NL7310707A - - Google Patents

Info

Publication number
NL7310707A
NL7310707A NL7310707A NL7310707A NL7310707A NL 7310707 A NL7310707 A NL 7310707A NL 7310707 A NL7310707 A NL 7310707A NL 7310707 A NL7310707 A NL 7310707A NL 7310707 A NL7310707 A NL 7310707A
Authority
NL
Netherlands
Application number
NL7310707A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7310707A publication Critical patent/NL7310707A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12Production of screen printing forms or similar printing forms, e.g. stencils
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/28Processing photosensitive materials; Apparatus therefor for obtaining powder images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Epoxy Compounds (AREA)
  • Epoxy Resins (AREA)
NL7310707A 1972-08-02 1973-08-02 NL7310707A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB3598372A GB1376840A (en) 1972-08-02 1972-08-02 Photosensitive compositions and their uses

Publications (1)

Publication Number Publication Date
NL7310707A true NL7310707A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1974-02-05

Family

ID=10383683

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7310707A NL7310707A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1972-08-02 1973-08-02

Country Status (12)

Country Link
US (1) US3930856A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
AU (1) AU465209B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BE (1) BE803119A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA1003260A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE2339035C3 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2194984A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB1376840A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
IT (1) IT990050B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL7310707A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NO (1) NO139874C (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
SE (1) SE398677B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
ZA (1) ZA735028B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2452729A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Article pour la realisation d'auxiliaires visuels tels que films de montage pour l'impression phonographique
FR2452731A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Compositions photopolymerisables filmogenes developpables a l'eau
FR2475753B1 (fr) * 1980-02-11 1987-03-20 Rhone Poulenc Syst Plaque lithographique a base de fluoborate de paradiazodiphenylamine et de resine epoxy liquide
US4771005A (en) * 1983-06-27 1988-09-13 Erez Forensic Technology Ltd. Reagents, test kits and methods for the detection of cannabinoids

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL270834A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1960-10-31
DE1251036B (de) * 1961-05-12 1967-09-28 General Aniline &. Film Corpora tion New York, N Y (V St A) Verfahren zur Herstellung von Formkorpern
US3155513A (en) * 1961-10-30 1964-11-03 Minnesota Mining & Mfg Heat sensitive sheet material and method of making
US3205157A (en) * 1962-03-13 1965-09-07 North American Aviation Inc Electromagnetic radiation polymerization
SE335474B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1963-04-18 1971-05-24 R Landau
DE1447016C3 (de) * 1963-10-25 1973-11-15 Kalle Ag, 6202 Wiesbaden-Biebrich Vorsensibilisierte Druckplatte
US3433769A (en) * 1965-11-12 1969-03-18 Us Air Force Curing system for ethoxyline resins consisting of a solution of phosphomolybdic acid and a hydroxy phosphate ester
US3585034A (en) * 1967-04-03 1971-06-15 Gaf Corp Manufacture of phosphor screens
US3703496A (en) * 1967-10-20 1972-11-21 Hooker Chemical Corp Hydrolytic stabilizer of phosphite esters and use as epoxy resin stabilizer
US3708296A (en) * 1968-08-20 1973-01-02 American Can Co Photopolymerization of epoxy monomers
US3711390A (en) * 1971-05-18 1973-01-16 J Feinberg Photopolymerizable epoxy systems containing substituted cyclic amides or substituted ureas as gelation inhibitors

Also Published As

Publication number Publication date
DE2339035C3 (de) 1980-01-31
BE803119A (fr) 1973-12-03
SE398677B (sv) 1978-01-09
FR2194984A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1974-03-01
NO139874C (no) 1979-05-23
IT990050B (it) 1975-06-20
NO139874B (no) 1979-02-12
US3930856A (en) 1976-01-06
AU5860973A (en) 1975-01-30
AU465209B2 (en) 1975-09-18
GB1376840A (en) 1974-12-11
DE2339035B2 (de) 1979-05-17
CA1003260A (en) 1977-01-11
ZA735028B (en) 1974-06-26
DE2339035A1 (de) 1974-02-14

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Legal Events

Date Code Title Description
BV The patent application has lapsed