JPS5417139B1 - - Google Patents
Info
- Publication number
- JPS5417139B1 JPS5417139B1 JP7184471A JP7184471A JPS5417139B1 JP S5417139 B1 JPS5417139 B1 JP S5417139B1 JP 7184471 A JP7184471 A JP 7184471A JP 7184471 A JP7184471 A JP 7184471A JP S5417139 B1 JPS5417139 B1 JP S5417139B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W74/00—Encapsulations, e.g. protective coatings
- H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
- H10W74/47—Encapsulations, e.g. protective coatings characterised by their materials comprising organic materials, e.g. plastics or resins
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/942—Masking
- Y10S438/948—Radiation resist
- Y10S438/949—Energy beam treating radiation resist on semiconductor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US7348670A | 1970-09-18 | 1970-09-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5417139B1 true JPS5417139B1 (https=) | 1979-06-27 |
Family
ID=22113977
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7184471A Pending JPS5417139B1 (https=) | 1970-09-18 | 1971-09-17 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US3705055A (https=) |
| JP (1) | JPS5417139B1 (https=) |
| BE (1) | BE772619A (https=) |
| CA (1) | CA944998A (https=) |
| DE (1) | DE2145647C3 (https=) |
| FR (1) | FR2107713A5 (https=) |
| GB (1) | GB1361637A (https=) |
| IT (1) | IT942608B (https=) |
| NL (1) | NL7112810A (https=) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3767490A (en) * | 1971-06-29 | 1973-10-23 | Ibm | Process for etching organic coating layers |
| GB1513368A (en) * | 1974-07-08 | 1978-06-07 | Vickers Ltd | Processing of radiation-sensitive members |
| US4012307A (en) * | 1975-12-05 | 1977-03-15 | General Dynamics Corporation | Method for conditioning drilled holes in multilayer wiring boards |
| US4115184A (en) * | 1975-12-29 | 1978-09-19 | Northern Telecom Limited | Method of plasma etching |
| US4243865A (en) * | 1976-05-14 | 1981-01-06 | Data General Corporation | Process for treating material in plasma environment |
| DE2726813C2 (de) * | 1976-06-17 | 1984-02-23 | Motorola, Inc., 60196 Schaumburg, Ill. | Verfahren zur Herstellung eines mit einem Muster versehenen Substrats |
| US5024918A (en) * | 1976-12-23 | 1991-06-18 | Texas Instruments Incorporated | Heat activated dry development of photoresist by means of active oxygen atmosphere |
| US4092442A (en) * | 1976-12-30 | 1978-05-30 | International Business Machines Corporation | Method of depositing thin films utilizing a polyimide mask |
| US4292384A (en) * | 1977-09-30 | 1981-09-29 | Horizons Research Incorporated | Gaseous plasma developing and etching process employing low voltage DC generation |
| US4201579A (en) * | 1978-06-05 | 1980-05-06 | Motorola, Inc. | Method for removing photoresist by hydrogen plasma |
| US4241165A (en) * | 1978-09-05 | 1980-12-23 | Motorola, Inc. | Plasma development process for photoresist |
| US4277321A (en) * | 1979-04-23 | 1981-07-07 | Bell Telephone Laboratories, Incorporated | Treating multilayer printed wiring boards |
| US4307178A (en) * | 1980-04-30 | 1981-12-22 | International Business Machines Corporation | Plasma develoment of resists |
| US4509162A (en) * | 1980-10-28 | 1985-04-02 | Quixote Corporation | High density recording medium |
| US4536271A (en) * | 1983-12-29 | 1985-08-20 | Mobil Oil Corporation | Method of plasma treating a polymer film to change its properties |
| JPS62129846A (ja) * | 1985-12-02 | 1987-06-12 | Dainippon Screen Mfg Co Ltd | フオトレジストの塗布方法及び塗布装置 |
| US4749640A (en) * | 1986-09-02 | 1988-06-07 | Monsanto Company | Integrated circuit manufacturing process |
| US5049408A (en) * | 1989-11-07 | 1991-09-17 | Gte Laboratories Incorporated | Method for coating phosphor particles using aluminum isopropoxide precursors and an isothermal fluidized bed |
| US4999219A (en) * | 1989-11-07 | 1991-03-12 | Gte Laboratories Incorporated | Method for coating phosphor particles using aluminum isopropoxide precursors and an isothermal fluidized bed |
| US5198634A (en) * | 1990-05-21 | 1993-03-30 | Mattson Brad S | Plasma contamination removal process |
| US8029105B2 (en) * | 2007-10-17 | 2011-10-04 | Eastman Kodak Company | Ambient plasma treatment of printer components |
-
1970
- 1970-09-18 US US73486A patent/US3705055A/en not_active Expired - Lifetime
-
1971
- 1971-04-06 CA CA109,723A patent/CA944998A/en not_active Expired
- 1971-09-13 DE DE2145647A patent/DE2145647C3/de not_active Expired
- 1971-09-15 IT IT70049/71A patent/IT942608B/it active
- 1971-09-15 BE BE772619A patent/BE772619A/xx not_active IP Right Cessation
- 1971-09-15 FR FR7133271A patent/FR2107713A5/fr not_active Expired
- 1971-09-17 GB GB4350371A patent/GB1361637A/en not_active Expired
- 1971-09-17 JP JP7184471A patent/JPS5417139B1/ja active Pending
- 1971-09-17 NL NL7112810A patent/NL7112810A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| IT942608B (it) | 1973-04-02 |
| CA944998A (en) | 1974-04-09 |
| GB1361637A (en) | 1974-07-30 |
| DE2145647B2 (de) | 1973-08-02 |
| US3705055A (en) | 1972-12-05 |
| BE772619A (fr) | 1972-01-17 |
| DE2145647A1 (de) | 1972-04-20 |
| FR2107713A5 (https=) | 1972-05-05 |
| NL7112810A (https=) | 1972-03-21 |
| DE2145647C3 (de) | 1974-02-21 |