NL6710051A - - Google Patents
Info
- Publication number
- NL6710051A NL6710051A NL6710051A NL6710051A NL6710051A NL 6710051 A NL6710051 A NL 6710051A NL 6710051 A NL6710051 A NL 6710051A NL 6710051 A NL6710051 A NL 6710051A NL 6710051 A NL6710051 A NL 6710051A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/12—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure
- B23K26/1224—Working by laser beam, e.g. welding, cutting or boring in a special atmosphere, e.g. in an enclosure in vacuum
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/146—Laser beam
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma & Fusion (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Toxicology (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Manufacturing Of Printed Wiring (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB33047/66A GB1138084A (en) | 1966-07-22 | 1966-07-22 | Method of vapour depositing a material in the form of a pattern |
Publications (1)
Publication Number | Publication Date |
---|---|
NL6710051A true NL6710051A (xx) | 1968-01-23 |
Family
ID=10347823
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL6710051A NL6710051A (xx) | 1966-07-22 | 1967-07-20 |
Country Status (4)
Country | Link |
---|---|
US (1) | US3560258A (xx) |
ES (1) | ES343349A1 (xx) |
GB (1) | GB1138084A (xx) |
NL (1) | NL6710051A (xx) |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3637410A (en) * | 1968-12-18 | 1972-01-25 | Gary L Stevens | Method of treating cathodo-luminescent phosphors |
FR2030145B1 (xx) * | 1969-01-15 | 1975-10-31 | Ibm | |
US3873339A (en) * | 1972-03-30 | 1975-03-25 | Corning Glass Works | Method of forming optical waveguide circuit path |
US4042006A (en) * | 1973-01-05 | 1977-08-16 | Siemens Aktiengesellschaft | Pyrolytic process for producing a band-shaped metal layer on a substrate |
US3886366A (en) * | 1973-04-13 | 1975-05-27 | Us Air Force | Compton back-scattered radiation source |
JPS5157283A (en) * | 1974-11-15 | 1976-05-19 | Nippon Electric Co | Handotaikibanno bunkatsuhoho |
DE2511390C2 (de) * | 1975-03-15 | 1984-03-15 | Agfa-Gevaert Ag, 5090 Leverkusen | Verfahren und Vorrichtung zur Herstellung von Tageslichtprojektionsschirmen sowie nach diesem Verfahren hergestellter Tageslichtprojektionsschirm |
US4190759A (en) * | 1975-08-27 | 1980-02-26 | Hitachi, Ltd. | Processing of photomask |
CA1105093A (en) * | 1977-12-21 | 1981-07-14 | Roland F. Drew | Laser deposition of metal upon transparent materials |
US4388517A (en) * | 1980-09-22 | 1983-06-14 | Texas Instruments Incorporated | Sublimation patterning process |
JPS57102016A (en) * | 1980-12-17 | 1982-06-24 | Hitachi Ltd | Pattern generator |
US4472513A (en) * | 1980-12-29 | 1984-09-18 | Allied Corporation | Laser-synthesized catalysts |
US4459937A (en) * | 1981-04-27 | 1984-07-17 | Rockwell International Corporation | High rate resist polymerization apparatus |
US4357364A (en) * | 1981-04-27 | 1982-11-02 | Rockwell International Corporation | High rate resist polymerization method |
JPS57198631A (en) * | 1981-05-29 | 1982-12-06 | Ibm | Exposing method and device |
JPS58170037A (ja) * | 1982-03-31 | 1983-10-06 | Toshiba Corp | 配線の切断方法及び切断装置 |
GB2125830A (en) * | 1982-08-24 | 1984-03-14 | Mason Vactron Limited | Vacuum deposition apparatus and method |
US4519876A (en) * | 1984-06-28 | 1985-05-28 | Thermo Electron Corporation | Electrolytic deposition of metals on laser-conditioned surfaces |
US4743463A (en) * | 1986-02-21 | 1988-05-10 | Eastman Kodak Company | Method for forming patterns on a substrate or support |
US4752455A (en) * | 1986-05-27 | 1988-06-21 | Kms Fusion, Inc. | Pulsed laser microfabrication |
US4970196A (en) * | 1987-01-15 | 1990-11-13 | The Johns Hopkins University | Method and apparatus for the thin film deposition of materials with a high power pulsed laser |
US5062939A (en) * | 1990-03-29 | 1991-11-05 | The United States Of America As Represented By The Secretary Of The Navy | Selective metallization of carbonyl-containing polymer films |
DE4034834C2 (de) * | 1990-11-02 | 1995-03-23 | Heraeus Noblelight Gmbh | Verfahren zur Herstellung metallischer Schichten auf Substraten und Verwendung der Schichten |
US5173441A (en) * | 1991-02-08 | 1992-12-22 | Micron Technology, Inc. | Laser ablation deposition process for semiconductor manufacture |
US5348776A (en) * | 1991-04-23 | 1994-09-20 | Osaka Gas Company Limited | Method of producing interconnectors for solid oxide electrolyte fuel cells |
EP0536431B1 (de) * | 1991-10-07 | 1994-11-30 | Siemens Aktiengesellschaft | Laserbearbeitungsverfahren für einen Dünnschichtaufbau |
DE4232373A1 (de) * | 1992-09-03 | 1994-03-10 | Deutsche Forsch Luft Raumfahrt | Verfahren zum Auftragen strukturierter Schichten |
DE4430390C2 (de) * | 1993-09-09 | 1995-08-10 | Krone Ag | Verfahren zur Herstellung von strukturierten Metallisierungen auf Oberflächen |
US5567336A (en) * | 1994-10-24 | 1996-10-22 | Matsushita Electric Industrial Co., Ltd. | Laser ablation forward metal deposition with electrostatic assisted bonding |
US5683601A (en) * | 1994-10-24 | 1997-11-04 | Panasonic Technologies, Inc. | Laser ablation forward metal deposition with electrostatic assisted bonding |
US5935462A (en) * | 1994-10-24 | 1999-08-10 | Matsushita Electric Industrial Co., Ltd. | Repair of metal lines by electrostatically assisted laser ablative deposition |
EP0732221B1 (en) * | 1995-03-16 | 1999-01-27 | Minnesota Mining And Manufacturing Company | Black metal thermally imageable transparency elements |
DE19517625A1 (de) * | 1995-05-13 | 1996-11-14 | Budenheim Rud A Oetker Chemie | Verfahren zum musterförmigen Bedrucken fester Substratoberflächen |
US6211080B1 (en) | 1996-10-30 | 2001-04-03 | Matsushita Electric Industrial Co., Ltd. | Repair of dielectric-coated electrode or circuit defects |
DE69704698T2 (de) * | 1996-12-27 | 2002-01-31 | Miyachi Technos Corp., Noda | Verfahren zur Beschriftung eines Gegenstands, dass ein Laserstrahl verwendet |
US6180912B1 (en) | 1998-03-31 | 2001-01-30 | Matsushita Electric Industrial Co., Ltd. | Fan-out beams for repairing an open defect |
US6060127A (en) * | 1998-03-31 | 2000-05-09 | Matsushita Electric Industrial Co., Ltd. | Mechanically restricted laser deposition |
WO2003031193A1 (en) * | 2001-10-09 | 2003-04-17 | Koninklijke Philips Electronics N.V. | Method of manufacturing an electronic component and electronic component obtained by means of said method |
TWI419233B (zh) * | 2008-04-09 | 2013-12-11 | Ind Tech Res Inst | 圖案化金屬層製作方法 |
EP2731126A1 (en) | 2012-11-09 | 2014-05-14 | Nederlandse Organisatie voor toegepast -natuurwetenschappelijk onderzoek TNO | Method for bonding bare chip dies |
US11890807B1 (en) | 2017-08-31 | 2024-02-06 | Blue Origin, Llc | Systems and methods for controlling additive manufacturing processes |
CN109848569A (zh) * | 2017-11-29 | 2019-06-07 | 北京自动化控制设备研究所 | 一种mems硅结构的激光刻蚀方法 |
US11819943B1 (en) * | 2019-03-28 | 2023-11-21 | Blue Origin Llc | Laser material fusion under vacuum, and associated systems and methods |
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1966
- 1966-07-22 GB GB33047/66A patent/GB1138084A/en not_active Expired
-
1967
- 1967-05-31 US US642403A patent/US3560258A/en not_active Expired - Lifetime
- 1967-07-20 NL NL6710051A patent/NL6710051A/xx unknown
- 1967-07-22 ES ES343349A patent/ES343349A1/es not_active Expired
Also Published As
Publication number | Publication date |
---|---|
ES343349A1 (es) | 1968-09-01 |
GB1138084A (en) | 1968-12-27 |
US3560258A (en) | 1971-02-02 |