NL7113629A - - Google Patents

Info

Publication number
NL7113629A
NL7113629A NL7113629A NL7113629A NL7113629A NL 7113629 A NL7113629 A NL 7113629A NL 7113629 A NL7113629 A NL 7113629A NL 7113629 A NL7113629 A NL 7113629A NL 7113629 A NL7113629 A NL 7113629A
Authority
NL
Netherlands
Application number
NL7113629A
Other versions
NL169802B (nl
NL169802C (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP8658670A external-priority patent/JPS4945035B1/ja
Priority claimed from JP4925071A external-priority patent/JPS5521461B1/ja
Application filed filed Critical
Publication of NL7113629A publication Critical patent/NL7113629A/xx
Publication of NL169802B publication Critical patent/NL169802B/xx
Application granted granted Critical
Publication of NL169802C publication Critical patent/NL169802C/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
    • H01L21/30604—Chemical etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/76297—Dielectric isolation using EPIC techniques, i.e. epitaxial passivated integrated circuit
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/026—Deposition thru hole in mask
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/051—Etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/085—Isolated-integrated

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Weting (AREA)
  • Element Separation (AREA)
NLAANVRAGE7113629,A 1970-10-05 1971-10-05 Werkwijze voor het vervaardigen van een door dielektrisch materiaal geisoleerde, geintegreerde halfgeleiderschakeling. NL169802C (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8658670A JPS4945035B1 (cs) 1970-10-05 1970-10-05
JP4925071A JPS5521461B1 (cs) 1971-07-06 1971-07-06

Publications (3)

Publication Number Publication Date
NL7113629A true NL7113629A (cs) 1972-04-07
NL169802B NL169802B (nl) 1982-03-16
NL169802C NL169802C (nl) 1982-08-16

Family

ID=26389625

Family Applications (1)

Application Number Title Priority Date Filing Date
NLAANVRAGE7113629,A NL169802C (nl) 1970-10-05 1971-10-05 Werkwijze voor het vervaardigen van een door dielektrisch materiaal geisoleerde, geintegreerde halfgeleiderschakeling.

Country Status (6)

Country Link
US (1) US3756877A (cs)
CA (1) CA924026A (cs)
DE (1) DE2149566C3 (cs)
FR (1) FR2110235B1 (cs)
GB (1) GB1345752A (cs)
NL (1) NL169802C (cs)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2294549A1 (fr) * 1974-12-09 1976-07-09 Radiotechnique Compelec Procede de realisation de dispositifs optoelectroniques
US3997381A (en) * 1975-01-10 1976-12-14 Intel Corporation Method of manufacture of an epitaxial semiconductor layer on an insulating substrate
JPS5215262A (en) * 1975-07-28 1977-02-04 Nippon Telegr & Teleph Corp <Ntt> Semiconductor device and its manufacturing method
DE69232347T2 (de) * 1991-09-27 2002-07-11 Canon K.K., Tokio/Tokyo Verfahren zur Behandlung eines Substrats aus Silizium
EP0536790B1 (en) * 1991-10-11 2004-03-03 Canon Kabushiki Kaisha Method for producing semiconductor articles
US5843322A (en) * 1996-12-23 1998-12-01 Memc Electronic Materials, Inc. Process for etching N, P, N+ and P+ type slugs and wafers
CN111019659B (zh) * 2019-12-06 2021-06-08 湖北兴福电子材料有限公司 一种选择性硅蚀刻液

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3372063A (en) * 1964-12-22 1968-03-05 Hitachi Ltd Method for manufacturing at least one electrically isolated region of a semiconductive material
FR1483068A (fr) * 1965-05-10 1967-06-02 Ibm Montage de dispositif à semi-conducteur et procédé de fabrication

Also Published As

Publication number Publication date
CA924026A (en) 1973-04-03
NL169802B (nl) 1982-03-16
NL169802C (nl) 1982-08-16
DE2149566B2 (de) 1980-11-27
US3756877A (en) 1973-09-04
GB1345752A (en) 1974-02-06
FR2110235A1 (cs) 1972-06-02
FR2110235B1 (cs) 1977-03-18
DE2149566C3 (de) 1981-07-23
DE2149566A1 (de) 1972-04-06

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Legal Events

Date Code Title Description
V4 Lapsed because of reaching the maximum lifetime of a patent