NL7206691A - - Google Patents

Info

Publication number
NL7206691A
NL7206691A NL7206691A NL7206691A NL7206691A NL 7206691 A NL7206691 A NL 7206691A NL 7206691 A NL7206691 A NL 7206691A NL 7206691 A NL7206691 A NL 7206691A NL 7206691 A NL7206691 A NL 7206691A
Authority
NL
Netherlands
Application number
NL7206691A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7206691A publication Critical patent/NL7206691A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F287/00—Macromolecular compounds obtained by polymerising monomers on to block polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Graft Or Block Polymers (AREA)
NL7206691A 1971-05-17 1972-05-17 NL7206691A (enrdf_load_stackoverflow)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US14432371A 1971-05-17 1971-05-17

Publications (1)

Publication Number Publication Date
NL7206691A true NL7206691A (enrdf_load_stackoverflow) 1972-11-21

Family

ID=22508084

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7206691A NL7206691A (enrdf_load_stackoverflow) 1971-05-17 1972-05-17

Country Status (7)

Country Link
AU (1) AU4228872A (enrdf_load_stackoverflow)
CA (1) CA1101586A (enrdf_load_stackoverflow)
DE (1) DE2223808A1 (enrdf_load_stackoverflow)
FR (1) FR2137942B1 (enrdf_load_stackoverflow)
GB (1) GB1395822A (enrdf_load_stackoverflow)
IT (1) IT958889B (enrdf_load_stackoverflow)
NL (1) NL7206691A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51106501A (ja) * 1975-03-15 1976-09-21 Tokyo Ohka Kogyo Co Ltd Furekisobanyokankoseijushisoseibutsu
JPS52503A (en) * 1975-10-17 1977-01-05 Tokyo Ouka Kougiyou Kk Photoosensitive resin composition for flexo graphic printing

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4045231A (en) * 1975-03-15 1977-08-30 Tokyo Ohka Kogyo Kabushiki Kaisha Photosensitive resin composition for flexographic printing plates
JPS53127004A (en) * 1977-04-11 1978-11-06 Asahi Chemical Ind Photosensitive elastomer composition
US4179531A (en) 1977-08-23 1979-12-18 W. R. Grace & Co. Polythiol effect, curable monoalkenyl aromatic-diene and ene composition
US4234676A (en) 1978-01-23 1980-11-18 W. R. Grace & Co. Polythiol effect curable polymeric composition
US4177074A (en) * 1978-01-25 1979-12-04 E. I. Du Pont De Nemours And Company Butadiene/acrylonitrile photosensitive, elastomeric polymer compositions for flexographic printing plates
US4292150A (en) * 1979-06-26 1981-09-29 Uniroyal, Inc. Iodine treated elastomeric article
DE2942183A1 (de) 1979-10-18 1981-05-07 Basf Ag, 6700 Ludwigshafen Fotopolymerisierbare gemische und elemente daraus
JPS5922219B2 (ja) * 1980-07-07 1984-05-25 東京応化工業株式会社 フレキソ印刷版用感光性樹脂組成物
US4684600A (en) * 1981-02-02 1987-08-04 Uniroyal Plastics Co., Inc. Compressible photopolymer printing plate
US4547453A (en) * 1981-02-02 1985-10-15 Uniroyal, Inc. Compressible photopolymer printing plate
DE3137416A1 (de) 1981-09-19 1983-03-31 Basf Ag, 6700 Ludwigshafen Fotopolymerisierbare gemische und elemente daraus
CA1203107A (en) * 1982-08-31 1986-04-15 Uniroyal, Inc. Photosensitive elastomeric polymer composition for flexographic printing plates, processable in semi- aqueous basic solution or solvent
DE3415044C2 (de) * 1984-04-21 1986-12-04 Du Pont de Nemours (Deutschland) GmbH, 4000 Düsseldorf Verfahren zum Ozonschutz von Fotopolymer-Flexodruckformen durch alkohollösliche Polyamide
GB2163435B (en) * 1984-07-11 1987-07-22 Asahi Chemical Ind Image-forming materials sensitive to high-energy beam
US4702994A (en) * 1984-10-01 1987-10-27 W. R. Grace & Co. Projection imaged relief printing plates
DE3630474A1 (de) * 1986-09-06 1988-03-10 Basf Ag Verfahren zur herstellung von aufzeichnungsschichten und deren verwendung zur herstellung von flexodruckformen
US4839261A (en) * 1986-09-29 1989-06-13 Asahi Kasei Kogyo Kabushiki Kaisha Photocurable laminate
DE3810096A1 (de) * 1988-03-29 1989-10-05 Kendall & Co Verfahren zum verbinden zweier substrate und dafuer geeignete zusammensetzung
DE3841853A1 (de) * 1988-12-13 1990-06-21 Hoechst Ag Photopolymerisierbares elastomeres gemisch und dieses enthaltendes aufzeichnungsmaterial fuer die herstellung von ozonresistenten flexodruckformen
DE3841854A1 (de) * 1988-12-13 1990-06-21 Hoechst Ag Verfahren zur herstellung einer ozonresistenten flexodruckform
CA2041023C (en) * 1990-04-26 2002-03-12 William K. Goss Photocurable elements and flexographic printing plates prepared therefrom
WO1994023342A1 (en) * 1993-03-31 1994-10-13 Nippon Zeon Co., Ltd. Photosensitive composition, photosensitive rubber plate and process for producing the plate, and flexographic plate and process for producing the plate
JPH1031303A (ja) * 1994-09-29 1998-02-03 Nippon Zeon Co Ltd 感光性組成物及び感光性ゴム版
CN101981121B (zh) 2008-03-31 2013-02-06 日本瑞翁株式会社 嵌段共聚物组合物、其制备方法及薄膜
JP5673105B2 (ja) 2008-12-26 2015-02-18 日本ゼオン株式会社 ブロック共重合体組成物、フィルムおよびブロック共重合体組成物の製造方法
EP2371921B1 (en) 2008-12-26 2016-10-19 Zeon Corporation Block copolymer composition and hot-melt adhesive composition
JP5403048B2 (ja) * 2009-02-27 2014-01-29 日本ゼオン株式会社 フレキソ版用ブロック共重合体組成物
US8791196B2 (en) 2009-03-31 2014-07-29 Zeon Corporation Adhesive composition for labels
EP2415836B1 (en) 2009-03-31 2014-08-20 Zeon Corporation Composition for stretchable film
JP5533866B2 (ja) 2009-06-30 2014-06-25 日本ゼオン株式会社 伸縮性フィルム用組成物

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51106501A (ja) * 1975-03-15 1976-09-21 Tokyo Ohka Kogyo Co Ltd Furekisobanyokankoseijushisoseibutsu
JPS52503A (en) * 1975-10-17 1977-01-05 Tokyo Ouka Kougiyou Kk Photoosensitive resin composition for flexo graphic printing

Also Published As

Publication number Publication date
CA1101586A (en) 1981-05-19
IT958889B (it) 1973-10-30
FR2137942B1 (enrdf_load_stackoverflow) 1976-06-11
DE2223808A1 (de) 1972-12-07
GB1395822A (en) 1975-05-29
FR2137942A1 (enrdf_load_stackoverflow) 1972-12-29
AU4228872A (en) 1973-11-22

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