NL7604980A - Werkwijze voor het aanbrengen van bekledingen op halfgeleiderinrichtingen met geintegreerde schakelingen, en halfgeleiderinrichtingen die volgens deze werkwijze zijn bekleed. - Google Patents

Werkwijze voor het aanbrengen van bekledingen op halfgeleiderinrichtingen met geintegreerde schakelingen, en halfgeleiderinrichtingen die volgens deze werkwijze zijn bekleed.

Info

Publication number
NL7604980A
NL7604980A NL7604980A NL7604980A NL7604980A NL 7604980 A NL7604980 A NL 7604980A NL 7604980 A NL7604980 A NL 7604980A NL 7604980 A NL7604980 A NL 7604980A NL 7604980 A NL7604980 A NL 7604980A
Authority
NL
Netherlands
Prior art keywords
semi
procedure
conductor devices
integrated circuits
coated according
Prior art date
Application number
NL7604980A
Other languages
English (en)
Dutch (nl)
Original Assignee
Ncr Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ncr Co filed Critical Ncr Co
Publication of NL7604980A publication Critical patent/NL7604980A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/042—Coating on selected surface areas, e.g. using masks using masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
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    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
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    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
    • H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
    • H01L21/02164—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon oxide, e.g. SiO2
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    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
    • H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
    • H01L21/02208—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si
    • H01L21/02211—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound being a silane, e.g. disilane, methylsilane or chlorosilane
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    • H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
    • H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
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Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Lead Frames For Integrated Circuits (AREA)
  • Wire Bonding (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Chemical Vapour Deposition (AREA)
  • Formation Of Insulating Films (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
NL7604980A 1975-05-12 1976-05-10 Werkwijze voor het aanbrengen van bekledingen op halfgeleiderinrichtingen met geintegreerde schakelingen, en halfgeleiderinrichtingen die volgens deze werkwijze zijn bekleed. NL7604980A (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/576,517 US4041896A (en) 1975-05-12 1975-05-12 Microelectronic circuit coating system

Publications (1)

Publication Number Publication Date
NL7604980A true NL7604980A (nl) 1976-11-16

Family

ID=24304755

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7604980A NL7604980A (nl) 1975-05-12 1976-05-10 Werkwijze voor het aanbrengen van bekledingen op halfgeleiderinrichtingen met geintegreerde schakelingen, en halfgeleiderinrichtingen die volgens deze werkwijze zijn bekleed.

Country Status (8)

Country Link
US (1) US4041896A (enrdf_load_stackoverflow)
JP (1) JPS51135471A (enrdf_load_stackoverflow)
CA (1) CA1059648A (enrdf_load_stackoverflow)
DE (1) DE2620707C3 (enrdf_load_stackoverflow)
FR (1) FR2311404A1 (enrdf_load_stackoverflow)
GB (1) GB1519251A (enrdf_load_stackoverflow)
IT (1) IT1060415B (enrdf_load_stackoverflow)
NL (1) NL7604980A (enrdf_load_stackoverflow)

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US4401053A (en) * 1981-07-17 1983-08-30 Riley Thomas J Coating fixture

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US2704992A (en) * 1951-12-28 1955-03-29 Erie Resistor Corp Gas plating apparatus
US2879188A (en) * 1956-03-05 1959-03-24 Westinghouse Electric Corp Processes for making transistors
US3117025A (en) * 1961-08-31 1964-01-07 Space Technology Lab Inc Thin filming apparatus
BE623233A (enrdf_load_stackoverflow) * 1961-10-12 1900-01-01
US3207126A (en) * 1961-11-14 1965-09-21 Byron Ernest Mask changer means for vacuum deposition device
US3312572A (en) * 1963-06-07 1967-04-04 Barnes Eng Co Process of preparing thin film semiconductor thermistor bolometers and articles
US3276423A (en) * 1963-10-04 1966-10-04 David P Triller Pattern mask for use in making thin film circuitry
US3465209A (en) * 1966-07-07 1969-09-02 Rca Corp Semiconductor devices and methods of manufacture thereof
FR1518843A (fr) * 1967-02-13 1968-03-29 Radiotechnique Coprim Rtc Dispositif pour le dépôt de couches minces sur des supports semi-conducteurs
US3597834A (en) * 1968-02-14 1971-08-10 Texas Instruments Inc Method in forming electrically continuous circuit through insulating layer
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US3678892A (en) * 1970-05-19 1972-07-25 Western Electric Co Pallet and mask for substrates

Also Published As

Publication number Publication date
US4041896A (en) 1977-08-16
CA1059648A (en) 1979-07-31
DE2620707C3 (de) 1979-05-23
GB1519251A (en) 1978-07-26
IT1060415B (it) 1982-08-20
JPS51135471A (en) 1976-11-24
FR2311404A1 (fr) 1976-12-10
DE2620707A1 (de) 1976-11-18
DE2620707B2 (de) 1978-09-21
FR2311404B1 (enrdf_load_stackoverflow) 1979-03-02

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