NL6916526A - - Google Patents
Info
- Publication number
- NL6916526A NL6916526A NL6916526A NL6916526A NL6916526A NL 6916526 A NL6916526 A NL 6916526A NL 6916526 A NL6916526 A NL 6916526A NL 6916526 A NL6916526 A NL 6916526A NL 6916526 A NL6916526 A NL 6916526A
- Authority
- NL
- Netherlands
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G13/00—Electrographic processes using a charge pattern
- G03G13/26—Electrographic processes using a charge pattern for the production of printing plates for non-xerographic printing processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19681813446 DE1813446C3 (de) | 1968-12-09 | Verfahren zum Herstellen einer Halbtöne druckenden Flachdruckform |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL6916526A true NL6916526A (de) | 1970-06-11 |
Family
ID=5715633
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL6916526A NL6916526A (de) | 1968-12-09 | 1969-11-03 |
Country Status (9)
| Country | Link |
|---|---|
| AT (1) | AT292033B (de) |
| BE (1) | BE740724A (de) |
| BR (1) | BR6914145D0 (de) |
| CH (1) | CH511460A (de) |
| ES (1) | ES372728A1 (de) |
| FR (1) | FR2025633A1 (de) |
| GB (1) | GB1294360A (de) |
| IL (1) | IL33341A (de) |
| NL (1) | NL6916526A (de) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4581996A (en) * | 1982-03-15 | 1986-04-15 | American Hoechst Corporation | Aluminum support useful for lithography |
| EP0089506A3 (de) * | 1982-03-18 | 1984-04-11 | American Hoechst Corporation | Lichtempfindliches Gemisch auf Basis von Diazoniumsalz-Polykondensationsprodukten und daraus hergestelltes lichtempfindliches Aufzeichnungsmaterial |
| DE3307364A1 (de) * | 1983-03-02 | 1984-09-06 | Hoechst Ag, 6230 Frankfurt | Zweikomponenten-diazontypiematerial |
| EP0193603A4 (de) * | 1984-09-13 | 1988-04-06 | Advanced Micro Devices Inc | Photolithographisches verfahren unter verwendung eines positiven photowiderstands mit einer nichtbleichbaren lichtabsorbierenden substanz. |
-
1969
- 1969-10-15 CH CH1542769A patent/CH511460A/de not_active IP Right Cessation
- 1969-10-20 ES ES372728A patent/ES372728A1/es not_active Expired
- 1969-10-23 BE BE740724D patent/BE740724A/xx not_active IP Right Cessation
- 1969-10-27 FR FR6936741A patent/FR2025633A1/fr not_active Withdrawn
- 1969-10-29 AT AT1020269A patent/AT292033B/de not_active IP Right Cessation
- 1969-11-03 NL NL6916526A patent/NL6916526A/xx unknown
- 1969-11-11 IL IL33341A patent/IL33341A/xx unknown
- 1969-11-11 GB GB55102/69A patent/GB1294360A/en not_active Expired
- 1969-11-13 BR BR214145/69A patent/BR6914145D0/pt unknown
Also Published As
| Publication number | Publication date |
|---|---|
| AT292033B (de) | 1971-08-10 |
| GB1294360A (en) | 1972-10-25 |
| DE1813446B2 (de) | 1976-03-11 |
| IL33341A0 (en) | 1970-01-29 |
| BR6914145D0 (pt) | 1973-04-12 |
| DE1813446A1 (de) | 1970-07-09 |
| FR2025633A1 (de) | 1970-09-11 |
| IL33341A (en) | 1974-07-31 |
| ES372728A1 (es) | 1971-11-01 |
| CH511460A (de) | 1971-08-15 |
| BE740724A (de) | 1970-04-23 |