-09-24 | 2010-04-07 | Bayer MaterialScience AG | Forgery-proof security characteristics in confidential or valuable documents |
| EP2179857A1 (en) | 2008-10-23 | 2010-04-28 | Bayer MaterialScience AG | ID cards with blocked laser engraving writeability |
| WO2010089035A1 (en) | 2009-02-04 | 2010-08-12 | Bayer Materialscience Ag | Layer structure and films for id documents having improved properties for laser engraving |
| WO2018114836A1 (en) | 2016-12-22 | 2018-06-28 | Covestro Deutschland Ag | Plastic films for id documents having improved properties for laser engraving and improved chemical resistance |
| WO2019089048A1 (en) | 2017-11-06 | 2019-05-09 | Covestro Deutschland Ag | Plastic films with reduced uv activity |
| EP3501819A1 (en) | 2017-12-22 | 2019-06-26 | Covestro Deutschland AG | Plastic films for id documents with imprinted holograms having improved brightness |
| WO2021116356A1 (en) | 2019-12-12 | 2021-06-17 | Covestro Intellectual Property Gmbh & Co. Kg | Films having special properties |
| EP4119344A1 (en) | 2021-07-14 | 2023-01-18 | Covestro Deutschland AG | Special polymer layers for faster lamination of multilayer structures |
| WO2023285358A1 (en) | 2021-07-14 | 2023-01-19 | Covestro Deutschland Ag | Film structure suitable for rapid lamination |
-
1978
- 1978-03-15 NL NLAANVRAGE7802830,A patent/NL189707C/en not_active IP Right Cessation
Cited By (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7169333B2 (en) | 2000-05-12 | 2007-01-30 | Bayer Aktiengesellschaft | Antistatic agent |
| EP2133203A1 (en) | 2008-06-11 | 2009-12-16 | Bayer MaterialScience AG | Multi-layer optical film constructions with improved characteristics and use thereof |
| EP2157134A1 (en) | 2008-08-19 | 2010-02-24 | Bayer MaterialScience AG | Films with improved characteristics |
| EP2157133A1 (en) | 2008-08-19 | 2010-02-24 | Bayer MaterialScience AG | Films with improved characteristics |
| EP2168783A1 (en) | 2008-09-24 | 2010-03-31 | Bayer MaterialScience AG | Use of a plastic foil in colour laser printing |
| EP2172336A1 (en) | 2008-09-24 | 2010-04-07 | Bayer MaterialScience AG | Forgery-proof security characteristics in confidential or valuable documents |
| EP2179857A1 (en) | 2008-10-23 | 2010-04-28 | Bayer MaterialScience AG | ID cards with blocked laser engraving writeability |
| WO2010046042A1 (en) | 2008-10-23 | 2010-04-29 | Bayer Materialscience Ag | Id cards with blocked laser engraving writability |
| US9079443B2 (en) | 2008-10-23 | 2015-07-14 | Bayer Materialscience Ag | ID cards with blocked laser engraving writability |
| WO2010089035A1 (en) | 2009-02-04 | 2010-08-12 | Bayer Materialscience Ag | Layer structure and films for id documents having improved properties for laser engraving |
| WO2018114836A1 (en) | 2016-12-22 | 2018-06-28 | Covestro Deutschland Ag | Plastic films for id documents having improved properties for laser engraving and improved chemical resistance |
| US11198769B2 (en) | 2016-12-22 | 2021-12-14 | Covestro Deutschland Ag | Plastic films for ID documents having improved properties for laser engraving and improved chemical resistance |
| WO2019089048A1 (en) | 2017-11-06 | 2019-05-09 | Covestro Deutschland Ag | Plastic films with reduced uv activity |
| EP3501819A1 (en) | 2017-12-22 | 2019-06-26 | Covestro Deutschland AG | Plastic films for id documents with imprinted holograms having improved brightness |
| WO2019121278A1 (en) | 2017-12-22 | 2019-06-27 | Covestro Deutschland Ag | Plastic films for id documents with better lightness of embossed holograms |
| US11731411B2 (en) | 2017-12-22 | 2023-08-22 | Covestro Deutschland Ag | Plastic films for ID documents with better lightness of embossed holograms |
| WO2021116356A1 (en) | 2019-12-12 | 2021-06-17 | Covestro Intellectual Property Gmbh & Co. Kg | Films having special properties |
| EP4119344A1 (en) | 2021-07-14 | 2023-01-18 | Covestro Deutschland AG | Special polymer layers for faster lamination of multilayer structures |
| WO2023285356A1 (en) | 2021-07-14 | 2023-01-19 | Covestro Deutschland Ag | Special polymer layers for faster laminability of multilayer structures |
| WO2023285358A1 (en) | 2021-07-14 | 2023-01-19 | Covestro Deutschland Ag | Film structure suitable for rapid lamination |
Also Published As
| Publication number | Publication date |
|---|---|
| NL189707C (en) | 1993-07-01 |
| NL189707B (en) | 1993-02-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| BA | A request for search or an international-type search has been filed | ||
| BB | A search report has been drawn up | ||
| A85 | Still pending on 85-01-01 | ||
| BC | A request for examination has been filed | ||
| V4 | Lapsed because of reaching the maximum lifetime of a patent |
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