NL7604980A - Werkwijze voor het aanbrengen van bekledingen op halfgeleiderinrichtingen met geintegreerde schakelingen, en halfgeleiderinrichtingen die volgens deze werkwijze zijn bekleed. - Google Patents
Werkwijze voor het aanbrengen van bekledingen op halfgeleiderinrichtingen met geintegreerde schakelingen, en halfgeleiderinrichtingen die volgens deze werkwijze zijn bekleed.Info
- Publication number
- NL7604980A NL7604980A NL7604980A NL7604980A NL7604980A NL 7604980 A NL7604980 A NL 7604980A NL 7604980 A NL7604980 A NL 7604980A NL 7604980 A NL7604980 A NL 7604980A NL 7604980 A NL7604980 A NL 7604980A
- Authority
- NL
- Netherlands
- Prior art keywords
- semi
- procedure
- conductor devices
- integrated circuits
- coated according
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/042—Coating on selected surface areas, e.g. using masks using masks
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
- H10P14/6326—Deposition processes
- H10P14/6328—Deposition from the gas or vapour phase
- H10P14/6334—Deposition from the gas or vapour phase using decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/66—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials
- H10P14/668—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials
- H10P14/6681—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si
- H10P14/6682—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si the compound being a silane, e.g. disilane, methylsilane or chlorosilane
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/69—Inorganic materials
- H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
- H10P14/6921—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon
- H10P14/69215—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material being a silicon oxide, e.g. SiO2
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
- H10W74/131—Encapsulations, e.g. protective coatings characterised by their shape or disposition the semiconductor body being only partially enclosed
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/01—Manufacture or treatment
- H10W72/0198—Manufacture or treatment batch processes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/073—Connecting or disconnecting of die-attach connectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/073—Connecting or disconnecting of die-attach connectors
- H10W72/07331—Connecting techniques
- H10W72/07336—Soldering or alloying
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/075—Connecting or disconnecting of bond wires
- H10W72/07531—Techniques
- H10W72/07532—Compression bonding, e.g. thermocompression bonding
- H10W72/07533—Ultrasonic bonding, e.g. thermosonic bonding
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/076—Connecting or disconnecting of strap connectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/541—Dispositions of bond wires
- H10W72/5449—Dispositions of bond wires not being orthogonal to a side surface of the chip, e.g. fan-out arrangements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/851—Dispositions of multiple connectors or interconnections
- H10W72/874—On different surfaces
- H10W72/884—Die-attach connectors and bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/731—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
- H10W90/736—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked lead frame, conducting package substrate or heat sink
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W90/00—Package configurations
- H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
- H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
- H10W90/756—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink
Landscapes
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Lead Frames For Integrated Circuits (AREA)
- Wire Bonding (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Formation Of Insulating Films (AREA)
- Chemical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/576,517 US4041896A (en) | 1975-05-12 | 1975-05-12 | Microelectronic circuit coating system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7604980A true NL7604980A (nl) | 1976-11-16 |
Family
ID=24304755
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7604980A NL7604980A (nl) | 1975-05-12 | 1976-05-10 | Werkwijze voor het aanbrengen van bekledingen op halfgeleiderinrichtingen met geintegreerde schakelingen, en halfgeleiderinrichtingen die volgens deze werkwijze zijn bekleed. |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4041896A (https=) |
| JP (1) | JPS51135471A (https=) |
| CA (1) | CA1059648A (https=) |
| DE (1) | DE2620707C3 (https=) |
| FR (1) | FR2311404A1 (https=) |
| GB (1) | GB1519251A (https=) |
| IT (1) | IT1060415B (https=) |
| NL (1) | NL7604980A (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4401053A (en) * | 1981-07-17 | 1983-08-30 | Riley Thomas J | Coating fixture |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2704992A (en) * | 1951-12-28 | 1955-03-29 | Erie Resistor Corp | Gas plating apparatus |
| US2879188A (en) * | 1956-03-05 | 1959-03-24 | Westinghouse Electric Corp | Processes for making transistors |
| US3117025A (en) * | 1961-08-31 | 1964-01-07 | Space Technology Lab Inc | Thin filming apparatus |
| NL284295A (https=) * | 1961-10-12 | 1900-01-01 | ||
| US3207126A (en) * | 1961-11-14 | 1965-09-21 | Byron Ernest | Mask changer means for vacuum deposition device |
| US3312572A (en) * | 1963-06-07 | 1967-04-04 | Barnes Eng Co | Process of preparing thin film semiconductor thermistor bolometers and articles |
| US3276423A (en) * | 1963-10-04 | 1966-10-04 | David P Triller | Pattern mask for use in making thin film circuitry |
| US3465209A (en) * | 1966-07-07 | 1969-09-02 | Rca Corp | Semiconductor devices and methods of manufacture thereof |
| FR1518843A (fr) * | 1967-02-13 | 1968-03-29 | Radiotechnique Coprim Rtc | Dispositif pour le dépôt de couches minces sur des supports semi-conducteurs |
| US3597834A (en) * | 1968-02-14 | 1971-08-10 | Texas Instruments Inc | Method in forming electrically continuous circuit through insulating layer |
| US3621812A (en) * | 1969-06-18 | 1971-11-23 | Texas Instruments Inc | Epitaxial deposition reactor |
| US3647533A (en) * | 1969-08-08 | 1972-03-07 | Us Navy | Substrate bonding bumps for large scale arrays |
| US3785046A (en) * | 1970-03-06 | 1974-01-15 | Hull Corp | Thin film coils and method and apparatus for making the same |
| US3678892A (en) * | 1970-05-19 | 1972-07-25 | Western Electric Co | Pallet and mask for substrates |
-
1975
- 1975-05-12 US US05/576,517 patent/US4041896A/en not_active Expired - Lifetime
-
1976
- 1976-04-15 GB GB15576/76A patent/GB1519251A/en not_active Expired
- 1976-04-21 CA CA250,654A patent/CA1059648A/en not_active Expired
- 1976-05-07 IT IT23115/76A patent/IT1060415B/it active
- 1976-05-10 NL NL7604980A patent/NL7604980A/xx not_active Application Discontinuation
- 1976-05-11 JP JP51053756A patent/JPS51135471A/ja active Pending
- 1976-05-11 FR FR7614041A patent/FR2311404A1/fr active Granted
- 1976-05-11 DE DE2620707A patent/DE2620707C3/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2620707C3 (de) | 1979-05-23 |
| IT1060415B (it) | 1982-08-20 |
| GB1519251A (en) | 1978-07-26 |
| JPS51135471A (en) | 1976-11-24 |
| FR2311404A1 (fr) | 1976-12-10 |
| CA1059648A (en) | 1979-07-31 |
| US4041896A (en) | 1977-08-16 |
| FR2311404B1 (https=) | 1979-03-02 |
| DE2620707B2 (de) | 1978-09-21 |
| DE2620707A1 (de) | 1976-11-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS527679A (en) | Apparatus for coating copper parts preventing from oxidization in thermo compression gang connecting semiconductor devices | |
| NL153947B (nl) | Werkwijze voor het vervaardigen van halfgeleiderinrichtingen, waarbij een selectief elektrolytisch etsproces wordt toegepast en halfgeleiderinrichting verkregen met toepassing van de werkwijze. | |
| NL163059B (nl) | Werkwijze ter vervaardiging van een halfgeleiderinrich- ting, waarbij een op een oppervlak van een halfgeleider- lichaam aangebrachte laag materiaal met ionen wordt ge- bombardeerd. | |
| NL185249C (nl) | Werkwijze voor het vervaardigen van elektrische geleiders op een isolerend substraat. | |
| NL160680B (nl) | Halfgeleiderinrichting voorzien van een isolerende inkapselbekleding en werkwijze voor het vervaardigen van de halfgeleiderinrichting. | |
| NL162434B (nl) | Werkwijze voor het vervaardigen van een katalytisch geactiveerd, elektrisch isolerend, substraat, alsmede werkwijze voor het vervaardigen van een gedrukte bedrading. | |
| NL174684C (nl) | Werkwijze voor het vervaardigen van een halfgeleiderinrichting omvattende het op een deel van een lichaam van halfgeleidermateriaal aanbrengen in een patroon van een laag van een metaal dat is gedoteerd met tenminste een de elektrische geleidingseigenschappen van het halfgeleidermateriaal wijzigende activator, het met handhaving van de maskerlaag aan een warmtebehandeling blootstellen van het halfgeleiderlichaam en de metaallaag, teneinde activatoratomen in het aan de metaallaag grenzende deel van het halfgeleiderlichaam te diffunderen en het aan de metaallaag bevestigen van een uitwendige aansluitgeleider. | |
| RO64695A (ro) | Procedeu si instalatie pentru asamblarea dispozitivelor cu semiconductoare si microcircuit cu dispozitive semiconductoare | |
| ES402464A1 (es) | Perfeccionamientos introducidos en marcos conductores para dispositivos semiconductores. | |
| NL7604980A (nl) | Werkwijze voor het aanbrengen van bekledingen op halfgeleiderinrichtingen met geintegreerde schakelingen, en halfgeleiderinrichtingen die volgens deze werkwijze zijn bekleed. | |
| BE618081A (nl) | Werkwijze voor de vervaardiging van elektrische halfgeleiderinrichtingen | |
| NL144811B (nl) | Werkwijze voor het vervaardigen van een elektronische schakeling door middel van het selectief maskeren en etsen van een bekleed substraat, alsmede aldus vervaardigde schakeling. | |
| NL166415C (nl) | Werkwijze voor het vervaardigen van geemailleerd koper- draad. | |
| TW324852B (en) | Improved fabricating method of semiconductor device | |
| TW200625476A (en) | Semiconductor device and manufacturing method thereof | |
| ES394087A1 (es) | Un metodo de establecer conexiones relativamente aisladas entre los terminales de conductores metalicos dispuestos en un bastidor de montaje y un sustrato aislante. | |
| GB1255073A (en) | Improvements relating to electrical circuit assemblies | |
| IL35219A0 (en) | Films of polyamide-imides,process for the production thereof and electrical conductors coated therewith | |
| JPH0350853A (ja) | 半導体装置の半田塗布方法 | |
| JPS5412263A (en) | Semiconductor element and production of the same | |
| JPS51117588A (en) | Manufacturing method of semiconductor equipment | |
| CH531791A (it) | Procedimento per fabbricare semiconduttori discreti o circuiti integrati, e semiconduttore o circuito integrato ottenuto mediante detto procedimento | |
| TW200501361A (en) | Electrically insulating heat sink and semiconductor package with the heat sink | |
| NL169122C (nl) | Halfgeleiderelement, omvattende een halfgeleiderplaatje met een door een isolerende laag bedekt hoofdvlak en met elektroden die zich ononderbroken uitstrekken over delen van de isolerende laag en aangrenzende delen van zijvlakken van het halfgeleiderplaatje, alsmede werkwijze voor het bevestigen van het halfgeleiderelement op een van aansluitklemmen voorziene montageplaat. | |
| NL165768B (nl) | Werkwijze voor het afzetten van metaal in of op een substraat zonder toepassing van een uitwendige elektrische spanning, en werkwijze voor de vervaar- diging van gedrukte stroomleidingen. |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| BV | The patent application has lapsed |