FR2010439A1 - - Google Patents

Info

Publication number
FR2010439A1
FR2010439A1 FR6918752A FR6918752A FR2010439A1 FR 2010439 A1 FR2010439 A1 FR 2010439A1 FR 6918752 A FR6918752 A FR 6918752A FR 6918752 A FR6918752 A FR 6918752A FR 2010439 A1 FR2010439 A1 FR 2010439A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR6918752A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOSCH
Original Assignee
BOSCH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOSCH filed Critical BOSCH
Publication of FR2010439A1 publication Critical patent/FR2010439A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/02—Exposure apparatus for contact printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
FR6918752A 1968-06-08 1969-06-06 Withdrawn FR2010439A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19681764456 DE1764456C3 (de) 1968-06-08 1968-06-08 Verfahren zur Abbildung eines Musters auf eine Photolackschicht

Publications (1)

Publication Number Publication Date
FR2010439A1 true FR2010439A1 (de) 1970-02-13

Family

ID=5697997

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6918752A Withdrawn FR2010439A1 (de) 1968-06-08 1969-06-06

Country Status (4)

Country Link
DE (1) DE1764456C3 (de)
FR (1) FR2010439A1 (de)
GB (1) GB1248819A (de)
NL (1) NL165566C (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2498410A1 (fr) * 1981-01-16 1982-07-23 Grace W R Ltd Procede de preparation de planches de circuit imprime, procede pour deposer selectivement de la soudure sur certaines parties d'une planche de circuit imprime, dispositif de production de planches de circuit imprime et ensemble de plateau a plusieurs chambres sous vide

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2498410A1 (fr) * 1981-01-16 1982-07-23 Grace W R Ltd Procede de preparation de planches de circuit imprime, procede pour deposer selectivement de la soudure sur certaines parties d'une planche de circuit imprime, dispositif de production de planches de circuit imprime et ensemble de plateau a plusieurs chambres sous vide

Also Published As

Publication number Publication date
DE1764456B2 (de) 1979-02-08
DE1764456A1 (de) 1971-07-22
DE1764456C3 (de) 1979-10-11
GB1248819A (en) 1971-10-06
NL165566C (nl) 1981-04-15
NL165566B (nl) 1980-11-17
NL6908662A (de) 1969-12-10

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Legal Events

Date Code Title Description
ST Notification of lapse