NL7206653A - - Google Patents

Info

Publication number
NL7206653A
NL7206653A NL7206653A NL7206653A NL7206653A NL 7206653 A NL7206653 A NL 7206653A NL 7206653 A NL7206653 A NL 7206653A NL 7206653 A NL7206653 A NL 7206653A NL 7206653 A NL7206653 A NL 7206653A
Authority
NL
Netherlands
Application number
NL7206653A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2180272A external-priority patent/JPS5536929B2/ja
Application filed filed Critical
Publication of NL7206653A publication Critical patent/NL7206653A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL7206653A 1971-05-17 1972-05-17 NL7206653A (https=)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP3316271 1971-05-17
JP2180272A JPS5536929B2 (https=) 1972-03-02 1972-03-02

Publications (1)

Publication Number Publication Date
NL7206653A true NL7206653A (https=) 1972-11-21

Family

ID=26358908

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7206653A NL7206653A (https=) 1971-05-17 1972-05-17

Country Status (4)

Country Link
US (1) US3739247A (https=)
DE (1) DE2224083C3 (https=)
GB (1) GB1396691A (https=)
NL (1) NL7206653A (https=)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3876311A (en) * 1973-05-12 1975-04-08 Nippon Kogaku Kk Two-axis photoelectric detector device
US3943359A (en) * 1973-06-15 1976-03-09 Hitachi, Ltd. Apparatus for relatively positioning a plurality of objects by the use of a scanning optoelectric microscope
FR2271590B1 (https=) * 1974-01-15 1978-12-01 Thomson Brandt
GB1518093A (en) * 1974-10-04 1978-07-19 Mullard Ltd Mark detection apparatus
US4012148A (en) * 1975-12-15 1977-03-15 Marantette William F Projection scope and positioning system
NL7606548A (nl) * 1976-06-17 1977-12-20 Philips Nv Werkwijze en inrichting voor het uitrichten van een i.c.-patroon ten opzichte van een halfgelei- dend substraat.
JPS53121471A (en) * 1977-03-31 1978-10-23 Nippon Chemical Ind Automatic position matching device
US4203064A (en) * 1977-04-05 1980-05-13 Tokyo Shibaura Electric Co., Ltd. Method for automatically controlling the position of small objects
US4307338A (en) * 1977-12-22 1981-12-22 National Semiconductor Corporation Laser alignment detector
JPS5856402B2 (ja) * 1978-08-30 1983-12-14 大日本スクリ−ン製造株式会社 位置決め用センサ−
US4309813A (en) * 1979-12-26 1982-01-12 Harris Corporation Mask alignment scheme for laterally and totally dielectrically isolated integrated circuits
US4333044A (en) * 1980-08-29 1982-06-01 Western Electric Co., Inc. Methods of and system for aligning a device with a reference target
US4523851A (en) * 1982-08-11 1985-06-18 Ncr Corporation Precision IC alignment keys and method
JPS6052021A (ja) * 1983-08-31 1985-03-23 Canon Inc 位置検出方法
US4663534A (en) * 1984-03-08 1987-05-05 Canon Kabushiki Kaisha Position detecting device utilizing selective outputs of the photodetector for accurate alignment
NL194811C (nl) * 1986-01-16 2003-03-04 Mitsubishi Electric Corp Servoschakeling.
US4842412A (en) * 1986-01-22 1989-06-27 Eiichi Miyake Exposure apparatus employed for fabricating printed circuit boards
CH677082A5 (https=) * 1988-06-01 1991-04-15 Bobst Sa
NL9001260A (nl) * 1990-06-01 1992-01-02 Philips Nv Aftastinrichting met een roteerbare spiegel, alsmede aandrijfeenheid ten gebruike in de aftastinrichting, en rotorlichaam ten gebruike in de aandrijfeenheid.
US6764272B1 (en) 1999-05-27 2004-07-20 Micron Technology, Inc. Adjustable coarse alignment tooling for packaged semiconductor devices
KR100555939B1 (ko) * 2003-06-30 2006-03-03 주식회사 대우일렉트로닉스 홀로그래픽 디지털 데이터 저장 시스템용 디스크 정렬장치 및 그 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3457422A (en) * 1967-02-21 1969-07-22 Ibm Optical system adapted for rotation of an image to be scanned with reference to a scanning path
US3466514A (en) * 1967-06-26 1969-09-09 Ibm Method and apparatus for positioning objects in preselected orientations
US3497705A (en) * 1968-02-12 1970-02-24 Itek Corp Mask alignment system using radial patterns and flying spot scanning
DE1919991C3 (de) * 1969-04-19 1973-11-29 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Anordnung zur automatischen Aus richtung von zwei aufeinander einzu justierenden Objekten

Also Published As

Publication number Publication date
DE2224083A1 (de) 1972-11-30
DE2224083B2 (de) 1980-08-07
US3739247A (en) 1973-06-12
GB1396691A (en) 1975-06-04
DE2224083C3 (de) 1981-03-26

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