NL7009364A - - Google Patents
Info
- Publication number
- NL7009364A NL7009364A NL7009364A NL7009364A NL7009364A NL 7009364 A NL7009364 A NL 7009364A NL 7009364 A NL7009364 A NL 7009364A NL 7009364 A NL7009364 A NL 7009364A NL 7009364 A NL7009364 A NL 7009364A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB3355569A GB1291575A (en) | 1969-07-03 | 1969-07-03 | Methods and apparatus for the production of semiconductor devices by electron-beam patterning and devices produced thereby |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL7009364A true NL7009364A (xx) | 1971-01-05 |
Family
ID=10354462
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL7009364A NL7009364A (xx) | 1969-07-03 | 1970-06-25 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS553812B1 (xx) |
| DE (1) | DE2032590C2 (xx) |
| FR (1) | FR2060026B1 (xx) |
| GB (1) | GB1291575A (xx) |
| NL (1) | NL7009364A (xx) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW208757B (xx) * | 1992-01-09 | 1993-07-01 | Samsung Electronics Co Ltd | |
| DE10011202A1 (de) * | 2000-03-08 | 2001-09-13 | Leica Microsys Lithography Ltd | Verfahren zur Ausrichtung eines Elektronenstrahls auf eine Zielposition an einer Substratoberfläche |
-
1969
- 1969-07-03 GB GB3355569A patent/GB1291575A/en not_active Expired
-
1970
- 1970-06-25 NL NL7009364A patent/NL7009364A/xx unknown
- 1970-07-01 DE DE19702032590 patent/DE2032590C2/de not_active Expired
- 1970-07-01 FR FR7024346A patent/FR2060026B1/fr not_active Expired
- 1970-07-01 JP JP5767570A patent/JPS553812B1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| GB1291575A (en) | 1972-10-04 |
| JPS553812B1 (xx) | 1980-01-26 |
| FR2060026A1 (xx) | 1971-06-11 |
| FR2060026B1 (xx) | 1976-03-19 |
| DE2032590C2 (de) | 1983-09-01 |
| DE2032590A1 (de) | 1971-01-21 |