NL7100036A - - Google Patents

Info

Publication number
NL7100036A
NL7100036A NL7100036A NL7100036A NL7100036A NL 7100036 A NL7100036 A NL 7100036A NL 7100036 A NL7100036 A NL 7100036A NL 7100036 A NL7100036 A NL 7100036A NL 7100036 A NL7100036 A NL 7100036A
Authority
NL
Netherlands
Application number
NL7100036A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7100036A publication Critical patent/NL7100036A/xx

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4233Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
    • G02B27/4238Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in optical recording or readout devices
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/46Systems using spatial filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G16/00Electrographic processes using deformation of thermoplastic layers; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Holo Graphy (AREA)
  • Optical Head (AREA)
  • Transforming Electric Information Into Light Information (AREA)
NL7100036A 1970-01-02 1971-01-04 NL7100036A (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US33270A 1970-01-02 1970-01-02

Publications (1)

Publication Number Publication Date
NL7100036A true NL7100036A (https=) 1971-07-06

Family

ID=21691033

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7100036A NL7100036A (https=) 1970-01-02 1971-01-04

Country Status (7)

Country Link
US (1) US3630598A (https=)
JP (1) JPS4931665B1 (https=)
BE (1) BE761134A (https=)
DE (1) DE2064649A1 (https=)
FR (1) FR2075915B1 (https=)
GB (1) GB1330709A (https=)
NL (1) NL7100036A (https=)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5130213A (en) * 1989-08-07 1992-07-14 At&T Bell Laboratories Device manufacture involving lithographic processing
US5079112A (en) * 1989-08-07 1992-01-07 At&T Bell Laboratories Device manufacture involving lithographic processing
US5258246A (en) * 1989-08-07 1993-11-02 At&T Bell Laboratories Device manufacture involving lithographic processing
US5638211A (en) 1990-08-21 1997-06-10 Nikon Corporation Method and apparatus for increasing the resolution power of projection lithography exposure system
JP2995820B2 (ja) 1990-08-21 1999-12-27 株式会社ニコン 露光方法及び方法,並びにデバイス製造方法
US7656504B1 (en) * 1990-08-21 2010-02-02 Nikon Corporation Projection exposure apparatus with luminous flux distribution
US6710855B2 (en) * 1990-11-15 2004-03-23 Nikon Corporation Projection exposure apparatus and method
US6967710B2 (en) 1990-11-15 2005-11-22 Nikon Corporation Projection exposure apparatus and method
US6897942B2 (en) * 1990-11-15 2005-05-24 Nikon Corporation Projection exposure apparatus and method
US6252647B1 (en) 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
US6885433B2 (en) * 1990-11-15 2005-04-26 Nikon Corporation Projection exposure apparatus and method
US5719704A (en) 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
US8270077B2 (en) 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
CN101793993B (zh) * 2004-01-16 2013-04-03 卡尔蔡司Smt有限责任公司 光学元件、光学布置及系统
US7324280B2 (en) * 2004-05-25 2008-01-29 Asml Holding N.V. Apparatus for providing a pattern of polarization
DE102006031807A1 (de) * 2005-07-12 2007-01-18 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage, sowie Depolarisator
JP6168383B2 (ja) * 2012-12-27 2017-07-26 三星電子株式会社Samsung Electronics Co.,Ltd. 欠陥検査装置及び欠陥検査方法
CN113204126B (zh) * 2021-04-26 2022-08-30 中国科学院上海光学精密机械研究所 多程级联放大激光驱动器的调试装置和方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3335413A (en) * 1963-12-19 1967-08-08 Gen Electric Wide band optical recording and narrow band reproduction on a thermo-plastic medium
US3470310A (en) * 1966-05-23 1969-09-30 Rca Corp Color image display system utilizing a light valve
US3480933A (en) * 1966-10-12 1969-11-25 Ampex Spatial filtering noise reduction scheme for a magnetooptic readout system

Also Published As

Publication number Publication date
US3630598A (en) 1971-12-28
GB1330709A (en) 1973-09-19
JPS4931665B1 (https=) 1974-08-23
DE2064649A1 (de) 1972-06-22
FR2075915B1 (https=) 1977-01-21
FR2075915A1 (https=) 1971-10-15
BE761134A (fr) 1971-06-30

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