NL7307936A - - Google Patents

Info

Publication number
NL7307936A
NL7307936A NL7307936A NL7307936A NL7307936A NL 7307936 A NL7307936 A NL 7307936A NL 7307936 A NL7307936 A NL 7307936A NL 7307936 A NL7307936 A NL 7307936A NL 7307936 A NL7307936 A NL 7307936A
Authority
NL
Netherlands
Application number
NL7307936A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7307936A publication Critical patent/NL7307936A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/023Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • ing And Chemical Polishing (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
NL7307936A 1972-06-12 1973-06-07 NL7307936A (US07368563-20080506-C00056.png)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US26198272A 1972-06-12 1972-06-12

Publications (1)

Publication Number Publication Date
NL7307936A true NL7307936A (US07368563-20080506-C00056.png) 1973-12-14

Family

ID=22995688

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7307936A NL7307936A (US07368563-20080506-C00056.png) 1972-06-12 1973-06-07

Country Status (6)

Country Link
JP (1) JPS5114042B2 (US07368563-20080506-C00056.png)
BE (1) BE800708A (US07368563-20080506-C00056.png)
DE (1) DE2329208A1 (US07368563-20080506-C00056.png)
FR (1) FR2188193A1 (US07368563-20080506-C00056.png)
GB (1) GB1440244A (US07368563-20080506-C00056.png)
NL (1) NL7307936A (US07368563-20080506-C00056.png)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2403054C2 (de) * 1972-07-27 1983-01-13 Hoechst Ag, 6000 Frankfurt Verfahren zur Herstellung eines lichtempfindlichen Aufzeichnungsmaterials
JPS56122031A (en) * 1980-03-01 1981-09-25 Japan Synthetic Rubber Co Ltd Positive type photosensitive resin composition
JPS57173941A (en) * 1981-04-21 1982-10-26 Oki Electric Ind Co Ltd Formation of positive type photo resist pattern
JP2593305B2 (ja) * 1987-02-02 1997-03-26 日本ペイント株式会社 ポジ型感光性樹脂組成物
DE3886616T2 (de) * 1987-02-02 1994-07-21 Nippon Paint Co Ltd Positive photoempfindliche harzzubereitung und verfahren zur herstellung.
DE69033938T2 (de) * 1989-12-01 2002-07-18 Tosoh Corp Positiv arbeitende lichtempfindliche Zusammensetzungen zur Herstellung von Linsen
US6737212B1 (en) 1999-10-07 2004-05-18 Clariant Finance (Bvi) Limited Photosensitive composition
JP4213366B2 (ja) * 2001-06-12 2009-01-21 Azエレクトロニックマテリアルズ株式会社 厚膜レジストパターンの形成方法

Also Published As

Publication number Publication date
JPS4957055A (US07368563-20080506-C00056.png) 1974-06-03
DE2329208A1 (de) 1974-01-03
FR2188193A1 (US07368563-20080506-C00056.png) 1974-01-18
BE800708A (fr) 1973-10-01
JPS5114042B2 (US07368563-20080506-C00056.png) 1976-05-06
GB1440244A (en) 1976-06-23

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