NL7012671A - - Google Patents

Info

Publication number
NL7012671A
NL7012671A NL7012671A NL7012671A NL7012671A NL 7012671 A NL7012671 A NL 7012671A NL 7012671 A NL7012671 A NL 7012671A NL 7012671 A NL7012671 A NL 7012671A NL 7012671 A NL7012671 A NL 7012671A
Authority
NL
Netherlands
Application number
NL7012671A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to NL7012671A priority Critical patent/NL7012671A/xx
Priority to DE19712138766 priority patent/DE2138766A1/de
Priority to GB3962671A priority patent/GB1367940A/en
Priority to CA121,181A priority patent/CA946985A/en
Priority to FR7130831A priority patent/FR2106022A5/fr
Priority to US00174887A priority patent/US3777211A/en
Publication of NL7012671A publication Critical patent/NL7012671A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
NL7012671A 1970-08-27 1970-08-27 NL7012671A (de)

Priority Applications (6)

Application Number Priority Date Filing Date Title
NL7012671A NL7012671A (de) 1970-08-27 1970-08-27
DE19712138766 DE2138766A1 (de) 1970-08-27 1971-08-03 Einstellanordnung fur einen Teilchen strahl
GB3962671A GB1367940A (en) 1970-08-27 1971-08-24 Beam alignment device for a particle beam
CA121,181A CA946985A (en) 1970-08-27 1971-08-24 Adjusting device for a particle beam
FR7130831A FR2106022A5 (de) 1970-08-27 1971-08-25
US00174887A US3777211A (en) 1970-08-27 1971-08-25 Adjusting device for a particle beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7012671A NL7012671A (de) 1970-08-27 1970-08-27

Publications (1)

Publication Number Publication Date
NL7012671A true NL7012671A (de) 1972-02-29

Family

ID=19810865

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7012671A NL7012671A (de) 1970-08-27 1970-08-27

Country Status (6)

Country Link
US (1) US3777211A (de)
CA (1) CA946985A (de)
DE (1) DE2138766A1 (de)
FR (1) FR2106022A5 (de)
GB (1) GB1367940A (de)
NL (1) NL7012671A (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4376249A (en) * 1980-11-06 1983-03-08 International Business Machines Corporation Variable axis electron beam projection system
DE3138896A1 (de) * 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München Elektronenoptisches system mit vario-formstrahl zur erzeugung und messung von mikrostrukturen
US5949076A (en) * 1996-02-26 1999-09-07 Kabushiki Kaisha Toshiba Charged beam applying apparatus
JP2004534360A (ja) * 2001-06-15 2004-11-11 株式会社荏原製作所 電子線装置及びその電子線装置を用いたデバイスの製造方法
EP1401007B1 (de) * 2002-09-18 2005-06-15 Staib Instrumente GmbH Elektronenbeugungsvorrichtung zur Anwendung in einer Produktionsumgebung und für Hochdruck-Abscheidungsverfahren
US9159527B2 (en) 2003-10-16 2015-10-13 Carl Zeiss Microscopy, Llc Systems and methods for a gas field ionization source
US7786452B2 (en) 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
US7786451B2 (en) 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
US8110814B2 (en) 2003-10-16 2012-02-07 Alis Corporation Ion sources, systems and methods
US7804068B2 (en) 2006-11-15 2010-09-28 Alis Corporation Determining dopant information
JP2012504309A (ja) * 2008-09-30 2012-02-16 カール ツァイス エヌティーエス エルエルシー 荷電粒子ビームの位置合わせ
WO2011058833A1 (ja) * 2009-11-10 2011-05-19 三菱電機株式会社 粒子線照射システムおよび粒子線照射方法
JP5364112B2 (ja) 2011-01-25 2013-12-11 株式会社日立ハイテクノロジーズ 荷電粒子線装置
FR3123597B1 (fr) 2021-06-08 2023-04-21 Psa Automobiles Sa Sous-ensemble compact pour groupe electromoteur de vehicules automobiles

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2418349A (en) * 1945-12-13 1947-04-01 Rca Corp Method of and means for correcting for distortion in electron lens systems
GB687207A (en) * 1950-02-23 1953-02-11 Vickers Electrical Co Ltd Improvements relating to electron microscopes
US3371206A (en) * 1964-02-04 1968-02-27 Jeol Ltd Electron beam apparatus having compensating means for triangular beam distortion
DE1299088C2 (de) * 1966-06-10 1974-10-17 Siemens AG, Berlin und München, 8000 München Ablenkeinrichtung fuer den korpuskularstrahl in einem korpuskularstrahlgeraet, insbesondere elektronenmikroskop
US3588586A (en) * 1968-04-26 1971-06-28 Jeol Ltd Apparatus for correcting electron beam deflection

Also Published As

Publication number Publication date
US3777211A (en) 1973-12-04
DE2138766A1 (de) 1972-03-02
FR2106022A5 (de) 1972-04-28
CA946985A (en) 1974-05-07
GB1367940A (en) 1974-09-25

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