NL6602351A - - Google Patents

Info

Publication number
NL6602351A
NL6602351A NL6602351A NL6602351A NL6602351A NL 6602351 A NL6602351 A NL 6602351A NL 6602351 A NL6602351 A NL 6602351A NL 6602351 A NL6602351 A NL 6602351A NL 6602351 A NL6602351 A NL 6602351A
Authority
NL
Netherlands
Application number
NL6602351A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL6602351A publication Critical patent/NL6602351A/xx

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D3/00Distillation or related exchange processes in which liquids are contacted with gaseous media, e.g. stripping
    • B01D3/10Vacuum distillation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
NL6602351A 1965-11-26 1966-02-23 NL6602351A (US07122603-20061017-C00045.png)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1637465A CH427744A (de) 1965-11-26 1965-11-26 Verfahren für die thermische Verdampfung von Stoffgemischen im Vakuum

Publications (1)

Publication Number Publication Date
NL6602351A true NL6602351A (US07122603-20061017-C00045.png) 1967-05-29

Family

ID=4416806

Family Applications (1)

Application Number Title Priority Date Filing Date
NL6602351A NL6602351A (US07122603-20061017-C00045.png) 1965-11-26 1966-02-23

Country Status (7)

Country Link
US (1) US3485997A (US07122603-20061017-C00045.png)
AT (1) AT269590B (US07122603-20061017-C00045.png)
BE (1) BE690118A (US07122603-20061017-C00045.png)
CH (1) CH427744A (US07122603-20061017-C00045.png)
DE (1) DE1521174B2 (US07122603-20061017-C00045.png)
GB (1) GB1116857A (US07122603-20061017-C00045.png)
NL (1) NL6602351A (US07122603-20061017-C00045.png)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3854984A (en) * 1971-12-17 1974-12-17 Gen Electric Vacuum deposition of multi-element coatings and films with a single source
DE2544725C3 (de) * 1975-10-07 1981-01-08 Leybold-Heraeus Gmbh, 5000 Koeln Elektronenstrahlverdampfer
DE3112460C2 (de) * 1981-03-28 1983-01-20 Fried. Krupp Gmbh, 4300 Essen Verfahren zur Herstellung eines Verbundkörpers sowie Anwendung dieses Verfahrens
GB2155042B (en) * 1984-02-21 1987-12-31 Hughes Technology Pty Ltd Laser induced ion beam generator
US4816293A (en) * 1986-03-27 1989-03-28 Mitsubishi Denki Kabushiki Kaisha Process for coating a workpiece with a ceramic material

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT380674A (US07122603-20061017-C00045.png) * 1939-02-22
US2771568A (en) * 1951-01-31 1956-11-20 Zeiss Carl Utilizing electron energy for physically and chemically changing members
CH311812A (de) * 1951-11-05 1955-12-15 Zeiss Carl Fa Aufdampfeinrichtung.
US3135855A (en) * 1961-03-16 1964-06-02 Alloyd Electronics Corp Electron beam heating devices
US3205087A (en) * 1961-12-15 1965-09-07 Martin Marietta Corp Selective vacuum deposition of thin film
NL297262A (US07122603-20061017-C00045.png) * 1962-09-04
US3250842A (en) * 1963-01-15 1966-05-10 Atomic Energy Commission Electron beam zone refining
US3347701A (en) * 1963-02-05 1967-10-17 Fujitsu Ltd Method and apparatus for vapor deposition employing an electron beam
US3340601A (en) * 1963-07-17 1967-09-12 United Aircraft Corp Alloy diffused transistor
US3267015A (en) * 1963-09-13 1966-08-16 Alloyd Electronics Corp Systems and processes for coating by evaporation
DE1298851B (de) * 1963-12-02 1969-07-03 Steigerwald Verfahren zur Materialbearbeitung mittels Strahlungsenergie

Also Published As

Publication number Publication date
DE1521174B2 (de) 1973-07-19
CH427744A (de) 1967-01-15
AT269590B (de) 1969-03-25
US3485997A (en) 1969-12-23
GB1116857A (en) 1968-06-12
BE690118A (US07122603-20061017-C00045.png) 1967-05-02
DE1521174A1 (de) 1969-07-31

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