JPS4931665B1 - - Google Patents

Info

Publication number
JPS4931665B1
JPS4931665B1 JP45115545A JP11554570A JPS4931665B1 JP S4931665 B1 JPS4931665 B1 JP S4931665B1 JP 45115545 A JP45115545 A JP 45115545A JP 11554570 A JP11554570 A JP 11554570A JP S4931665 B1 JPS4931665 B1 JP S4931665B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP45115545A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS4931665B1 publication Critical patent/JPS4931665B1/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4233Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
    • G02B27/4238Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in optical recording or readout devices
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/46Systems using spatial filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G16/00Electrographic processes using deformation of thermoplastic layers; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Holo Graphy (AREA)
  • Optical Head (AREA)
  • Transforming Electric Information Into Light Information (AREA)
JP45115545A 1970-01-02 1970-12-22 Pending JPS4931665B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US33270A 1970-01-02 1970-01-02

Publications (1)

Publication Number Publication Date
JPS4931665B1 true JPS4931665B1 (ja) 1974-08-23

Family

ID=21691033

Family Applications (1)

Application Number Title Priority Date Filing Date
JP45115545A Pending JPS4931665B1 (ja) 1970-01-02 1970-12-22

Country Status (7)

Country Link
US (1) US3630598A (ja)
JP (1) JPS4931665B1 (ja)
BE (1) BE761134A (ja)
DE (1) DE2064649A1 (ja)
FR (1) FR2075915B1 (ja)
GB (1) GB1330709A (ja)
NL (1) NL7100036A (ja)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5258246A (en) * 1989-08-07 1993-11-02 At&T Bell Laboratories Device manufacture involving lithographic processing
US5079112A (en) * 1989-08-07 1992-01-07 At&T Bell Laboratories Device manufacture involving lithographic processing
US5130213A (en) * 1989-08-07 1992-07-14 At&T Bell Laboratories Device manufacture involving lithographic processing
JP2995820B2 (ja) 1990-08-21 1999-12-27 株式会社ニコン 露光方法及び方法,並びにデバイス製造方法
US7656504B1 (en) * 1990-08-21 2010-02-02 Nikon Corporation Projection exposure apparatus with luminous flux distribution
US5638211A (en) 1990-08-21 1997-06-10 Nikon Corporation Method and apparatus for increasing the resolution power of projection lithography exposure system
US6252647B1 (en) 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
US5719704A (en) 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
US6897942B2 (en) * 1990-11-15 2005-05-24 Nikon Corporation Projection exposure apparatus and method
US6710855B2 (en) * 1990-11-15 2004-03-23 Nikon Corporation Projection exposure apparatus and method
US6967710B2 (en) 1990-11-15 2005-11-22 Nikon Corporation Projection exposure apparatus and method
US6885433B2 (en) * 1990-11-15 2005-04-26 Nikon Corporation Projection exposure apparatus and method
KR101099913B1 (ko) * 2004-01-16 2011-12-29 칼 짜이스 에스엠티 게엠베하 편광변조 광학소자
US20070019179A1 (en) * 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
US8270077B2 (en) 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US7324280B2 (en) * 2004-05-25 2008-01-29 Asml Holding N.V. Apparatus for providing a pattern of polarization
DE102006031807A1 (de) * 2005-07-12 2007-01-18 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage, sowie Depolarisator
JP6168383B2 (ja) * 2012-12-27 2017-07-26 三星電子株式会社Samsung Electronics Co.,Ltd. 欠陥検査装置及び欠陥検査方法
CN113204126B (zh) * 2021-04-26 2022-08-30 中国科学院上海光学精密机械研究所 多程级联放大激光驱动器的调试装置和方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3335413A (en) * 1963-12-19 1967-08-08 Gen Electric Wide band optical recording and narrow band reproduction on a thermo-plastic medium
US3470310A (en) * 1966-05-23 1969-09-30 Rca Corp Color image display system utilizing a light valve
US3480933A (en) * 1966-10-12 1969-11-25 Ampex Spatial filtering noise reduction scheme for a magnetooptic readout system

Also Published As

Publication number Publication date
GB1330709A (en) 1973-09-19
DE2064649A1 (de) 1972-06-22
FR2075915B1 (ja) 1977-01-21
NL7100036A (ja) 1971-07-06
BE761134A (fr) 1971-06-30
FR2075915A1 (ja) 1971-10-15
US3630598A (en) 1971-12-28

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