NL7206014A - - Google Patents

Info

Publication number
NL7206014A
NL7206014A NL7206014A NL7206014A NL7206014A NL 7206014 A NL7206014 A NL 7206014A NL 7206014 A NL7206014 A NL 7206014A NL 7206014 A NL7206014 A NL 7206014A NL 7206014 A NL7206014 A NL 7206014A
Authority
NL
Netherlands
Application number
NL7206014A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE2133843A external-priority patent/DE2133843A1/de
Priority claimed from DE2133877A external-priority patent/DE2133877A1/de
Priority claimed from DE2133876A external-priority patent/DE2133876A1/de
Application filed filed Critical
Publication of NL7206014A publication Critical patent/NL7206014A/xx

Links

Classifications

    • H10P72/13—
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06—Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/14—Substrate holders or susceptors
    • H10P72/0436—
    • H10P72/15—

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
NL7206014A 1971-07-07 1972-05-04 NL7206014A (en:Method)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE2133843A DE2133843A1 (de) 1971-07-07 1971-07-07 Anordnung zum eindiffundieren von dotierstoffen in halbleiterscheiben
DE2133877A DE2133877A1 (de) 1971-07-07 1971-07-07 Anordnung zum eindiffundieren von dotierstoffen in halbleiterscheiben
DE2133876A DE2133876A1 (de) 1971-07-07 1971-07-07 Anordnung zum eindiffundieren von dotierstoffen

Publications (1)

Publication Number Publication Date
NL7206014A true NL7206014A (en:Method) 1973-01-09

Family

ID=27183548

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7206014A NL7206014A (en:Method) 1971-07-07 1972-05-04

Country Status (4)

Country Link
FR (1) FR2144678B1 (en:Method)
GB (1) GB1385730A (en:Method)
IT (1) IT962430B (en:Method)
NL (1) NL7206014A (en:Method)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1502754A (en) * 1975-12-22 1978-03-01 Siemens Ag Heat-treatment of semi-conductor wafers
JPS5595321A (en) * 1979-01-12 1980-07-19 Matsushita Electric Ind Co Ltd Container of semiconductor substrate for liquid-phase epitaxial growth
US4856544A (en) * 1984-05-21 1989-08-15 Cfm Technologies, Inc. Vessel and system for treating wafers with fluids
US4633893A (en) * 1984-05-21 1987-01-06 Cfm Technologies Limited Partnership Apparatus for treating semiconductor wafers
US4577650A (en) * 1984-05-21 1986-03-25 Mcconnell Christopher F Vessel and system for treating wafers with fluids
US4740249A (en) * 1984-05-21 1988-04-26 Christopher F. McConnell Method of treating wafers with fluid
US4738272A (en) * 1984-05-21 1988-04-19 Mcconnell Christopher F Vessel and system for treating wafers with fluids
FR2702088B1 (fr) * 1993-02-24 1995-05-24 Sgs Thomson Microelectronics Nacelle pour plaquettes de silicium.
WO1998035765A1 (en) * 1997-02-18 1998-08-20 Scp Global Technologies Multiple stage wet processing chamber
US6450346B1 (en) 2000-06-30 2002-09-17 Integrated Materials, Inc. Silicon fixtures for supporting wafers during thermal processing
EP1297558B1 (en) * 2000-06-30 2011-04-20 Integrated Materials, Inc. Silicon fixtures for supporting wafers during thermal processing and method of fabrication
US20040188319A1 (en) * 2003-03-28 2004-09-30 Saint-Gobain Ceramics & Plastics, Inc. Wafer carrier having improved processing characteristics
DE102015004419A1 (de) * 2015-04-02 2016-10-06 Centrotherm Photovoltaics Ag Waferboot und Plasma-Behandlungsvorrichtung für Wafer

Also Published As

Publication number Publication date
FR2144678B1 (en:Method) 1975-08-29
FR2144678A1 (en:Method) 1973-02-16
IT962430B (it) 1973-12-20
GB1385730A (en) 1975-02-26

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