NL6707515A - - Google Patents

Info

Publication number
NL6707515A
NL6707515A NL6707515A NL6707515A NL6707515A NL 6707515 A NL6707515 A NL 6707515A NL 6707515 A NL6707515 A NL 6707515A NL 6707515 A NL6707515 A NL 6707515A NL 6707515 A NL6707515 A NL 6707515A
Authority
NL
Netherlands
Application number
NL6707515A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to NL6707515A priority Critical patent/NL6707515A/xx
Priority to DE19681771394 priority patent/DE1771394C/de
Priority to US730436A priority patent/US3620827A/en
Priority to CH794068A priority patent/CH519589A/de
Priority to NO2080/68A priority patent/NO125514B/no
Priority to AT510668A priority patent/AT287789B/de
Priority to SE07127/68A priority patent/SE336571B/xx
Priority to GB1228920D priority patent/GB1228920A/en
Priority to BE715845D priority patent/BE715845A/xx
Priority to FR1563599D priority patent/FR1563599A/fr
Publication of NL6707515A publication Critical patent/NL6707515A/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/345—Silicon nitride
NL6707515A 1967-05-31 1967-05-31 NL6707515A (de)

Priority Applications (10)

Application Number Priority Date Filing Date Title
NL6707515A NL6707515A (de) 1967-05-31 1967-05-31
DE19681771394 DE1771394C (de) 1967-05-31 1968-05-17 Verfahren zur Abscheidung einer Sihziumnitridschicht
US730436A US3620827A (en) 1967-05-31 1968-05-20 Method of applying a layer of silicon nitride
CH794068A CH519589A (de) 1967-05-31 1968-05-28 Verfahren zum Anbringen einer Siliziumnitridschicht
NO2080/68A NO125514B (de) 1967-05-31 1968-05-28
AT510668A AT287789B (de) 1967-05-31 1968-05-28 Verfahren zum Anbringen einer Siliziumnitridschicht
SE07127/68A SE336571B (de) 1967-05-31 1968-05-28
GB1228920D GB1228920A (de) 1967-05-31 1968-05-28
BE715845D BE715845A (de) 1967-05-31 1968-05-29
FR1563599D FR1563599A (de) 1967-05-31 1968-05-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL6707515A NL6707515A (de) 1967-05-31 1967-05-31

Publications (1)

Publication Number Publication Date
NL6707515A true NL6707515A (de) 1968-12-02

Family

ID=19800267

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6707515A NL6707515A (de) 1967-05-31 1967-05-31

Country Status (9)

Country Link
US (1) US3620827A (de)
AT (1) AT287789B (de)
BE (1) BE715845A (de)
CH (1) CH519589A (de)
FR (1) FR1563599A (de)
GB (1) GB1228920A (de)
NL (1) NL6707515A (de)
NO (1) NO125514B (de)
SE (1) SE336571B (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3979490A (en) * 1970-12-09 1976-09-07 Siemens Aktiengesellschaft Method for the manufacture of tubular bodies of semiconductor material
DE2155849C3 (de) * 1971-11-10 1979-07-26 Semikron Gesellschaft Fuer Gleichrichterbau Und Elektronik Mbh, 8500 Nuernberg Verfahren zur Herstellung eines stabilisierenden und/oder isolierenden Überzuges auf Halbleiteroberflächen
DE2650154A1 (de) * 1976-10-30 1978-10-05 Kernforschungsanlage Juelich Vorrichtung zum nachweis oder zur messung ionisierender strahlung
US4181751A (en) * 1978-05-24 1980-01-01 Hughes Aircraft Company Process for the preparation of low temperature silicon nitride films by photochemical vapor deposition
US4265932A (en) * 1979-08-02 1981-05-05 Hughes Aircraft Company Mobile transparent window apparatus and method for photochemical vapor deposition
US4371587A (en) * 1979-12-17 1983-02-01 Hughes Aircraft Company Low temperature process for depositing oxide layers by photochemical vapor deposition
EP0030798B1 (de) * 1979-12-17 1983-12-28 Hughes Aircraft Company Verfahren zum Niederschlagen von Oxydschichten durch photochemischen Dampfniederschlag bei niedrigen Temperaturen
US4348428A (en) * 1980-12-15 1982-09-07 Board Of Regents For Oklahoma Agriculture And Mechanical Colleges Acting For And On Behalf Of Oklahoma State University Of Agriculture And Applied Sciences Method of depositing doped amorphous semiconductor on a substrate
US4447469A (en) * 1982-06-10 1984-05-08 Hughes Aircraft Company Process for forming sulfide layers by photochemical vapor deposition
JPH0630339B2 (ja) * 1984-07-16 1994-04-20 新技術事業団 ＧａＡｓ単結晶の製造方法
JPS61209975A (ja) * 1985-03-14 1986-09-18 株式会社豊田中央研究所 炭化珪素セラミツクス体の強化方法
DE3677455D1 (de) * 1985-09-30 1991-03-14 Siemens Ag Verfahren zur begrenzung von ausbruechen beim saegen einer halbleiterscheibe.
GB2234529B (en) * 1989-07-26 1993-06-02 Stc Plc Epitaxial growth process
US5557148A (en) * 1993-03-30 1996-09-17 Tribotech Hermetically sealed semiconductor device
US5728224A (en) * 1995-09-13 1998-03-17 Tetra Laval Holdings & Finance S.A. Apparatus and method for manufacturing a packaging material using gaseous phase atmospheric photo chemical vapor deposition to apply a barrier layer to a moving web substrate
US6635907B1 (en) * 1999-11-17 2003-10-21 Hrl Laboratories, Llc Type II interband heterostructure backward diodes

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2839426A (en) * 1954-01-21 1958-06-17 Union Carbide Corp Method of coating carbonaceous articles with silicon nitride
US3385729A (en) * 1964-10-26 1968-05-28 North American Rockwell Composite dual dielectric for isolation in integrated circuits and method of making
US3419761A (en) * 1965-10-11 1968-12-31 Ibm Method for depositing silicon nitride insulating films and electric devices incorporating such films

Also Published As

Publication number Publication date
AT287789B (de) 1971-02-10
GB1228920A (de) 1971-04-21
DE1771394A1 (de) 1972-01-13
DE1771394B2 (de) 1972-07-20
BE715845A (de) 1968-11-29
SE336571B (de) 1971-07-12
FR1563599A (de) 1969-04-11
US3620827A (en) 1971-11-16
CH519589A (de) 1972-02-29
NO125514B (de) 1972-09-18

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