NL6808231A - - Google Patents

Info

Publication number
NL6808231A
NL6808231A NL6808231A NL6808231A NL6808231A NL 6808231 A NL6808231 A NL 6808231A NL 6808231 A NL6808231 A NL 6808231A NL 6808231 A NL6808231 A NL 6808231A NL 6808231 A NL6808231 A NL 6808231A
Authority
NL
Netherlands
Application number
NL6808231A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6808231A publication Critical patent/NL6808231A/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/11Vinyl alcohol polymer or derivative

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
NL6808231A 1967-06-12 1968-06-12 NL6808231A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US64548867A 1967-06-12 1967-06-12

Publications (1)

Publication Number Publication Date
NL6808231A true NL6808231A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1968-12-13

Family

ID=24589232

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6808231A NL6808231A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1967-06-12 1968-06-12

Country Status (6)

Country Link
US (1) US3620735A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CH (1) CH493005A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE1772597C3 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR1571543A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB1236486A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL6808231A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1340046A (en) * 1970-03-10 1973-12-05 Agfa Gevaert Photochemical reproduction process
US4546064A (en) * 1982-04-02 1985-10-08 North American Philips Corporation Positive-working photoresist composition and method for forming a light-absorbing matrix
EP0091163B1 (en) * 1982-04-02 1987-11-25 North American Philips Corporation Positive-working photoresist composition and method for forming a light-absorbing matrix in a color crt structure
US4505999A (en) * 1983-09-12 1985-03-19 North American Philips Consumer Electronics Corp. Photographic process for applying phosphor pattern to color CRT shadow mask
US4590138A (en) * 1983-11-04 1986-05-20 North American Philips Consumer Electronic Corp. Positive-working photoresist composition and method for forming a light-absorbing matrix in a color CRT structure
SG11201610339YA (en) * 2014-06-09 2017-01-27 Agency Science Tech & Res Metal complexes

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB665649A (en) * 1949-04-01 1952-01-30 Autotype Company Ltd Improvements in photographic films and processes for producing stencils therewith
US2927021A (en) * 1956-03-27 1960-03-01 Horizons Inc Method of producing a relief image
US3038803A (en) * 1958-02-07 1962-06-12 Keuffel & Esser Co Photosensitive material
DE1622462A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1960-10-11

Also Published As

Publication number Publication date
CH493005A (fr) 1970-06-30
DE1772597A1 (de) 1971-11-25
US3620735A (en) 1971-11-16
GB1236486A (en) 1971-06-23
FR1571543A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1969-06-20
DE1772597B2 (de) 1973-05-24
DE1772597C3 (de) 1973-12-06

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