NL7200401A - - Google Patents

Info

Publication number
NL7200401A
NL7200401A NL7200401A NL7200401A NL7200401A NL 7200401 A NL7200401 A NL 7200401A NL 7200401 A NL7200401 A NL 7200401A NL 7200401 A NL7200401 A NL 7200401A NL 7200401 A NL7200401 A NL 7200401A
Authority
NL
Netherlands
Application number
NL7200401A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7200401A publication Critical patent/NL7200401A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/435Resistive materials for field effect devices, e.g. resistive gate for MOSFET or MESFET
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/148Charge coupled imagers
    • H01L27/14806Structural or functional details thereof
    • H01L27/14812Special geometry or disposition of pixel-elements, address lines or gate-electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/49Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
    • H01L29/4916Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET the conductor material next to the insulator being a silicon layer, e.g. polysilicon doped with boron, phosphorus or nitrogen
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/40Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/49Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
    • H01L29/4983Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET with a lateral structure, e.g. a Polysilicon gate with a lateral doping variation or with a lateral composition variation or characterised by the sidewalls being composed of conductive, resistive or dielectric material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/762Charge transfer devices
    • H01L29/765Charge-coupled devices
    • H01L29/768Charge-coupled devices with field effect produced by an insulated gate
    • H01L29/76866Surface Channel CCD
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C19/00Digital stores in which the information is moved stepwise, e.g. shift registers
    • G11C19/28Digital stores in which the information is moved stepwise, e.g. shift registers using semiconductor elements
    • G11C19/282Digital stores in which the information is moved stepwise, e.g. shift registers using semiconductor elements with charge storage in a depletion layer, i.e. charge coupled devices [CCD]

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Ceramic Engineering (AREA)
  • Electromagnetism (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Static Random-Access Memory (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Semiconductor Integrated Circuits (AREA)
NL7200401A 1971-04-21 1972-01-11 NL7200401A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13608771A 1971-04-21 1971-04-21

Publications (1)

Publication Number Publication Date
NL7200401A true NL7200401A (xx) 1972-10-24

Family

ID=22471226

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7200401A NL7200401A (xx) 1971-04-21 1972-01-11

Country Status (9)

Country Link
US (1) US3728590A (xx)
JP (1) JPS5653369U (xx)
AU (1) AU466830B2 (xx)
CA (1) CA948330A (xx)
DE (1) DE2210165A1 (xx)
FR (1) FR2133893B1 (xx)
GB (1) GB1316229A (xx)
IT (1) IT948967B (xx)
NL (1) NL7200401A (xx)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4157563A (en) * 1971-07-02 1979-06-05 U.S. Philips Corporation Semiconductor device
US3946418A (en) * 1972-11-01 1976-03-23 General Electric Company Resistive gate field effect transistor
DE2254754C3 (de) * 1972-11-09 1980-11-20 Deutsche Itt Industries Gmbh, 7800 Freiburg Integrierte IG-FET-Eimerkettenschaltung
US3896474A (en) * 1973-09-10 1975-07-22 Fairchild Camera Instr Co Charge coupled area imaging device with column anti-blooming control
US3896485A (en) * 1973-12-03 1975-07-22 Fairchild Camera Instr Co Charge-coupled device with overflow protection
JPS51118969A (en) * 1975-04-11 1976-10-19 Fujitsu Ltd Manufacturing method of semiconductor memory
US3943545A (en) * 1975-05-22 1976-03-09 Fairchild Camera And Instrument Corporation Low interelectrode leakage structure for charge-coupled devices
DE2532789A1 (de) * 1975-07-22 1977-02-10 Siemens Ag Ladungsgekoppelte halbleiteranordnung
US4156247A (en) * 1976-12-15 1979-05-22 Electron Memories & Magnetic Corporation Two-phase continuous poly silicon gate CCD
US4189826A (en) * 1977-03-07 1980-02-26 Eastman Kodak Company Silicon charge-handling device employing SiC electrodes
US4319261A (en) * 1980-05-08 1982-03-09 Westinghouse Electric Corp. Self-aligned, field aiding double polysilicon CCD electrode structure
JPS5737870A (en) * 1980-08-20 1982-03-02 Toshiba Corp Semiconductor device
NL8203870A (nl) * 1982-10-06 1984-05-01 Philips Nv Halfgeleiderinrichting.
US4675714A (en) * 1983-02-15 1987-06-23 Rockwell International Corporation Gapless gate charge coupled device
US4580156A (en) * 1983-12-30 1986-04-01 At&T Bell Laboratories Structured resistive field shields for low-leakage high voltage devices
DE68923301D1 (de) * 1988-02-17 1995-08-10 Fujitsu Ltd Halbleiteranordnung mit einer dünnen isolierenden Schicht.
US5214304A (en) * 1988-02-17 1993-05-25 Fujitsu Limited Semiconductor device
US4951106A (en) * 1988-03-24 1990-08-21 Tektronix, Inc. Detector device for measuring the intensity of electromagnetic radiation
US5393971A (en) * 1993-06-14 1995-02-28 Ball Corporation Radiation detector and charge transport device for use in signal processing systems having a stepped potential gradient means
US5793070A (en) * 1996-04-24 1998-08-11 Massachusetts Institute Of Technology Reduction of trapping effects in charge transfer devices
US7217601B1 (en) 2002-10-23 2007-05-15 Massachusetts Institute Of Technology High-yield single-level gate charge-coupled device design and fabrication

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1535286A (fr) * 1966-09-26 1968-08-02 Gen Micro Electronics Transistor semi-conducteur à oxyde métallique à effet de champ et son procédé de fabrication
US3473032A (en) * 1968-02-08 1969-10-14 Inventors & Investors Inc Photoelectric surface induced p-n junction device
US3611070A (en) * 1970-06-15 1971-10-05 Gen Electric Voltage-variable capacitor with controllably extendible pn junction region
CH561459A5 (xx) * 1973-03-07 1975-04-30 Siemens Ag

Also Published As

Publication number Publication date
US3728590A (en) 1973-04-17
CA948330A (en) 1974-05-28
DE2210165A1 (de) 1972-10-26
JPS5653369U (xx) 1981-05-11
FR2133893B1 (xx) 1977-08-19
GB1316229A (en) 1973-05-09
FR2133893A1 (xx) 1972-12-01
AU466830B2 (en) 1973-09-27
AU4018572A (en) 1973-09-27
IT948967B (it) 1973-06-11

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