NL7307880A - - Google Patents

Info

Publication number
NL7307880A
NL7307880A NL7307880A NL7307880A NL7307880A NL 7307880 A NL7307880 A NL 7307880A NL 7307880 A NL7307880 A NL 7307880A NL 7307880 A NL7307880 A NL 7307880A NL 7307880 A NL7307880 A NL 7307880A
Authority
NL
Netherlands
Application number
NL7307880A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7307880A publication Critical patent/NL7307880A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0217—Polyurethanes; Epoxy resins
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
    • C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
NL7307880A 1972-10-16 1973-06-06 NL7307880A (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29782972A 1972-10-16 1972-10-16

Publications (1)

Publication Number Publication Date
NL7307880A true NL7307880A (enrdf_load_stackoverflow) 1974-04-18

Family

ID=23147914

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7307880A NL7307880A (enrdf_load_stackoverflow) 1972-10-16 1973-06-06

Country Status (8)

Country Link
JP (1) JPS4974236A (enrdf_load_stackoverflow)
AU (1) AU5801973A (enrdf_load_stackoverflow)
BE (1) BE801150A (enrdf_load_stackoverflow)
BR (1) BR7305113D0 (enrdf_load_stackoverflow)
DE (1) DE2329407A1 (enrdf_load_stackoverflow)
FR (2) FR2245252A5 (enrdf_load_stackoverflow)
IL (1) IL42266A0 (enrdf_load_stackoverflow)
NL (1) NL7307880A (enrdf_load_stackoverflow)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5753946B2 (enrdf_load_stackoverflow) * 1975-03-18 1982-11-16
JPS5285475A (en) * 1976-01-09 1977-07-15 Nippon Telegr & Teleph Corp <Ntt> Formation method of high molecular film patterns by high energy beams
CA1164710A (en) * 1978-05-09 1984-04-03 Edward J. Reardon, Jr. Phototropic photosensitive compositions containing fluoran colorformer
JP2817173B2 (ja) * 1988-03-15 1998-10-27 住友化学工業株式会社 硬化性樹脂組成物
JPH0572727A (ja) * 1991-09-10 1993-03-26 Toyobo Co Ltd ホログラム記録材料

Also Published As

Publication number Publication date
JPS4974236A (enrdf_load_stackoverflow) 1974-07-17
IL42266A0 (en) 1973-07-30
BR7305113D0 (pt) 1974-07-18
DE2329407A1 (de) 1974-04-18
BE801150A (nl) 1973-12-19
AU5801973A (en) 1975-01-16
FR2209783A1 (enrdf_load_stackoverflow) 1974-07-05
FR2245252A5 (enrdf_load_stackoverflow) 1975-04-18

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