NL7315060A - - Google Patents

Info

Publication number
NL7315060A
NL7315060A NL7315060A NL7315060A NL7315060A NL 7315060 A NL7315060 A NL 7315060A NL 7315060 A NL7315060 A NL 7315060A NL 7315060 A NL7315060 A NL 7315060A NL 7315060 A NL7315060 A NL 7315060A
Authority
NL
Netherlands
Application number
NL7315060A
Other versions
NL173564B (nl
NL173564C (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US303071A external-priority patent/US3891439A/en
Priority claimed from US303072A external-priority patent/US3891438A/en
Priority claimed from US05/302,994 external-priority patent/US4147545A/en
Application filed filed Critical
Publication of NL7315060A publication Critical patent/NL7315060A/xx
Publication of NL173564B publication Critical patent/NL173564B/xx
Application granted granted Critical
Publication of NL173564C publication Critical patent/NL173564C/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
NL7315060A 1972-11-02 1973-11-02 Werkwijze voor het ontwikkelen van een belichte diazo-gesensibiliseerde fotogevoelige bekleding op een substraat. NL173564C (nl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US303071A US3891439A (en) 1972-11-02 1972-11-02 Aqueous developing composition for lithographic diazo printing plates
US303072A US3891438A (en) 1972-11-02 1972-11-02 Aqueous developing composition for lithographic diazo printing plates
US05/302,994 US4147545A (en) 1972-11-02 1972-11-02 Photolithographic developing composition with organic lithium compound

Publications (3)

Publication Number Publication Date
NL7315060A true NL7315060A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1974-05-06
NL173564B NL173564B (nl) 1983-09-01
NL173564C NL173564C (nl) 1984-02-01

Family

ID=27404911

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7315060A NL173564C (nl) 1972-11-02 1973-11-02 Werkwijze voor het ontwikkelen van een belichte diazo-gesensibiliseerde fotogevoelige bekleding op een substraat.

Country Status (6)

Country Link
JP (1) JPS5034442B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
AU (1) AU462966B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE2353992C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2205684A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
IT (1) IT997722B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL173564C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5146205A (en) * 1974-10-17 1976-04-20 Unitika Ltd Kankosono genzohoho
DE3100259A1 (de) * 1981-01-08 1982-08-05 Hoechst Ag, 6000 Frankfurt Verfahren und entwicklergemisch zum entwickeln von belichteten negativ arbeitenden diazoniumsalzschichten
US4980271A (en) * 1985-08-05 1990-12-25 Hoechst Celanese Corporation Developer compositions for lithographic printing plates with benzyl alcohol, potassium toluene sulfonate and sodium (xylene or cumene) sulfonate
JPH0820738B2 (ja) * 1986-11-21 1996-03-04 オーシージー マイクロエレクトロニック マテリアルズ インコーポレイテッド ポジ型フオトレジスト組成物の改良現像方法および現像液
JPS63170646A (ja) * 1987-01-08 1988-07-14 Konica Corp 現像性等が改良される感光性平版印刷版から印刷版の作製方法
JPS63271256A (ja) * 1987-04-28 1988-11-09 Konica Corp 感光材料の現像液組成物
JP2591643B2 (ja) * 1988-03-03 1997-03-19 コニカ株式会社 0−キノンジアジド化合物を含有する感光材料の現像液

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL267572A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1960-07-29
US3669660A (en) * 1970-05-21 1972-06-13 Polychrome Corp Lithographic plate developing composition and process of use thereof

Also Published As

Publication number Publication date
DE2353992A1 (de) 1974-05-16
NL173564B (nl) 1983-09-01
JPS4994402A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1974-09-07
IT997722B (it) 1975-12-30
NL173564C (nl) 1984-02-01
AU462966B2 (en) 1975-07-10
AU6203273A (en) 1975-05-01
FR2205684A1 (en) 1974-05-31
DE2353992C2 (de) 1982-12-02
FR2205684B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1976-06-18
JPS5034442B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1975-11-08

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Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
V1 Lapsed because of non-payment of the annual fee