BE740724A - - Google Patents

Info

Publication number
BE740724A
BE740724A BE740724DA BE740724A BE 740724 A BE740724 A BE 740724A BE 740724D A BE740724D A BE 740724DA BE 740724 A BE740724 A BE 740724A
Authority
BE
Belgium
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19681813446 external-priority patent/DE1813446C3/de
Application filed filed Critical
Publication of BE740724A publication Critical patent/BE740724A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G13/00—Electrographic processes using a charge pattern
    • G03G13/26—Electrographic processes using a charge pattern for the production of printing plates for non-xerographic printing processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
BE740724D 1968-12-09 1969-10-23 BE740724A (xx)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19681813446 DE1813446C3 (de) 1968-12-09 Verfahren zum Herstellen einer Halbtöne druckenden Flachdruckform

Publications (1)

Publication Number Publication Date
BE740724A true BE740724A (xx) 1970-04-23

Family

ID=5715633

Family Applications (1)

Application Number Title Priority Date Filing Date
BE740724D BE740724A (xx) 1968-12-09 1969-10-23

Country Status (9)

Country Link
AT (1) AT292033B (xx)
BE (1) BE740724A (xx)
BR (1) BR6914145D0 (xx)
CH (1) CH511460A (xx)
ES (1) ES372728A1 (xx)
FR (1) FR2025633A1 (xx)
GB (1) GB1294360A (xx)
IL (1) IL33341A (xx)
NL (1) NL6916526A (xx)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4581996A (en) * 1982-03-15 1986-04-15 American Hoechst Corporation Aluminum support useful for lithography
EP0089506A3 (de) * 1982-03-18 1984-04-11 American Hoechst Corporation Lichtempfindliches Gemisch auf Basis von Diazoniumsalz-Polykondensationsprodukten und daraus hergestelltes lichtempfindliches Aufzeichnungsmaterial
DE3307364A1 (de) * 1983-03-02 1984-09-06 Hoechst Ag, 6230 Frankfurt Zweikomponenten-diazontypiematerial
WO1986001914A1 (en) * 1984-09-13 1986-03-27 Advanced Micro Devices, Inc. Photolithography process using positive photoresist containing unbleachable light absorbing agent

Also Published As

Publication number Publication date
CH511460A (de) 1971-08-15
DE1813446A1 (de) 1970-07-09
IL33341A (en) 1974-07-31
IL33341A0 (en) 1970-01-29
NL6916526A (xx) 1970-06-11
DE1813446B2 (de) 1976-03-11
FR2025633A1 (xx) 1970-09-11
AT292033B (de) 1971-08-10
BR6914145D0 (pt) 1973-04-12
GB1294360A (en) 1972-10-25
ES372728A1 (es) 1971-11-01

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: HOECHST A.G.

Effective date: 19861031