NL7413266A - Werkwijze met planar-diffusie voor de vervaar- diging van een monolytisch geintegreerde vaste-stof-schakeling. - Google Patents
Werkwijze met planar-diffusie voor de vervaar- diging van een monolytisch geintegreerde vaste-stof-schakeling.Info
- Publication number
- NL7413266A NL7413266A NL7413266A NL7413266A NL7413266A NL 7413266 A NL7413266 A NL 7413266A NL 7413266 A NL7413266 A NL 7413266A NL 7413266 A NL7413266 A NL 7413266A NL 7413266 A NL7413266 A NL 7413266A
- Authority
- NL
- Netherlands
- Prior art keywords
- manufacture
- integrated solid
- solid circuit
- planar diffusion
- monolytically
- Prior art date
Links
- 238000009792 diffusion process Methods 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000007787 solid Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/082—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only
- H01L27/0823—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including bipolar components only including vertical bipolar transistors only
- H01L27/0826—Combination of vertical complementary transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8222—Bipolar technology
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/037—Diffusion-deposition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/085—Isolated-integrated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/151—Simultaneous diffusion
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Bipolar Integrated Circuits (AREA)
- Bipolar Transistors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19732351985 DE2351985A1 (de) | 1973-10-17 | 1973-10-17 | Planardiffusionsverfahren zum herstellen einer monolithisch integrierten festkoerperschaltung |
Publications (1)
Publication Number | Publication Date |
---|---|
NL7413266A true NL7413266A (nl) | 1975-04-21 |
Family
ID=5895613
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7413266A NL7413266A (nl) | 1973-10-17 | 1974-10-09 | Werkwijze met planar-diffusie voor de vervaar- diging van een monolytisch geintegreerde vaste-stof-schakeling. |
Country Status (7)
Country | Link |
---|---|
US (1) | US3956035A (nl) |
JP (1) | JPS50106592A (nl) |
DE (1) | DE2351985A1 (nl) |
FR (1) | FR2248613B1 (nl) |
GB (1) | GB1483801A (nl) |
IT (1) | IT1022944B (nl) |
NL (1) | NL7413266A (nl) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54136281A (en) * | 1978-04-14 | 1979-10-23 | Toko Inc | Semiconductor device and method of fabricating same |
JPS56126960A (en) * | 1980-03-11 | 1981-10-05 | Nec Corp | Manufacture of semiconductor device |
JPS56129338A (en) * | 1980-03-14 | 1981-10-09 | Nec Corp | Semiconductor device |
JPS5750473A (en) * | 1980-09-11 | 1982-03-24 | Nec Corp | Semiconductor integrated circuit device |
NL8104862A (nl) * | 1981-10-28 | 1983-05-16 | Philips Nv | Halfgeleiderinrichting, en werkwijze ter vervaardiging daarvan. |
US4442591A (en) * | 1982-02-01 | 1984-04-17 | Texas Instruments Incorporated | High-voltage CMOS process |
US4613885A (en) * | 1982-02-01 | 1986-09-23 | Texas Instruments Incorporated | High-voltage CMOS process |
EP0093304B1 (en) * | 1982-04-19 | 1986-01-15 | Matsushita Electric Industrial Co., Ltd. | Semiconductor ic and method of making the same |
WO1984001053A1 (en) * | 1982-08-26 | 1984-03-15 | Mitsubishi Electric Corp | Semiconductor device |
JPS60194558A (ja) * | 1984-03-16 | 1985-10-03 | Hitachi Ltd | 半導体装置の製造方法 |
US6005282A (en) * | 1986-09-26 | 1999-12-21 | Analog Devices, Inc. | Integrated circuit with complementary isolated bipolar transistors |
DE3725429A1 (de) * | 1987-07-31 | 1989-02-09 | Bosch Gmbh Robert | Monolithisch integrierte schaltungsanordnung |
IT1217322B (it) * | 1987-12-22 | 1990-03-22 | Sgs Microelettronica Spa | Procedimento di fabbricazione di un dispositivo nonolitico a semiconduttope comprendente almeno un transistor di un circuito integrato di comando e un transistor di rotenza in tegrato nella stessa piastrina |
USRE38510E1 (en) * | 1987-12-22 | 2004-05-04 | Stmicroelectronics Srl | Manufacturing process for a monolithic semiconductor device comprising at least one transistor of an integrated control circuit and one power transistor integrated on the same chip |
IT1218230B (it) * | 1988-04-28 | 1990-04-12 | Sgs Thomson Microelectronics | Procedimento per la formazione di un circuito integrato su un substrato di tipo n,comprendente transistori pnp e npn verticali e isolati fra loro |
US4910160A (en) * | 1989-06-06 | 1990-03-20 | National Semiconductor Corporation | High voltage complementary NPN/PNP process |
EP0451423A1 (en) * | 1990-04-10 | 1991-10-16 | International Business Machines Corporation | Vertical isolated-collector PNP transistor structure |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3449643A (en) * | 1966-09-09 | 1969-06-10 | Hitachi Ltd | Semiconductor integrated circuit device |
FR1510057A (fr) * | 1966-12-06 | 1968-01-19 | Csf | Transistors intégrés complémentaires npn et pnp à collecteurs isolés |
FR1559607A (nl) * | 1967-06-30 | 1969-03-14 | ||
FR1559608A (nl) * | 1967-06-30 | 1969-03-14 | ||
FR1559611A (nl) * | 1967-06-30 | 1969-03-14 | ||
US3622842A (en) * | 1969-12-29 | 1971-11-23 | Ibm | Semiconductor device having high-switching speed and method of making |
-
1973
- 1973-10-17 DE DE19732351985 patent/DE2351985A1/de active Pending
-
1974
- 1974-10-01 US US05/510,929 patent/US3956035A/en not_active Expired - Lifetime
- 1974-10-09 NL NL7413266A patent/NL7413266A/nl not_active Application Discontinuation
- 1974-10-17 FR FR7434912A patent/FR2248613B1/fr not_active Expired
- 1974-10-17 JP JP49118749A patent/JPS50106592A/ja active Pending
- 1974-10-17 IT IT28513/74A patent/IT1022944B/it active
- 1974-10-17 GB GB45043/74A patent/GB1483801A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
FR2248613A1 (nl) | 1975-05-16 |
FR2248613B1 (nl) | 1978-12-08 |
JPS50106592A (nl) | 1975-08-22 |
GB1483801A (en) | 1977-08-24 |
US3956035A (en) | 1976-05-11 |
IT1022944B (it) | 1978-04-20 |
DE2351985A1 (de) | 1975-04-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
BV | The patent application has lapsed |