NL7115280A - - Google Patents

Info

Publication number
NL7115280A
NL7115280A NL7115280A NL7115280A NL7115280A NL 7115280 A NL7115280 A NL 7115280A NL 7115280 A NL7115280 A NL 7115280A NL 7115280 A NL7115280 A NL 7115280A NL 7115280 A NL7115280 A NL 7115280A
Authority
NL
Netherlands
Application number
NL7115280A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7115280A publication Critical patent/NL7115280A/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • C30B25/14Feed and outlet means for the gases; Modifying the flow of the reactive gases
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45587Mechanical means for changing the gas flow
    • C23C16/45589Movable means, e.g. fans

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
NL7115280A 1970-11-05 1971-11-05 NL7115280A (cg-RX-API-DMAC10.html)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2054538A DE2054538C3 (de) 1970-11-05 1970-11-05 Vorrichtung zum Abscheiden von Schichten aus Halbleitermaterial

Publications (1)

Publication Number Publication Date
NL7115280A true NL7115280A (cg-RX-API-DMAC10.html) 1972-05-09

Family

ID=5787272

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7115280A NL7115280A (cg-RX-API-DMAC10.html) 1970-11-05 1971-11-05

Country Status (8)

Country Link
US (1) US3735727A (cg-RX-API-DMAC10.html)
CA (1) CA948075A (cg-RX-API-DMAC10.html)
DE (1) DE2054538C3 (cg-RX-API-DMAC10.html)
FR (1) FR2113442A5 (cg-RX-API-DMAC10.html)
GB (1) GB1328584A (cg-RX-API-DMAC10.html)
IT (1) IT939155B (cg-RX-API-DMAC10.html)
NL (1) NL7115280A (cg-RX-API-DMAC10.html)
SE (1) SE363246B (cg-RX-API-DMAC10.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3880112A (en) * 1971-10-20 1975-04-29 Commissariat Energie Atomique Device for the preparation of thin films
US4291640A (en) * 1977-09-09 1981-09-29 The Continental Group, Inc. Powder coating apparatus for two-piece cans
US4203387A (en) * 1978-12-28 1980-05-20 General Signal Corporation Cage for low pressure silicon dioxide deposition reactors
US4649859A (en) * 1985-02-19 1987-03-17 The United States Of America As Represented By The United States Department Of Energy Reactor design for uniform chemical vapor deposition-grown films without substrate rotation
FR2623524B1 (fr) * 1987-11-20 1990-03-30 Lami Philippe Perfectionnement au procede et au dispositif de depot metallique sur un echantillon
NL1022155C2 (nl) * 2002-12-12 2004-06-22 Otb Group Bv Werkwijze, alsmede inrichting voor het behandelen van een oppervlak van ten minste één substraat.

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2884894A (en) * 1956-11-02 1959-05-05 Metallgesellschaft Ag Apparatus for producing hard coatings on workpieces
US3367303A (en) * 1963-05-29 1968-02-06 Monsanto Co Chemical equipment
US3460510A (en) * 1966-05-12 1969-08-12 Dow Corning Large volume semiconductor coating reactor
US3598082A (en) * 1969-08-14 1971-08-10 Texas Instruments Inc Continuous epitaxial deposition system

Also Published As

Publication number Publication date
SE363246B (cg-RX-API-DMAC10.html) 1974-01-14
IT939155B (it) 1973-02-10
CA948075A (en) 1974-05-28
GB1328584A (en) 1973-08-30
DE2054538C3 (de) 1979-03-22
FR2113442A5 (cg-RX-API-DMAC10.html) 1972-06-23
US3735727A (en) 1973-05-29
DE2054538B2 (de) 1978-07-27
DE2054538A1 (de) 1972-05-10

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