NL6614573A - - Google Patents

Info

Publication number
NL6614573A
NL6614573A NL6614573A NL6614573A NL6614573A NL 6614573 A NL6614573 A NL 6614573A NL 6614573 A NL6614573 A NL 6614573A NL 6614573 A NL6614573 A NL 6614573A NL 6614573 A NL6614573 A NL 6614573A
Authority
NL
Netherlands
Application number
NL6614573A
Other versions
NL150921B (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6614573A publication Critical patent/NL6614573A/xx
Publication of NL150921B publication Critical patent/NL150921B/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D231/00Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings
    • C07D231/02Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings
    • C07D231/06Heterocyclic compounds containing 1,2-diazole or hydrogenated 1,2-diazole rings not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • G03C1/61Compositions containing diazo compounds as photosensitive substances with non-macromolecular additives
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/76Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/815Photosensitive materials characterised by the base or auxiliary layers characterised by means for filtering or absorbing ultraviolet light, e.g. optical bleaching
    • G03C1/8155Organic compounds therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
NL666614573A 1965-10-27 1966-10-17 Zacht werkend tweecomponentsdiazotypemateriaal. NL150921B (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK57503A DE1286897B (de) 1965-10-27 1965-10-27 Zweikomponentendiazotypiematerial

Publications (2)

Publication Number Publication Date
NL6614573A true NL6614573A (en:Method) 1967-04-28
NL150921B NL150921B (nl) 1976-09-15

Family

ID=7228277

Family Applications (1)

Application Number Title Priority Date Filing Date
NL666614573A NL150921B (nl) 1965-10-27 1966-10-17 Zacht werkend tweecomponentsdiazotypemateriaal.

Country Status (13)

Country Link
US (1) US3498791A (en:Method)
AT (1) AT272829B (en:Method)
BE (1) BE688795A (en:Method)
CH (1) CH472696A (en:Method)
DE (1) DE1286897B (en:Method)
DK (1) DK115165B (en:Method)
ES (1) ES332784A1 (en:Method)
FI (1) FI44760C (en:Method)
FR (1) FR1499551A (en:Method)
GB (1) GB1151368A (en:Method)
NL (1) NL150921B (en:Method)
SE (1) SE349154B (en:Method)
YU (1) YU32918B (en:Method)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3998812A (en) * 1968-04-19 1976-12-21 Hoechst Aktiengesellschaft Styryl-pyrazoline compounds
US4306007A (en) * 1978-03-13 1981-12-15 Am International, Inc. Process of making and using fade-resistant diazo microfilm
DE3127668A1 (de) * 1981-07-13 1983-01-20 Hoechst Ag, 6000 Frankfurt Verfahren und loesung zum konservieren von flachdruckformen
DE3307364A1 (de) * 1983-03-02 1984-09-06 Hoechst Ag, 6230 Frankfurt Zweikomponenten-diazontypiematerial
DE3830914A1 (de) * 1988-09-10 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von kopien

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2432549A (en) * 1945-12-12 1947-12-16 Gen Aniline & Film Corp Diazotype layers containing thiourea derivatives of hydroxy benzene
GB643042A (en) * 1946-12-28 1950-09-15 Gen Aniline & Film Corp Method of producing diazotype images and improved diazotype materials therefor
GB669590A (en) * 1949-06-03 1952-04-02 Ilford Ltd Improvements in or relating to a process for improving the whiteness of colour materials
BE579138A (en:Method) * 1958-07-10
BE600840A (en:Method) * 1960-03-02
NL109539C (en:Method) * 1961-11-22
NL290832A (en:Method) * 1962-03-31
US3365296A (en) * 1964-05-18 1968-01-23 Gen Aniline & Film Corp Light-sensitive ultraviolet absorbing compounds and diazotype materials containing the same

Also Published As

Publication number Publication date
BE688795A (en:Method) 1967-04-24
US3498791A (en) 1970-03-03
ES332784A1 (es) 1967-07-16
YU32918B (en) 1975-12-31
NL150921B (nl) 1976-09-15
DE1286897B (de) 1969-01-09
AT272829B (de) 1969-07-25
CH472696A (de) 1969-05-15
YU200666A (en) 1975-06-30
DK115165B (da) 1969-09-08
FR1499551A (fr) 1967-10-27
GB1151368A (en) 1969-05-07
SE349154B (en:Method) 1972-09-18
FI44760C (fi) 1971-12-10
FI44760B (en:Method) 1971-08-31

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Legal Events

Date Code Title Description
V1 Lapsed because of non-payment of the annual fee
NL80 Abbreviated name of patent owner mentioned of already nullified patent

Owner name: HOECHST