NL7100036A - - Google Patents

Info

Publication number
NL7100036A
NL7100036A NL7100036A NL7100036A NL7100036A NL 7100036 A NL7100036 A NL 7100036A NL 7100036 A NL7100036 A NL 7100036A NL 7100036 A NL7100036 A NL 7100036A NL 7100036 A NL7100036 A NL 7100036A
Authority
NL
Netherlands
Application number
NL7100036A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7100036A publication Critical patent/NL7100036A/xx

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4233—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application
    • G02B27/4238—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive element [DOE] contributing to a non-imaging application in optical recording or readout devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/46—Systems using spatial filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G16/00—Electrographic processes using deformation of thermoplastic layers; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Holo Graphy (AREA)
  • Transforming Electric Information Into Light Information (AREA)
  • Optical Head (AREA)
NL7100036A 1970-01-02 1971-01-04 NL7100036A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US33270A 1970-01-02 1970-01-02

Publications (1)

Publication Number Publication Date
NL7100036A true NL7100036A (xx) 1971-07-06

Family

ID=21691033

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7100036A NL7100036A (xx) 1970-01-02 1971-01-04

Country Status (7)

Country Link
US (1) US3630598A (xx)
JP (1) JPS4931665B1 (xx)
BE (1) BE761134A (xx)
DE (1) DE2064649A1 (xx)
FR (1) FR2075915B1 (xx)
GB (1) GB1330709A (xx)
NL (1) NL7100036A (xx)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5130213A (en) * 1989-08-07 1992-07-14 At&T Bell Laboratories Device manufacture involving lithographic processing
US5079112A (en) * 1989-08-07 1992-01-07 At&T Bell Laboratories Device manufacture involving lithographic processing
US5258246A (en) * 1989-08-07 1993-11-02 At&T Bell Laboratories Device manufacture involving lithographic processing
US5638211A (en) 1990-08-21 1997-06-10 Nikon Corporation Method and apparatus for increasing the resolution power of projection lithography exposure system
JP2995820B2 (ja) 1990-08-21 1999-12-27 株式会社ニコン 露光方法及び方法，並びにデバイス製造方法
US7656504B1 (en) * 1990-08-21 2010-02-02 Nikon Corporation Projection exposure apparatus with luminous flux distribution
US6710855B2 (en) * 1990-11-15 2004-03-23 Nikon Corporation Projection exposure apparatus and method
US6897942B2 (en) * 1990-11-15 2005-05-24 Nikon Corporation Projection exposure apparatus and method
US6252647B1 (en) 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
US6885433B2 (en) * 1990-11-15 2005-04-26 Nikon Corporation Projection exposure apparatus and method
US6967710B2 (en) 1990-11-15 2005-11-22 Nikon Corporation Projection exposure apparatus and method
US5719704A (en) 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
CN1910522B (zh) 2004-01-16 2010-05-26 卡尔蔡司Smt股份公司 偏振调制光学元件
US8270077B2 (en) 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
US20070019179A1 (en) * 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
US7324280B2 (en) * 2004-05-25 2008-01-29 Asml Holding N.V. Apparatus for providing a pattern of polarization
DE102006031807A1 (de) * 2005-07-12 2007-01-18 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage, sowie Depolarisator
JP6168383B2 (ja) * 2012-12-27 2017-07-26 三星電子株式会社Ｓａｍｓｕｎｇ Ｅｌｅｃｔｒｏｎｉｃｓ Ｃｏ．，Ｌｔｄ． 欠陥検査装置及び欠陥検査方法
CN113204126B (zh) * 2021-04-26 2022-08-30 中国科学院上海光学精密机械研究所 多程级联放大激光驱动器的调试装置和方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3335413A (en) * 1963-12-19 1967-08-08 Gen Electric Wide band optical recording and narrow band reproduction on a thermo-plastic medium
US3470310A (en) * 1966-05-23 1969-09-30 Rca Corp Color image display system utilizing a light valve
US3480933A (en) * 1966-10-12 1969-11-25 Ampex Spatial filtering noise reduction scheme for a magnetooptic readout system

Also Published As

Publication number Publication date
DE2064649A1 (de) 1972-06-22
FR2075915A1 (xx) 1971-10-15
JPS4931665B1 (xx) 1974-08-23
FR2075915B1 (xx) 1977-01-21
BE761134A (fr) 1971-06-30
GB1330709A (en) 1973-09-19
US3630598A (en) 1971-12-28

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