NL7206653A - - Google Patents
Info
- Publication number
- NL7206653A NL7206653A NL7206653A NL7206653A NL7206653A NL 7206653 A NL7206653 A NL 7206653A NL 7206653 A NL7206653 A NL 7206653A NL 7206653 A NL7206653 A NL 7206653A NL 7206653 A NL7206653 A NL 7206653A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3316271 | 1971-05-17 | ||
| JP2180272A JPS5536929B2 (xx) | 1972-03-02 | 1972-03-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7206653A true NL7206653A (xx) | 1972-11-21 |
Family
ID=26358908
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7206653A NL7206653A (xx) | 1971-05-17 | 1972-05-17 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3739247A (xx) |
| DE (1) | DE2224083C3 (xx) |
| GB (1) | GB1396691A (xx) |
| NL (1) | NL7206653A (xx) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3876311A (en) * | 1973-05-12 | 1975-04-08 | Nippon Kogaku Kk | Two-axis photoelectric detector device |
| US3943359A (en) * | 1973-06-15 | 1976-03-09 | Hitachi, Ltd. | Apparatus for relatively positioning a plurality of objects by the use of a scanning optoelectric microscope |
| FR2271590B1 (xx) * | 1974-01-15 | 1978-12-01 | Thomson Brandt | |
| GB1518093A (en) * | 1974-10-04 | 1978-07-19 | Mullard Ltd | Mark detection apparatus |
| US4012148A (en) * | 1975-12-15 | 1977-03-15 | Marantette William F | Projection scope and positioning system |
| NL7606548A (nl) * | 1976-06-17 | 1977-12-20 | Philips Nv | Werkwijze en inrichting voor het uitrichten van een i.c.-patroon ten opzichte van een halfgelei- dend substraat. |
| JPS53121471A (en) * | 1977-03-31 | 1978-10-23 | Nippon Chemical Ind | Automatic position matching device |
| US4203064A (en) * | 1977-04-05 | 1980-05-13 | Tokyo Shibaura Electric Co., Ltd. | Method for automatically controlling the position of small objects |
| US4307338A (en) * | 1977-12-22 | 1981-12-22 | National Semiconductor Corporation | Laser alignment detector |
| JPS5856402B2 (ja) * | 1978-08-30 | 1983-12-14 | 大日本スクリ−ン製造株式会社 | 位置決め用センサ− |
| US4309813A (en) * | 1979-12-26 | 1982-01-12 | Harris Corporation | Mask alignment scheme for laterally and totally dielectrically isolated integrated circuits |
| US4333044A (en) * | 1980-08-29 | 1982-06-01 | Western Electric Co., Inc. | Methods of and system for aligning a device with a reference target |
| US4523851A (en) * | 1982-08-11 | 1985-06-18 | Ncr Corporation | Precision IC alignment keys and method |
| JPS6052021A (ja) * | 1983-08-31 | 1985-03-23 | Canon Inc | 位置検出方法 |
| US4663534A (en) * | 1984-03-08 | 1987-05-05 | Canon Kabushiki Kaisha | Position detecting device utilizing selective outputs of the photodetector for accurate alignment |
| NL194811C (nl) * | 1986-01-16 | 2003-03-04 | Mitsubishi Electric Corp | Servoschakeling. |
| US4842412A (en) * | 1986-01-22 | 1989-06-27 | Eiichi Miyake | Exposure apparatus employed for fabricating printed circuit boards |
| CH677082A5 (xx) * | 1988-06-01 | 1991-04-15 | Bobst Sa | |
| NL9001260A (nl) * | 1990-06-01 | 1992-01-02 | Philips Nv | Aftastinrichting met een roteerbare spiegel, alsmede aandrijfeenheid ten gebruike in de aftastinrichting, en rotorlichaam ten gebruike in de aandrijfeenheid. |
| US6764272B1 (en) * | 1999-05-27 | 2004-07-20 | Micron Technology, Inc. | Adjustable coarse alignment tooling for packaged semiconductor devices |
| KR100555939B1 (ko) * | 2003-06-30 | 2006-03-03 | 주식회사 대우일렉트로닉스 | 홀로그래픽 디지털 데이터 저장 시스템용 디스크 정렬장치 및 그 방법 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3457422A (en) * | 1967-02-21 | 1969-07-22 | Ibm | Optical system adapted for rotation of an image to be scanned with reference to a scanning path |
| US3466514A (en) * | 1967-06-26 | 1969-09-09 | Ibm | Method and apparatus for positioning objects in preselected orientations |
| US3497705A (en) * | 1968-02-12 | 1970-02-24 | Itek Corp | Mask alignment system using radial patterns and flying spot scanning |
| DE1919991C3 (de) * | 1969-04-19 | 1973-11-29 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Anordnung zur automatischen Aus richtung von zwei aufeinander einzu justierenden Objekten |
-
1972
- 1972-05-10 US US00252020A patent/US3739247A/en not_active Expired - Lifetime
- 1972-05-17 NL NL7206653A patent/NL7206653A/xx unknown
- 1972-05-17 GB GB2324672A patent/GB1396691A/en not_active Expired
- 1972-05-17 DE DE2224083A patent/DE2224083C3/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB1396691A (en) | 1975-06-04 |
| US3739247A (en) | 1973-06-12 |
| DE2224083A1 (de) | 1972-11-30 |
| DE2224083C3 (de) | 1981-03-26 |
| DE2224083B2 (de) | 1980-08-07 |