FR2025633A1 - - Google Patents

Info

Publication number
FR2025633A1
FR2025633A1 FR6936741A FR6936741A FR2025633A1 FR 2025633 A1 FR2025633 A1 FR 2025633A1 FR 6936741 A FR6936741 A FR 6936741A FR 6936741 A FR6936741 A FR 6936741A FR 2025633 A1 FR2025633 A1 FR 2025633A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR6936741A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19681813446 external-priority patent/DE1813446C3/de
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Publication of FR2025633A1 publication Critical patent/FR2025633A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G13/00—Electrographic processes using a charge pattern
    • G03G13/26—Electrographic processes using a charge pattern for the production of printing plates for non-xerographic printing processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
FR6936741A 1968-12-09 1969-10-27 Withdrawn FR2025633A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19681813446 DE1813446C3 (de) 1968-12-09 Verfahren zum Herstellen einer Halbtöne druckenden Flachdruckform

Publications (1)

Publication Number Publication Date
FR2025633A1 true FR2025633A1 (de) 1970-09-11

Family

ID=5715633

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6936741A Withdrawn FR2025633A1 (de) 1968-12-09 1969-10-27

Country Status (9)

Country Link
AT (1) AT292033B (de)
BE (1) BE740724A (de)
BR (1) BR6914145D0 (de)
CH (1) CH511460A (de)
ES (1) ES372728A1 (de)
FR (1) FR2025633A1 (de)
GB (1) GB1294360A (de)
IL (1) IL33341A (de)
NL (1) NL6916526A (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0089506A2 (de) * 1982-03-18 1983-09-28 American Hoechst Corporation Lichtempfindliches Gemisch auf Basis von Diazoniumsalz-Polykondensationsprodukten und daraus hergestelltes lichtempfindliches Aufzeichnungsmaterial
EP0193603A1 (de) * 1984-09-13 1986-09-10 Advanced Micro Devices, Inc. Photolithographisches verfahren unter verwendung eines positiven photowiderstands mit einer nichtbleichbaren lichtabsorbierenden substanz

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4581996A (en) * 1982-03-15 1986-04-15 American Hoechst Corporation Aluminum support useful for lithography
DE3307364A1 (de) * 1983-03-02 1984-09-06 Hoechst Ag, 6230 Frankfurt Zweikomponenten-diazontypiematerial

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0089506A2 (de) * 1982-03-18 1983-09-28 American Hoechst Corporation Lichtempfindliches Gemisch auf Basis von Diazoniumsalz-Polykondensationsprodukten und daraus hergestelltes lichtempfindliches Aufzeichnungsmaterial
EP0089506A3 (de) * 1982-03-18 1984-04-11 American Hoechst Corporation Lichtempfindliches Gemisch auf Basis von Diazoniumsalz-Polykondensationsprodukten und daraus hergestelltes lichtempfindliches Aufzeichnungsmaterial
EP0193603A1 (de) * 1984-09-13 1986-09-10 Advanced Micro Devices, Inc. Photolithographisches verfahren unter verwendung eines positiven photowiderstands mit einer nichtbleichbaren lichtabsorbierenden substanz
EP0193603A4 (de) * 1984-09-13 1988-04-06 Advanced Micro Devices Inc Photolithographisches verfahren unter verwendung eines positiven photowiderstands mit einer nichtbleichbaren lichtabsorbierenden substanz.

Also Published As

Publication number Publication date
CH511460A (de) 1971-08-15
DE1813446A1 (de) 1970-07-09
IL33341A (en) 1974-07-31
IL33341A0 (en) 1970-01-29
BE740724A (de) 1970-04-23
NL6916526A (de) 1970-06-11
DE1813446B2 (de) 1976-03-11
AT292033B (de) 1971-08-10
BR6914145D0 (pt) 1973-04-12
GB1294360A (en) 1972-10-25
ES372728A1 (es) 1971-11-01

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Legal Events

Date Code Title Description
ST Notification of lapse