NL6704404A - - Google Patents

Info

Publication number
NL6704404A
NL6704404A NL6704404A NL6704404A NL6704404A NL 6704404 A NL6704404 A NL 6704404A NL 6704404 A NL6704404 A NL 6704404A NL 6704404 A NL6704404 A NL 6704404A NL 6704404 A NL6704404 A NL 6704404A
Authority
NL
Netherlands
Application number
NL6704404A
Other versions
NL148360B (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6704404A publication Critical patent/NL6704404A/xx
Publication of NL148360B publication Critical patent/NL148360B/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/16Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal carbonyl compounds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrodes Of Semiconductors (AREA)
NL6704404A 1966-03-29 1967-03-28 PROCESS FOR THE MANUFACTURE OF A SEMICONDUCTOR DEVICE, AS WELL AS SEMI-CONDUCTOR DEVICE, MANUFACTURED ACCORDING TO THIS PROCESS. NL148360B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2020966 1966-03-29

Publications (2)

Publication Number Publication Date
NL6704404A true NL6704404A (en) 1967-10-02
NL148360B NL148360B (en) 1976-01-15

Family

ID=12020759

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6704404A NL148360B (en) 1966-03-29 1967-03-28 PROCESS FOR THE MANUFACTURE OF A SEMICONDUCTOR DEVICE, AS WELL AS SEMI-CONDUCTOR DEVICE, MANUFACTURED ACCORDING TO THIS PROCESS.

Country Status (7)

Country Link
BE (1) BE696171A (en)
CH (1) CH474854A (en)
DE (1) DE1614136B1 (en)
FR (1) FR1515732A (en)
GB (1) GB1107620A (en)
NL (1) NL148360B (en)
SE (1) SE325338B (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3562606A (en) * 1969-08-13 1971-02-09 Varian Associates Subsurface gallium arsenide schottky-type diode and method of fabricating same
KR102355507B1 (en) * 2018-11-14 2022-01-27 (주)디엔에프 Method of manufacturing a molybdenum-containing thin film and molybdenum-containing thin film manufactured thereby

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE624959A (en) * 1961-11-20
GB1064290A (en) * 1963-01-14 1967-04-05 Motorola Inc Method of making semiconductor devices

Also Published As

Publication number Publication date
NL148360B (en) 1976-01-15
FR1515732A (en) 1968-03-01
CH474854A (en) 1969-06-30
BE696171A (en) 1967-09-01
DE1614136B1 (en) 1971-08-12
GB1107620A (en) 1968-03-27
SE325338B (en) 1970-06-29

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