NL6605566A - - Google Patents

Info

Publication number
NL6605566A
NL6605566A NL6605566A NL6605566A NL6605566A NL 6605566 A NL6605566 A NL 6605566A NL 6605566 A NL6605566 A NL 6605566A NL 6605566 A NL6605566 A NL 6605566A NL 6605566 A NL6605566 A NL 6605566A
Authority
NL
Netherlands
Application number
NL6605566A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6605566A publication Critical patent/NL6605566A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14—Polycondensates modified by chemical after-treatment
    • C08G59/1433—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1438—Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
    • C08G59/1455—Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • C09D163/10—Epoxy resins modified by unsaturated compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Emergency Medicine (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
NL6605566A 1965-04-27 1966-04-26 NL6605566A (en:Method)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US451300A US3418295A (en) 1965-04-27 1965-04-27 Polymers and their preparation

Publications (1)

Publication Number Publication Date
NL6605566A true NL6605566A (en:Method) 1966-10-28

Family

ID=23791663

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6605566A NL6605566A (en:Method) 1965-04-27 1966-04-26

Country Status (5)

Country Link
US (1) US3418295A (en:Method)
BE (1) BE680133A (en:Method)
DE (1) DE1645125C3 (en:Method)
GB (1) GB1110050A (en:Method)
NL (1) NL6605566A (en:Method)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3530100A (en) * 1966-09-26 1970-09-22 Ppg Industries Inc Crosslinking polymers
US3544262A (en) * 1967-01-24 1970-12-01 American Cyanamid Co Fibers of acrylonitrile-hydroxy ethyl methacrylate polymer cross-linked by phosphoric acid
US3837860A (en) * 1969-06-16 1974-09-24 L Roos PHOTOSENSITIVE MATERIALS COMPRISING POLYMERS HAVING RECURRING PENDENT o-QUINONE DIAZIDE GROUPS
BE757386A (fr) * 1969-10-13 1971-04-13 Du Pont Procede de transfert double pour images photodurcissables
JPS51482B1 (en:Method) * 1971-06-16 1976-01-08
US3770433A (en) * 1972-03-22 1973-11-06 Bell Telephone Labor Inc High sensitivity negative electron resist
CS158458B1 (en:Method) * 1972-05-02 1974-11-25
CH576739A5 (en:Method) * 1972-08-25 1976-06-15 Ciba Geigy Ag
DE2249446C3 (de) * 1972-10-09 1979-02-15 Basf Farben + Fasern Ag, 2000 Hamburg Verwendung eines durch ionisierende Strahlung härtbaren Überzugsmittels zur Beschichtung von Oberflächen
US3859099A (en) * 1972-12-22 1975-01-07 Eastman Kodak Co Positive plate incorporating diazoquinone
JPS5516389B2 (en:Method) * 1973-06-07 1980-05-01
JPS527364B2 (en:Method) * 1973-07-23 1977-03-02
US4123276A (en) * 1974-02-28 1978-10-31 Fuji Photo Film Co., Ltd. Photosensitive composition
US3997344A (en) * 1974-07-05 1976-12-14 American Can Company Dry positive photopolymer imaging process involving heating and application of toner
JPS51149021A (en) * 1974-12-28 1976-12-21 Fuji Yakuhin Kogyo Kk Water soluble photosensitive resin composition
US4089686A (en) * 1976-04-19 1978-05-16 Western Electric Company, Inc. Method of depositing a metal on a surface
AU3870478A (en) * 1977-08-09 1980-02-14 Somar Mfg High energy radiation cruable resist material
JPS5488403A (en) * 1977-12-21 1979-07-13 Okamoto Kagaku Kogyo Kk Block sensitive layer for printing
US4341860A (en) 1981-06-08 1982-07-27 E. I. Du Pont De Nemours And Company Photoimaging compositions containing substituted cyclohexadienone compounds
US4657983A (en) * 1984-12-05 1987-04-14 Interez, Inc. Phosphate esters of acrylated glycidyl ester copolymers
JPH0731399B2 (ja) * 1984-12-21 1995-04-10 三菱化学株式会社 光重合性組成物
US4975484A (en) * 1985-05-10 1990-12-04 E. I. Du Pont De Nemours And Company Acrylic copolymer composition and adhesive coatings therefrom
US4980410A (en) * 1985-05-10 1990-12-25 E. I. Du Pont De Nemours And Company Acrylic copolymer composition and adhesive coatings therefrom
US4782105A (en) * 1987-04-10 1988-11-01 Ciba-Geigy Corporation Long chain N,N,-dialkylhydroxylamines and stabilized compositions
US5002982A (en) * 1990-02-26 1991-03-26 Gencorp Inc. Paper felts or mats
US5514522A (en) * 1993-11-01 1996-05-07 Polaroid Corporation Synthesis of photoreactive polymeric binders
US5973034A (en) * 1995-10-11 1999-10-26 Nippon Kayaku Kabushiki Kaisha (Oxide or sulfide) powder epoxy (meth) acrylate w/glass and/or metal
JP3843154B2 (ja) * 1996-09-25 2006-11-08 関西ペイント株式会社 光重合性組成物
US20040131970A1 (en) * 2003-01-07 2004-07-08 Meagley Robert P. Photodefinable polymers for semiconductor applications
JP3828877B2 (ja) * 2003-04-10 2006-10-04 大成化工株式会社 発色性に優れた着色剤（カララント）の製造方法
RU2443683C2 (ru) * 2006-05-17 2012-02-27 Америкэн Дай Сорс Инк. Новые материалы для покрытий офсетных печатных форм, офсетные печатные формы и покрытия, содержащие эти материалы, способы получения и применение
KR20120082169A (ko) * 2011-01-13 2012-07-23 삼성전자주식회사 알칼리 가용성의 에폭시 수지를 포함하는 감광성 접착제 조성물 및 이를 이용한 패턴 형성용 접착 필름
KR20140148400A (ko) * 2012-03-28 2014-12-31 도레이 카부시키가이샤 감광성 도전 페이스트 및 도전 패턴의 제조 방법

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2580901A (en) * 1948-06-19 1952-01-01 American Cyanamid Co Copolymer of styrene, glycidyl acrylate, and glycidyl methacrylate

Also Published As

Publication number Publication date
DE1645125B2 (de) 1971-11-25
GB1110050A (en) 1968-04-18
US3418295A (en) 1968-12-24
DE1645125A1 (de) 1970-07-30
DE1645125C3 (de) 1978-03-09
BE680133A (en:Method) 1966-10-27

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