NL7310707A - - Google Patents

Info

Publication number
NL7310707A
NL7310707A NL7310707A NL7310707A NL7310707A NL 7310707 A NL7310707 A NL 7310707A NL 7310707 A NL7310707 A NL 7310707A NL 7310707 A NL7310707 A NL 7310707A NL 7310707 A NL7310707 A NL 7310707A
Authority
NL
Netherlands
Application number
NL7310707A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7310707A publication Critical patent/NL7310707A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/12Production of screen printing forms or similar printing forms, e.g. stencils
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/28Processing photosensitive materials; Apparatus therefor for obtaining powder images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Epoxy Compounds (AREA)
  • Epoxy Resins (AREA)
NL7310707A 1972-08-02 1973-08-02 NL7310707A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB3598372A GB1376840A (en) 1972-08-02 1972-08-02 Photosensitive compositions and their uses

Publications (1)

Publication Number Publication Date
NL7310707A true NL7310707A (xx) 1974-02-05

Family

ID=10383683

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7310707A NL7310707A (xx) 1972-08-02 1973-08-02

Country Status (12)

Country Link
US (1) US3930856A (xx)
AU (1) AU465209B2 (xx)
BE (1) BE803119A (xx)
CA (1) CA1003260A (xx)
DE (1) DE2339035C3 (xx)
FR (1) FR2194984A1 (xx)
GB (1) GB1376840A (xx)
IT (1) IT990050B (xx)
NL (1) NL7310707A (xx)
NO (1) NO139874C (xx)
SE (1) SE398677B (xx)
ZA (1) ZA735028B (xx)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2452729A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Article pour la realisation d'auxiliaires visuels tels que films de montage pour l'impression phonographique
FR2452731A1 (fr) * 1979-03-28 1980-10-24 Rhone Poulenc Syst Compositions photopolymerisables filmogenes developpables a l'eau
FR2475753B1 (fr) * 1980-02-11 1987-03-20 Rhone Poulenc Syst Plaque lithographique a base de fluoborate de paradiazodiphenylamine et de resine epoxy liquide
US4771005A (en) * 1983-06-27 1988-09-13 Erez Forensic Technology Ltd. Reagents, test kits and methods for the detection of cannabinoids

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL270834A (xx) * 1960-10-31
BE617540A (xx) * 1961-05-12
US3155513A (en) * 1961-10-30 1964-11-03 Minnesota Mining & Mfg Heat sensitive sheet material and method of making
US3205157A (en) * 1962-03-13 1965-09-07 North American Aviation Inc Electromagnetic radiation polymerization
SE335474B (xx) * 1963-04-18 1971-05-24 R Landau
DE1447016C3 (de) * 1963-10-25 1973-11-15 Kalle Ag, 6202 Wiesbaden-Biebrich Vorsensibilisierte Druckplatte
US3433769A (en) * 1965-11-12 1969-03-18 Us Air Force Curing system for ethoxyline resins consisting of a solution of phosphomolybdic acid and a hydroxy phosphate ester
US3585034A (en) * 1967-04-03 1971-06-15 Gaf Corp Manufacture of phosphor screens
US3703496A (en) * 1967-10-20 1972-11-21 Hooker Chemical Corp Hydrolytic stabilizer of phosphite esters and use as epoxy resin stabilizer
US3708296A (en) * 1968-08-20 1973-01-02 American Can Co Photopolymerization of epoxy monomers
US3711390A (en) * 1971-05-18 1973-01-16 J Feinberg Photopolymerizable epoxy systems containing substituted cyclic amides or substituted ureas as gelation inhibitors

Also Published As

Publication number Publication date
AU465209B2 (en) 1975-09-18
US3930856A (en) 1976-01-06
NO139874C (no) 1979-05-23
DE2339035A1 (de) 1974-02-14
ZA735028B (en) 1974-06-26
BE803119A (fr) 1973-12-03
CA1003260A (en) 1977-01-11
NO139874B (no) 1979-02-12
GB1376840A (en) 1974-12-11
DE2339035C3 (de) 1980-01-31
DE2339035B2 (de) 1979-05-17
IT990050B (it) 1975-06-20
AU5860973A (en) 1975-01-30
SE398677B (sv) 1978-01-09
FR2194984A1 (xx) 1974-03-01

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Legal Events

Date Code Title Description
BV The patent application has lapsed