NL7300287A - - Google Patents

Info

Publication number
NL7300287A
NL7300287A NL7300287A NL7300287A NL7300287A NL 7300287 A NL7300287 A NL 7300287A NL 7300287 A NL7300287 A NL 7300287A NL 7300287 A NL7300287 A NL 7300287A NL 7300287 A NL7300287 A NL 7300287A
Authority
NL
Netherlands
Application number
NL7300287A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7300287A publication Critical patent/NL7300287A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54Absorbers, e.g. of opaque materials
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0002Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05Patterning and lithography; Masks; Details of resist
    • H05K2203/0548Masks
    • H05K2203/056Using an artwork, i.e. a photomask for exposing photosensitive layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • ing And Chemical Polishing (AREA)
  • Compounds Of Iron (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
NL7300287A 1972-04-11 1973-01-09 NL7300287A (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH539372A CH565500A5 (it) 1972-04-11 1972-04-11

Publications (1)

Publication Number Publication Date
NL7300287A true NL7300287A (it) 1973-10-15

Family

ID=4292810

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7300287A NL7300287A (it) 1972-04-11 1973-01-09

Country Status (5)

Country Link
JP (1) JPS4915961A (it)
CH (1) CH565500A5 (it)
DE (1) DE2308627A1 (it)
GB (1) GB1359250A (it)
NL (1) NL7300287A (it)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH071389B2 (ja) * 1985-11-22 1995-01-11 シャープ株式会社 フオトマスクの製造方法
JPS63121054A (ja) * 1986-11-10 1988-05-25 Nec Corp フオトマスク

Also Published As

Publication number Publication date
JPS4915961A (it) 1974-02-12
GB1359250A (en) 1974-07-10
DE2308627A1 (de) 1973-10-18
CH565500A5 (it) 1975-08-15

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