NL7706552A - METHOD OF MANUFACTURING MASKS FOR RONEN LITHOGRAPHY. - Google Patents

METHOD OF MANUFACTURING MASKS FOR RONEN LITHOGRAPHY.

Info

Publication number
NL7706552A
NL7706552A NL7706552A NL7706552A NL7706552A NL 7706552 A NL7706552 A NL 7706552A NL 7706552 A NL7706552 A NL 7706552A NL 7706552 A NL7706552 A NL 7706552A NL 7706552 A NL7706552 A NL 7706552A
Authority
NL
Netherlands
Prior art keywords
ronen
lithography
manufacturing masks
masks
manufacturing
Prior art date
Application number
NL7706552A
Other languages
Dutch (nl)
Other versions
NL186201C (en
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of NL7706552A publication Critical patent/NL7706552A/en
Application granted granted Critical
Publication of NL186201C publication Critical patent/NL186201C/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Physical Vapour Deposition (AREA)
NL7706552A 1976-06-15 1977-06-14 METHOD FOR MANUFACTURING MASKS FOR ROENTGEN LITHOGRAPHY NL186201C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762626851 DE2626851C3 (en) 1976-06-15 1976-06-15 Process for the production of masks for X-ray lithography

Publications (2)

Publication Number Publication Date
NL7706552A true NL7706552A (en) 1977-12-19
NL186201C NL186201C (en) 1990-10-01

Family

ID=5980611

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7706552A NL186201C (en) 1976-06-15 1977-06-14 METHOD FOR MANUFACTURING MASKS FOR ROENTGEN LITHOGRAPHY

Country Status (7)

Country Link
JP (1) JPS52153673A (en)
BE (1) BE855701A (en)
DE (1) DE2626851C3 (en)
FR (1) FR2355314A1 (en)
GB (1) GB1544787A (en)
IT (1) IT1083777B (en)
NL (1) NL186201C (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4171489A (en) * 1978-09-13 1979-10-16 Bell Telephone Laboratories, Incorporated Radiation mask structure
GB2089524B (en) * 1980-12-17 1984-12-05 Westinghouse Electric Corp High resolution lithographic process
GB2121980B (en) * 1982-06-10 1986-02-05 Standard Telephones Cables Ltd X ray masks
DE3435178A1 (en) * 1983-09-26 1985-04-04 Canon K.K., Tokio/Tokyo OBJECT WITH MASK STRUCTURE FOR LITHOGRAPHY
DE3338717A1 (en) * 1983-10-25 1985-05-02 Siemens AG, 1000 Berlin und 8000 München METHOD FOR PRODUCING A X-RAY MASK WITH METAL CARRIER FILM
JPS6169133A (en) * 1985-05-07 1986-04-09 Chiyou Lsi Gijutsu Kenkyu Kumiai Exposing process of soft x-ray

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1948141A1 (en) * 1968-09-23 1970-04-23 Polaroid Corp Anti-reflective coating for optical element of - transparent plastic

Also Published As

Publication number Publication date
IT1083777B (en) 1985-05-25
DE2626851A1 (en) 1977-12-22
NL186201C (en) 1990-10-01
DE2626851C3 (en) 1982-03-18
GB1544787A (en) 1979-04-25
BE855701A (en) 1977-10-03
JPS52153673A (en) 1977-12-20
FR2355314B1 (en) 1981-08-14
FR2355314A1 (en) 1978-01-13
DE2626851B2 (en) 1981-07-02

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Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
A85 Still pending on 85-01-01
V1 Lapsed because of non-payment of the annual fee