NL6915794A - - Google Patents

Info

Publication number
NL6915794A
NL6915794A NL6915794A NL6915794A NL6915794A NL 6915794 A NL6915794 A NL 6915794A NL 6915794 A NL6915794 A NL 6915794A NL 6915794 A NL6915794 A NL 6915794A NL 6915794 A NL6915794 A NL 6915794A
Authority
NL
Netherlands
Application number
NL6915794A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to BE757658D priority Critical patent/BE757658A/xx
Application filed filed Critical
Priority to NL6915794A priority patent/NL6915794A/xx
Priority to DE19702050422 priority patent/DE2050422C3/de
Priority to AT931470A priority patent/AT307068B/de
Priority to JP45090150A priority patent/JPS5128189B1/ja
Priority to GB4902970A priority patent/GB1330343A/en
Priority to CH1526170A priority patent/CH515529A/de
Priority to SE13934/70A priority patent/SE354526B/xx
Priority to US81276A priority patent/US3688655A/en
Priority to ES384612A priority patent/ES384612A1/es
Priority to FR7037469A priority patent/FR2066104A5/fr
Publication of NL6915794A publication Critical patent/NL6915794A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704Scanned exposure beam, e.g. raster-, rotary- and vector scanning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)
NL6915794A 1969-10-18 1969-10-18 NL6915794A (xx)

Priority Applications (11)

Application Number Priority Date Filing Date Title
BE757658D BE757658A (fr) 1969-10-18 Procede et dispositif pour tracer avec de la lumiere des configurationsconstituant masques sur du materiau photographique
NL6915794A NL6915794A (xx) 1969-10-18 1969-10-18
DE19702050422 DE2050422C3 (de) 1969-10-18 1970-10-14 Verfahren und Vorrichtung zum Schreiben von Maskenmustern mit Hilfe von Licht auf einem photographischen Material
GB4902970A GB1330343A (en) 1969-10-18 1970-10-15 Method of and apparatus for light-writing mask patterns
JP45090150A JPS5128189B1 (xx) 1969-10-18 1970-10-15
AT931470A AT307068B (de) 1969-10-18 1970-10-15 Verfahren zur Vorrichtung zum Schreiben von Maskenmustern mit Hilfe von Licht auf einem photographischen Material
CH1526170A CH515529A (de) 1969-10-18 1970-10-15 Verfahren und Vorrichtung zum Schreiben eines Maskenmusters mit Hilfe von Licht auf einem photographischen Material
SE13934/70A SE354526B (xx) 1969-10-18 1970-10-15
US81276A US3688655A (en) 1969-10-18 1970-10-16 Method of, and apparatus for, writing mask patterns on photographic material by means of light
ES384612A ES384612A1 (es) 1969-10-18 1970-10-16 Un metodo y un aparato para escribir o registrar modelos, disenos o patrones de mascaras sobre un material fotograficopor medio de luz.
FR7037469A FR2066104A5 (xx) 1969-10-18 1970-10-16

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6915794A NL6915794A (xx) 1969-10-18 1969-10-18

Publications (1)

Publication Number Publication Date
NL6915794A true NL6915794A (xx) 1971-04-20

Family

ID=19808166

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6915794A NL6915794A (xx) 1969-10-18 1969-10-18

Country Status (10)

Country Link
US (1) US3688655A (xx)
JP (1) JPS5128189B1 (xx)
AT (1) AT307068B (xx)
BE (1) BE757658A (xx)
CH (1) CH515529A (xx)
ES (1) ES384612A1 (xx)
FR (1) FR2066104A5 (xx)
GB (1) GB1330343A (xx)
NL (1) NL6915794A (xx)
SE (1) SE354526B (xx)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3710702A (en) * 1971-06-01 1973-01-16 Ibm Optical exposure head
US3848520A (en) * 1972-07-24 1974-11-19 Gerber Scientific Instr Co Line drawing photoexposure device with image rotating means
US3836916A (en) * 1973-02-26 1974-09-17 Ibm Apparatus for exposing lines on a photosensitive surface
US4070187A (en) * 1974-02-11 1978-01-24 Seiscom Delta Inc. Color display of data
US3975705A (en) * 1974-02-11 1976-08-17 Seiscom Delta Inc. Color display of geophysical and other data
US4573779A (en) * 1983-12-30 1986-03-04 International Business Machines Corporation Variable size circular aperture camera
WO2009124595A1 (en) 2008-04-11 2009-10-15 Carl Zeiss Smt Ag Optical aperture device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1107981A (en) * 1963-06-06 1968-03-27 Barr & Stroud Ltd Apparatus for automatically drawing lines
US3330182A (en) * 1965-10-01 1967-07-11 Gerber Scientific Instr Co Device for exposing discrete portions of a photosensitive surface to a variable intensity light beam

Also Published As

Publication number Publication date
FR2066104A5 (xx) 1971-08-06
US3688655A (en) 1972-09-05
ES384612A1 (es) 1973-01-16
CH515529A (de) 1971-11-15
BE757658A (fr) 1971-04-16
DE2050422A1 (de) 1971-04-29
GB1330343A (en) 1973-09-19
AT307068B (de) 1973-05-10
JPS5128189B1 (xx) 1976-08-17
SE354526B (xx) 1973-03-12
DE2050422B2 (de) 1976-04-22

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