NL6618117A - - Google Patents

Info

Publication number
NL6618117A
NL6618117A NL6618117A NL6618117A NL6618117A NL 6618117 A NL6618117 A NL 6618117A NL 6618117 A NL6618117 A NL 6618117A NL 6618117 A NL6618117 A NL 6618117A NL 6618117 A NL6618117 A NL 6618117A
Authority
NL
Netherlands
Application number
NL6618117A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6618117A publication Critical patent/NL6618117A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G4/00Fixed capacitors; Processes of their manufacture
    • H01G4/002Details
    • H01G4/005Electrodes
    • H01G4/008Selection of materials
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C27/00Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/02Alloys based on vanadium, niobium, or tantalum
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/18Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58After-treatment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58After-treatment
    • C23C14/5846Reactive treatment
    • C23C14/5853Oxidation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01GCAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G2/00Details of capacitors not covered by a single one of groups H01G4/00-H01G11/00

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
NL6618117A 1965-12-27 1966-12-23 NL6618117A (US07993877-20110809-P00003.png)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US516655A US3320500A (en) 1965-12-27 1965-12-27 Tantalum alloy capacitor

Publications (1)

Publication Number Publication Date
NL6618117A true NL6618117A (US07993877-20110809-P00003.png) 1967-06-28

Family

ID=24056559

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6618117A NL6618117A (US07993877-20110809-P00003.png) 1965-12-27 1966-12-23

Country Status (7)

Country Link
US (1) US3320500A (US07993877-20110809-P00003.png)
BE (1) BE690127A (US07993877-20110809-P00003.png)
DE (1) DE1589079B2 (US07993877-20110809-P00003.png)
FR (1) FR1501459A (US07993877-20110809-P00003.png)
GB (1) GB1162709A (US07993877-20110809-P00003.png)
IL (1) IL26756A (US07993877-20110809-P00003.png)
NL (1) NL6618117A (US07993877-20110809-P00003.png)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3710474A (en) * 1970-05-22 1973-01-16 Fansteel Inc Vanadium-modified tantalum foil
FR2218633B1 (US07993877-20110809-P00003.png) * 1973-02-19 1977-07-22 Lignes Telegraph Telephon
FR2327620A1 (fr) * 1975-10-06 1977-05-06 Lignes Telegraph Telephon Perfectionnements aux condensateurs a electrolyte solide
DE2719988C2 (de) * 1977-05-04 1983-01-05 Siemens AG, 1000 Berlin und 8000 München Amorphe, Tantal enthaltende mindestens bis 300 Grad C temperaturstabile Metallschicht und Verfahren zu ihrer Herstellung
JPS6026288B2 (ja) * 1979-04-10 1985-06-22 松下電器産業株式会社 固体電解コンデンサ用焼結電極
JPS6026287B2 (ja) * 1978-11-25 1985-06-22 松下電器産業株式会社 電解コンデンサ用多孔質電極の製造方法
GB2038556B (en) * 1978-11-25 1983-02-16 Matsushita Electric Ind Co Ltd Porous tantalum anode for electrolytic capacitor
US4423087A (en) * 1981-12-28 1983-12-27 International Business Machines Corporation Thin film capacitor with a dual bottom electrode structure
US4471405A (en) * 1981-12-28 1984-09-11 International Business Machines Corporation Thin film capacitor with a dual bottom electrode structure
JPH0627328B2 (ja) * 1985-07-16 1994-04-13 ソニー株式会社 高誘電率薄膜
US4982309A (en) * 1989-07-17 1991-01-01 National Semiconductor Corporation Electrodes for electrical ceramic oxide devices
BR0113215A (pt) 2000-08-10 2005-02-01 Showa Denko Kk Pó de nióbio, corpo sinterizado e capacitor usando o corpo
JP6750462B2 (ja) * 2016-11-04 2020-09-02 Tdk株式会社 薄膜コンデンサ及び電子部品内蔵基板

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2299288A (en) * 1940-03-21 1942-10-20 Nat Sugar Refining Company Sugar
NL238401A (US07993877-20110809-P00003.png) * 1958-06-16
US3203793A (en) * 1963-01-28 1965-08-31 Du Pont Porous columbium and tantalum materials

Also Published As

Publication number Publication date
DE1589079B2 (de) 1972-05-18
BE690127A (US07993877-20110809-P00003.png) 1967-05-02
DE1589079A1 (de) 1970-01-02
IL26756A (en) 1970-07-19
US3320500A (en) 1967-05-16
FR1501459A (fr) 1967-11-10
GB1162709A (en) 1969-08-27

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