NL7406079A - - Google Patents

Info

Publication number
NL7406079A
NL7406079A NL7406079A NL7406079A NL7406079A NL 7406079 A NL7406079 A NL 7406079A NL 7406079 A NL7406079 A NL 7406079A NL 7406079 A NL7406079 A NL 7406079A NL 7406079 A NL7406079 A NL 7406079A
Authority
NL
Netherlands
Application number
NL7406079A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7406079A publication Critical patent/NL7406079A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31105—Etching inorganic layers
    • H01L21/31111—Etching inorganic layers by chemical means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Architecture (AREA)
  • Inorganic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
NL7406079A 1973-05-04 1974-05-06 NL7406079A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP48049097A JPS5218098B2 (ja) 1973-05-04 1973-05-04

Publications (1)

Publication Number Publication Date
NL7406079A true NL7406079A (ja) 1974-11-06

Family

ID=12821580

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7406079A NL7406079A (ja) 1973-05-04 1974-05-06

Country Status (4)

Country Link
US (1) US3942982A (ja)
JP (1) JPS5218098B2 (ja)
DE (1) DE2421492A1 (ja)
NL (1) NL7406079A (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5252611A (en) * 1975-10-24 1977-04-27 Keiji Suzuki Magnetic recording and playback apparatus
JPS53147800U (ja) * 1977-04-26 1978-11-21
US4199649A (en) * 1978-04-12 1980-04-22 Bard Laboratories, Inc. Amorphous monomolecular surface coatings
JPS56162744A (en) * 1980-05-19 1981-12-14 Hitachi Ltd Formation of fine pattern
JPS5779173A (en) * 1980-11-05 1982-05-18 Konishiroku Photo Ind Co Ltd Etching method for chromium film and chromium oxide film
JPS57111687A (en) * 1981-08-05 1982-07-12 Tokyo Shibaura Electric Co Printing dispensing device for ticket
EP0096096B1 (de) * 1982-06-14 1987-09-16 Ibm Deutschland Gmbh Verfahren zur Einstellung des Kantenwinkels in Polysilicium
JPS6130035A (ja) * 1984-07-23 1986-02-12 Oki Electric Ind Co Ltd 半導体装置の製造方法
DE3823765A1 (de) * 1988-07-13 1990-01-18 Wacker Chemitronic Verfahren zur konservierung der oberflaeche von siliciumscheiben
EP0551105A3 (en) * 1992-01-07 1993-09-15 Fujitsu Limited Negative type composition for chemically amplified resist and process and apparatus of chemically amplified resist pattern
AU4914297A (en) * 1996-11-08 1998-05-29 W.L. Gore & Associates, Inc. Method of applying dry film photoresist
JP2975917B2 (ja) * 1998-02-06 1999-11-10 株式会社半導体プロセス研究所 半導体装置の製造方法及び半導体装置の製造装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3405017A (en) * 1965-02-26 1968-10-08 Hughes Aircraft Co Use of organosilicon subbing layer in photoresist method for obtaining fine patterns for microcircuitry
US3482977A (en) * 1966-02-11 1969-12-09 Sylvania Electric Prod Method of forming adherent masks on oxide coated semiconductor bodies
US3520683A (en) * 1967-05-19 1970-07-14 Bell Telephone Labor Inc Photoresist method and products produced thereby
US3586554A (en) * 1969-01-15 1971-06-22 Ibm Process for increasing photoresist adhesion to a semiconductor by treating the semiconductor with a disilylamide
US3716390A (en) * 1970-05-27 1973-02-13 Bell Telephone Labor Inc Photoresist method and products produced thereby

Also Published As

Publication number Publication date
US3942982A (en) 1976-03-09
DE2421492A1 (de) 1974-11-21
JPS50765A (ja) 1975-01-07
JPS5218098B2 (ja) 1977-05-19

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