NL6915794A - - Google Patents

Info

Publication number
NL6915794A
NL6915794A NL6915794A NL6915794A NL6915794A NL 6915794 A NL6915794 A NL 6915794A NL 6915794 A NL6915794 A NL 6915794A NL 6915794 A NL6915794 A NL 6915794A NL 6915794 A NL6915794 A NL 6915794A
Authority
NL
Netherlands
Application number
NL6915794A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to BE757658D priority Critical patent/BE757658A/xx
Application filed filed Critical
Priority to NL6915794A priority patent/NL6915794A/xx
Priority to DE19702050422 priority patent/DE2050422C3/de
Priority to CH1526170A priority patent/CH515529A/de
Priority to GB4902970A priority patent/GB1330343A/en
Priority to AT931470A priority patent/AT307068B/de
Priority to SE13934/70A priority patent/SE354526B/xx
Priority to JP45090150A priority patent/JPS5128189B1/ja
Priority to US81276A priority patent/US3688655A/en
Priority to FR7037469A priority patent/FR2066104A5/fr
Priority to ES384612A priority patent/ES384612A1/es
Publication of NL6915794A publication Critical patent/NL6915794A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)
NL6915794A 1969-10-18 1969-10-18 NL6915794A (en:Method)

Priority Applications (11)

Application Number Priority Date Filing Date Title
BE757658D BE757658A (fr) 1969-10-18 Procede et dispositif pour tracer avec de la lumiere des configurationsconstituant masques sur du materiau photographique
NL6915794A NL6915794A (en:Method) 1969-10-18 1969-10-18
DE19702050422 DE2050422C3 (de) 1969-10-18 1970-10-14 Verfahren und Vorrichtung zum Schreiben von Maskenmustern mit Hilfe von Licht auf einem photographischen Material
AT931470A AT307068B (de) 1969-10-18 1970-10-15 Verfahren zur Vorrichtung zum Schreiben von Maskenmustern mit Hilfe von Licht auf einem photographischen Material
GB4902970A GB1330343A (en) 1969-10-18 1970-10-15 Method of and apparatus for light-writing mask patterns
CH1526170A CH515529A (de) 1969-10-18 1970-10-15 Verfahren und Vorrichtung zum Schreiben eines Maskenmusters mit Hilfe von Licht auf einem photographischen Material
SE13934/70A SE354526B (en:Method) 1969-10-18 1970-10-15
JP45090150A JPS5128189B1 (en:Method) 1969-10-18 1970-10-15
US81276A US3688655A (en) 1969-10-18 1970-10-16 Method of, and apparatus for, writing mask patterns on photographic material by means of light
FR7037469A FR2066104A5 (en:Method) 1969-10-18 1970-10-16
ES384612A ES384612A1 (es) 1969-10-18 1970-10-16 Un metodo y un aparato para escribir o registrar modelos, disenos o patrones de mascaras sobre un material fotograficopor medio de luz.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6915794A NL6915794A (en:Method) 1969-10-18 1969-10-18

Publications (1)

Publication Number Publication Date
NL6915794A true NL6915794A (en:Method) 1971-04-20

Family

ID=19808166

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6915794A NL6915794A (en:Method) 1969-10-18 1969-10-18

Country Status (10)

Country Link
US (1) US3688655A (en:Method)
JP (1) JPS5128189B1 (en:Method)
AT (1) AT307068B (en:Method)
BE (1) BE757658A (en:Method)
CH (1) CH515529A (en:Method)
ES (1) ES384612A1 (en:Method)
FR (1) FR2066104A5 (en:Method)
GB (1) GB1330343A (en:Method)
NL (1) NL6915794A (en:Method)
SE (1) SE354526B (en:Method)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3710702A (en) * 1971-06-01 1973-01-16 Ibm Optical exposure head
US3848520A (en) * 1972-07-24 1974-11-19 Gerber Scientific Instr Co Line drawing photoexposure device with image rotating means
US3836916A (en) * 1973-02-26 1974-09-17 Ibm Apparatus for exposing lines on a photosensitive surface
US4070187A (en) * 1974-02-11 1978-01-24 Seiscom Delta Inc. Color display of data
US3975705A (en) * 1974-02-11 1976-08-17 Seiscom Delta Inc. Color display of geophysical and other data
US4573779A (en) * 1983-12-30 1986-03-04 International Business Machines Corporation Variable size circular aperture camera
WO2009124595A1 (en) * 2008-04-11 2009-10-15 Carl Zeiss Smt Ag Optical aperture device
KR102858267B1 (ko) * 2022-10-26 2025-09-10 (주)흥영 압축품 자동 해체 투입기

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1107981A (en) * 1963-06-06 1968-03-27 Barr & Stroud Ltd Apparatus for automatically drawing lines
US3330182A (en) * 1965-10-01 1967-07-11 Gerber Scientific Instr Co Device for exposing discrete portions of a photosensitive surface to a variable intensity light beam

Also Published As

Publication number Publication date
SE354526B (en:Method) 1973-03-12
US3688655A (en) 1972-09-05
DE2050422B2 (de) 1976-04-22
AT307068B (de) 1973-05-10
CH515529A (de) 1971-11-15
FR2066104A5 (en:Method) 1971-08-06
DE2050422A1 (de) 1971-04-29
GB1330343A (en) 1973-09-19
BE757658A (fr) 1971-04-16
JPS5128189B1 (en:Method) 1976-08-17
ES384612A1 (es) 1973-01-16

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