NL7112810A - - Google Patents

Info

Publication number
NL7112810A
NL7112810A NL7112810A NL7112810A NL7112810A NL 7112810 A NL7112810 A NL 7112810A NL 7112810 A NL7112810 A NL 7112810A NL 7112810 A NL7112810 A NL 7112810A NL 7112810 A NL7112810 A NL 7112810A
Authority
NL
Netherlands
Application number
NL7112810A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7112810A publication Critical patent/NL7112810A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/40Treatment after imagewise removal, e.g. baking
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/40Encapsulations, e.g. protective coatings characterised by their materials
    • H10W74/47Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00Semiconductor device manufacturing: process
    • Y10S438/942Masking
    • Y10S438/948Radiation resist
    • Y10S438/949Energy beam treating radiation resist on semiconductor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
NL7112810A 1970-09-18 1971-09-17 NL7112810A (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US7348670A 1970-09-18 1970-09-18

Publications (1)

Publication Number Publication Date
NL7112810A true NL7112810A (https=) 1972-03-21

Family

ID=22113977

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7112810A NL7112810A (https=) 1970-09-18 1971-09-17

Country Status (9)

Country Link
US (1) US3705055A (https=)
JP (1) JPS5417139B1 (https=)
BE (1) BE772619A (https=)
CA (1) CA944998A (https=)
DE (1) DE2145647C3 (https=)
FR (1) FR2107713A5 (https=)
GB (1) GB1361637A (https=)
IT (1) IT942608B (https=)
NL (1) NL7112810A (https=)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3767490A (en) * 1971-06-29 1973-10-23 Ibm Process for etching organic coating layers
GB1513368A (en) * 1974-07-08 1978-06-07 Vickers Ltd Processing of radiation-sensitive members
US4012307A (en) * 1975-12-05 1977-03-15 General Dynamics Corporation Method for conditioning drilled holes in multilayer wiring boards
US4115184A (en) * 1975-12-29 1978-09-19 Northern Telecom Limited Method of plasma etching
US4243865A (en) * 1976-05-14 1981-01-06 Data General Corporation Process for treating material in plasma environment
DE2726813C2 (de) * 1976-06-17 1984-02-23 Motorola, Inc., 60196 Schaumburg, Ill. Verfahren zur Herstellung eines mit einem Muster versehenen Substrats
US5024918A (en) * 1976-12-23 1991-06-18 Texas Instruments Incorporated Heat activated dry development of photoresist by means of active oxygen atmosphere
US4092442A (en) * 1976-12-30 1978-05-30 International Business Machines Corporation Method of depositing thin films utilizing a polyimide mask
US4292384A (en) * 1977-09-30 1981-09-29 Horizons Research Incorporated Gaseous plasma developing and etching process employing low voltage DC generation
US4201579A (en) * 1978-06-05 1980-05-06 Motorola, Inc. Method for removing photoresist by hydrogen plasma
US4241165A (en) * 1978-09-05 1980-12-23 Motorola, Inc. Plasma development process for photoresist
US4277321A (en) * 1979-04-23 1981-07-07 Bell Telephone Laboratories, Incorporated Treating multilayer printed wiring boards
US4307178A (en) * 1980-04-30 1981-12-22 International Business Machines Corporation Plasma develoment of resists
US4509162A (en) * 1980-10-28 1985-04-02 Quixote Corporation High density recording medium
US4536271A (en) * 1983-12-29 1985-08-20 Mobil Oil Corporation Method of plasma treating a polymer film to change its properties
JPS62129846A (ja) * 1985-12-02 1987-06-12 Dainippon Screen Mfg Co Ltd フオトレジストの塗布方法及び塗布装置
US4749640A (en) * 1986-09-02 1988-06-07 Monsanto Company Integrated circuit manufacturing process
US5049408A (en) * 1989-11-07 1991-09-17 Gte Laboratories Incorporated Method for coating phosphor particles using aluminum isopropoxide precursors and an isothermal fluidized bed
US4999219A (en) * 1989-11-07 1991-03-12 Gte Laboratories Incorporated Method for coating phosphor particles using aluminum isopropoxide precursors and an isothermal fluidized bed
US5198634A (en) * 1990-05-21 1993-03-30 Mattson Brad S Plasma contamination removal process
US8029105B2 (en) * 2007-10-17 2011-10-04 Eastman Kodak Company Ambient plasma treatment of printer components

Also Published As

Publication number Publication date
IT942608B (it) 1973-04-02
CA944998A (en) 1974-04-09
GB1361637A (en) 1974-07-30
DE2145647B2 (de) 1973-08-02
US3705055A (en) 1972-12-05
BE772619A (fr) 1972-01-17
DE2145647A1 (de) 1972-04-20
FR2107713A5 (https=) 1972-05-05
DE2145647C3 (de) 1974-02-21
JPS5417139B1 (https=) 1979-06-27

Similar Documents

Publication Publication Date Title
AU450094B2 (https=)
FR2107713A5 (https=)
AU1146470A (https=)
AU2044470A (https=)
AU1473870A (https=)
AU1336970A (https=)
AU1517670A (https=)
AU2017870A (https=)
AU1326870A (https=)
AU2085370A (https=)
AU2130570A (https=)
AU2130770A (https=)
AU1591370A (https=)
AU2144270A (https=)
AU2131570A (https=)
AU1083170A (https=)
AU1581370A (https=)
AU1872870A (https=)
AU1086670A (https=)
AU1343870A (https=)
AU2115870A (https=)
AU2112570A (https=)
AU1603270A (https=)
AU1879170A (https=)
AU2119370A (https=)