NL6614573A - - Google Patents

Info

Publication number
NL6614573A
NL6614573A NL6614573A NL6614573A NL6614573A NL 6614573 A NL6614573 A NL 6614573A NL 6614573 A NL6614573 A NL 6614573A NL 6614573 A NL6614573 A NL 6614573A NL 6614573 A NL6614573 A NL 6614573A
Authority
NL
Netherlands
Application number
NL6614573A
Other versions
NL150921B (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6614573A publication Critical patent/NL6614573A/xx
Publication of NL150921B publication Critical patent/NL150921B/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D231/00—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
    • C07D231/02—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
    • C07D231/06—Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/52—Compositions containing diazo compounds as photosensitive substances
    • G03C1/61—Compositions containing diazo compounds as photosensitive substances with non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/815—Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
    • G03C1/8155—Organic compounds therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
NL666614573A 1965-10-27 1966-10-17 Zacht werkend tweecomponentsdiazotypemateriaal. NL150921B (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK57503A DE1286897B (de) 1965-10-27 1965-10-27 Zweikomponentendiazotypiematerial

Publications (2)

Publication Number Publication Date
NL6614573A true NL6614573A (no) 1967-04-28
NL150921B NL150921B (nl) 1976-09-15

Family

ID=7228277

Family Applications (1)

Application Number Title Priority Date Filing Date
NL666614573A NL150921B (nl) 1965-10-27 1966-10-17 Zacht werkend tweecomponentsdiazotypemateriaal.

Country Status (13)

Country Link
US (1) US3498791A (no)
AT (1) AT272829B (no)
BE (1) BE688795A (no)
CH (1) CH472696A (no)
DE (1) DE1286897B (no)
DK (1) DK115165B (no)
ES (1) ES332784A1 (no)
FI (1) FI44760C (no)
FR (1) FR1499551A (no)
GB (1) GB1151368A (no)
NL (1) NL150921B (no)
SE (1) SE349154B (no)
YU (1) YU32918B (no)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3998812A (en) * 1968-04-19 1976-12-21 Hoechst Aktiengesellschaft Styryl-pyrazoline compounds
US4306007A (en) * 1978-03-13 1981-12-15 Am International, Inc. Process of making and using fade-resistant diazo microfilm
DE3127668A1 (de) * 1981-07-13 1983-01-20 Hoechst Ag, 6000 Frankfurt Verfahren und loesung zum konservieren von flachdruckformen
DE3307364A1 (de) * 1983-03-02 1984-09-06 Hoechst Ag, 6230 Frankfurt Zweikomponenten-diazontypiematerial
DE3830914A1 (de) * 1988-09-10 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von kopien

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2432549A (en) * 1945-12-12 1947-12-16 Gen Aniline & Film Corp Diazotype layers containing thiourea derivatives of hydroxy benzene
GB643042A (en) * 1946-12-28 1950-09-15 Gen Aniline & Film Corp Method of producing diazotype images and improved diazotype materials therefor
GB669590A (en) * 1949-06-03 1952-04-02 Ilford Ltd Improvements in or relating to a process for improving the whiteness of colour materials
BE579138A (no) * 1958-07-10
BE600840A (no) * 1960-03-02
NL271675A (no) * 1961-11-22
NL290832A (no) * 1962-03-31
US3365296A (en) * 1964-05-18 1968-01-23 Gen Aniline & Film Corp Light-sensitive ultraviolet absorbing compounds and diazotype materials containing the same

Also Published As

Publication number Publication date
SE349154B (no) 1972-09-18
FR1499551A (fr) 1967-10-27
GB1151368A (en) 1969-05-07
CH472696A (de) 1969-05-15
DE1286897B (de) 1969-01-09
NL150921B (nl) 1976-09-15
BE688795A (no) 1967-04-24
AT272829B (de) 1969-07-25
YU32918B (en) 1975-12-31
FI44760C (fi) 1971-12-10
US3498791A (en) 1970-03-03
YU200666A (en) 1975-06-30
ES332784A1 (es) 1967-07-16
FI44760B (no) 1971-08-31
DK115165B (da) 1969-09-08

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee
NL80 Abbreviated name of patent owner mentioned of already nullified patent

Owner name: HOECHST