NL6908662A - - Google Patents

Info

Publication number
NL6908662A
NL6908662A NL6908662A NL6908662A NL6908662A NL 6908662 A NL6908662 A NL 6908662A NL 6908662 A NL6908662 A NL 6908662A NL 6908662 A NL6908662 A NL 6908662A NL 6908662 A NL6908662 A NL 6908662A
Authority
NL
Netherlands
Application number
NL6908662A
Other versions
NL165566C (nl
NL165566B (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6908662A publication Critical patent/NL6908662A/xx
Publication of NL165566B publication Critical patent/NL165566B/xx
Application granted granted Critical
Publication of NL165566C publication Critical patent/NL165566C/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00Photographic printing apparatus
    • G03B27/02Exposure apparatus for contact printing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2041Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/7035Proximity or contact printers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL6908662A 1968-06-08 1969-06-06 Werkwijze voor het volgens een vooraf bepaald patroon etsen van een op een halfgeleiderplaat aangebrachte oxydelaag. NL165566C (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19681764456 DE1764456C3 (de) 1968-06-08 1968-06-08 Verfahren zur Abbildung eines Musters auf eine Photolackschicht

Publications (3)

Publication Number Publication Date
NL6908662A true NL6908662A (de) 1969-12-10
NL165566B NL165566B (nl) 1980-11-17
NL165566C NL165566C (nl) 1981-04-15

Family

ID=5697997

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6908662A NL165566C (nl) 1968-06-08 1969-06-06 Werkwijze voor het volgens een vooraf bepaald patroon etsen van een op een halfgeleiderplaat aangebrachte oxydelaag.

Country Status (4)

Country Link
DE (1) DE1764456C3 (de)
FR (1) FR2010439A1 (de)
GB (1) GB1248819A (de)
NL (1) NL165566C (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ZA8244B (en) * 1981-01-16 1982-11-24 Grace W R & Co Method and apparatus for making printed circuit boards

Also Published As

Publication number Publication date
DE1764456B2 (de) 1979-02-08
FR2010439A1 (de) 1970-02-13
DE1764456C3 (de) 1979-10-11
NL165566C (nl) 1981-04-15
GB1248819A (en) 1971-10-06
NL165566B (nl) 1980-11-17
DE1764456A1 (de) 1971-07-22

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee